Abstract: A method for the electrolytic etching of metal workpiece comprising placing a stencil made of an electric insulating material having a pattern consisting of open portions and non-opened portions into intimate contact with the metal workpiece, placing an electrode adjacent to said metal, jetting an electrolyte between said metal workpiece and the electrode while passing an electric current through the jet of electrolyte in a direction from said metal workpiece to said electrode to electrolytically etch said metal workpiece, and then separating said stencil from the electrolytically etched metal workpiece. Said stencil can then be placed into intimate contact with the next metal workpiece to be electrolytically etched, and electrolytically etching the metal workpiece in the same manner as above and then repeating this electrolytic etching procedure with said one stencil thereby etching many metal workpieces.