Publication number: 20040054179
Abstract: A compound of the formula (I) wherein R1 is —X—R4, an optionally substituted heterocyclic residue, an optionally substituted carbocyclic residue or optionally substituted condensed ring moiety; X is CR5R6, O, S, SO, SO2 or NR7; Y is CH or N; R2 is H, an optionally substituted C1-C10 alkyl,etc.; R3 is an optionally substituted aryl, or an optionally substituted heteroaryl, etc.; R4 is an optionally substituted aryl, an optionally substituted heteroaryl, etc.; R5, R6, and R7 can be identical or different and represent H, an optionally substituted C1-C10 alkyl, etc. The compound has an excellent anti-allergic activity and the like.
Type:
Application
Filed:
February 14, 2003
Publication date:
March 18, 2004
Inventors:
Takeshi Yura, Arnel b Concepcion, Gyoonhee Han, Makiko Marumo, Hiroko Yoshino, Norihiro Kawamura, Toshio Kokubo, Hiroshi Komura, Yingfu Li, Timothy B LOwinger, Muneto Mogi, Noriyuki Yamamoto, Nagahiro Yoshida, Scott Miller, Margaret A Popp, Aniko M Redmann, Martha E Rodriguez, William J Scott, Ming Wang