Abstract: A power source voltage monitoring circuit for monitoring self power source voltage comprises a reference voltage circuit which is supplied with a power source voltage, and generates and outputs a reference voltage in accordance with the power source voltage, a comparator which is supplied with an output voltage output from the reference voltage circuit and a voltage varying with the power source voltage, compares the voltages, and outputs a result of the comparison, and a control circuit which prevents the voltage in accordance with the power source voltage from being input to the comparator before the voltage output from the reference voltage circuit reaches a predetermined reference voltage.

Abstract: This invention provides an insecticidal and acaricidal agent which can control various insanitary insects and insects, mites and eggs thereof which are harmful to the agricultural and horticultural products, at a low chemical concentration. The insecticidal and acaricidal agent of this invention contains an anilinopyrimidinone derivative represented by the following general formula (I) as an active ingredient.

Abstract: A set of lockers allows a customer to drop off commodities for a service company to pick up. An order is input using an operation screen, and an order sheet which specifies the locker number is issued. A commodity, for example undeveloped film, and the order sheet are put in a transparent request bag and deposited in the locker. When the service company picks up the request bag, the request bag is taken out of the locker, and a bar code on the order sheet is read by a hand scanner. When the order sheet is scanned, the locker it came from is automatically locked, and the next locker which has an undeveloped film order is automatically opened. After processing the film, the developed film and prints are put in a delivery bag, with an attached slip having the locker number to which the bag is to be delivered. Upon delivery to the locker, a first bar code on a slip is read by a hand scanner, and a first locker is unlocked.

Abstract: This invention relates to a mask (reticle) washing apparatus for use in the production of semiconductor integrated circuits (IC), and in particular, to cleaning a mask without the use of a strong oxidizing agent or a strong alkaline agent. The mask washing apparatus comprises an airtight chamber including a washing space and a drying space which are separated by a shutter. A drain and an exhaust duct are located at the bottom of the chamber. The washing is performed at a lower part of the chamber and the drying is performed at an upper part of the chamber. A clean air stream flows from the upper part to the lower part of the chamber, and this flow eliminates contamination in the chamber. Consequently, the mask is cleaned perfectly, and the reliability and yield of the device is improved.

Abstract: An apparatus for cleaning glass masks used for the manufacture of semiconductor devices, which apparatus comprises a pair of rotary cleaning elements confronting each other and adapted to pour liquid therebetween, structure for supporting a cassette in which a plurality of glass masks to be cleaned are contained, and carriage structure by which the glass masks in the cassette are, one by one, pinched, carried to, and held in a position between the cleaning elments, in which position both surfaces of the glass mask are wiped by the cleaning elements and washed by the liquid poured from the cleaning elements.