Patents by Inventor Takeyuki Mizutani
Takeyuki Mizutani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180239261Abstract: An exposure apparatus includes a nozzle member, a nozzle driving system having an actuator by which the nozzle member is moved, and a controller. The nozzle member includes a liquid supply port from which immersion liquid is supplied, a liquid recovery port via which the supplied immersion liquid is recovered, and a gas supply port via which a gas is supplied. The liquid supply port, the liquid recovery port and the gas supply port face downwardly, the liquid recovery port is arranged radially outward of the liquid supply port with respect to a path of the exposure light, and the gas supply port is arranged radially outward of the liquid recovery port with respect to the path. The controller controls the nozzle driving system based on information on a movement of a substrate stage.Type: ApplicationFiled: April 24, 2018Publication date: August 23, 2018Applicant: NIKON CORPORATIONInventor: Takeyuki MIZUTANI
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Patent number: 9958785Abstract: An exposure apparatus includes a nozzle member which has at least one of a supply port for supplying a liquid and a recovery port for recovering the liquid, and a nozzle adjusting mechanism which adjusts at least one of a position and a posture of the nozzle member depending on a position or a posture of a substrate. The exposure apparatus forms an immersion area of the liquid on the substrate, and performs exposure for the substrate through the liquid in the immersion area. Accordingly, the liquid is satisfactorily retained between the projection optical system and the substrate, thereby making it possible to realize the exposure highly accurately.Type: GrantFiled: December 31, 2013Date of Patent: May 1, 2018Assignee: NIKON CORPORATIONInventor: Takeyuki Mizutani
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Patent number: 8941808Abstract: An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.Type: GrantFiled: June 9, 2008Date of Patent: January 27, 2015Assignee: Nikon CorporationInventors: Katsushi Nakano, Masahiko Okumura, Tarou Sugihara, Takeyuki Mizutani, Tomoharu Fujiwara
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Patent number: 8780326Abstract: An exposure apparatus comprises a liquid immersion system, a first mover, and a prescribed member. The exposure apparatus exposes a substrate via an optical member and a liquid. The liquid immersion system performs supply and recovery of the liquid. The first mover can move in a first area, and can hold the liquid between itself and the optical member. The prescribed member is removed from the first mover when the first mover withdraws from a position opposing the optical member, and can hold the liquid between itself and the optical member.Type: GrantFiled: September 8, 2006Date of Patent: July 15, 2014Assignee: Nikon CorporationInventors: Tohru Kiuchi, Takeyuki Mizutani, Masahiro Nei, Masato Hamatani, Masahiko Okumura
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Publication number: 20140111783Abstract: An exposure apparatus includes a nozzle member which has at least one of a supply port for supplying a liquid and a recovery port for recovering the liquid, and a nozzle adjusting mechanism which adjusts at least one of a position and a posture of the nozzle member depending on a position or a posture of a substrate. The exposure apparatus forms an immersion area of the liquid on the substrate, and performs exposure for the substrate through the liquid in the immersion area. Accordingly, the liquid is satisfactorily retained between the projection optical system and the substrate, thereby making it possible to realize the exposure highly accurately.Type: ApplicationFiled: December 31, 2013Publication date: April 24, 2014Applicant: Nikon CorporationInventor: Takeyuki MIZUTANI
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Patent number: 8675174Abstract: An exposure apparatus includes a nozzle member which has at least one of a supply port for supplying a liquid and a recovery port for recovering the liquid, and a nozzle adjusting mechanism which adjusts at least one of a position and a posture of the nozzle member depending on a position or a posture of a substrate. The exposure apparatus forms an immersion area of the liquid on the substrate, and performs exposure for the substrate through the liquid in the immersion area. Accordingly, the liquid is satisfactorily retained between the projection optical system and the substrate, thereby making it possible to realize the exposure highly accurately.Type: GrantFiled: September 16, 2005Date of Patent: March 18, 2014Assignee: Nikon CorporationInventor: Takeyuki Mizutani
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Publication number: 20120008112Abstract: An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.Type: ApplicationFiled: September 13, 2011Publication date: January 12, 2012Applicant: Nikon CorporationInventors: Katsushi Nakano, Masahiko Okumura, Tarou Sugihara, Takeyuki Mizutani, Tomoharu Fujiwara
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Patent number: 8089615Abstract: A substrate holding apparatus includes a base part and a support part that is formed on the base part and supports a rear surface of the substrate. A first circumferential wall is formed on the base part, has a first upper surface that opposes the rear surface of the substrate, which is supported by the support part, and surrounds a first space that is between the substrate, which is supported by the support and the base part. A second circumferential wall is formed on the base part, has a second upper surface that opposes the rear surface of the substrate, which is supported by the support part, with a gap interposed therebetween, and surrounds the first circumferential wall. A third circumferential wall is formed on the base part, has a third upper surface that opposes the rear surface of the substrate, which is supported by the support part; and surrounds the support part and the second circumferential wall.Type: GrantFiled: June 5, 2008Date of Patent: January 3, 2012Assignee: Nikon CorporationInventors: Takeyuki Mizutani, Yuichi Shibazaki, Makoto Shibuta
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Patent number: 8040489Abstract: A substrate processing method which includes an exposure step wherein an immersion area of a first liquid is formed on a substrate and the substrate is exposed by being irradiated with an exposure light through the first liquid, and an immersion step wherein the substrate is immersed in a second liquid before the exposure step. By this method, occurrences of problems caused by adhesion marks, which are always involved in immersion exposure, can be reduced.Type: GrantFiled: October 25, 2005Date of Patent: October 18, 2011Assignee: Nikon CorporationInventors: Katsushi Nakano, Masahiko Okumura, Tarou Sugihara, Takeyuki Mizutani, Tomoharu Fujiwara
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Publication number: 20110222037Abstract: An exposure apparatus comprises a liquid immersion system, a first mover, and a prescribed member. The exposure apparatus exposes a substrate via an optical member and a liquid. The liquid immersion system performs supply and recovery of the liquid. The first mover can move in a first area, and can hold the liquid between itself and the optical member. The prescribed member is removed from the first mover when the first mover withdraws from a position opposing the optical member, and can hold the liquid between itself and the optical member.Type: ApplicationFiled: September 8, 2006Publication date: September 15, 2011Applicant: Nikon CorporationInventors: Tohru Kiuchi, Takeyuki Mizutani, Masahiro Nei, Masato Hamatani, Masahiko Okumura
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Publication number: 20090109413Abstract: A maintenance method for performing maintenance of an exposure apparatus including a liquid immersion space-forming member which forms a liquid-immersion area by supplying liquid in a space between an optical member and a substrate; a liquid supply mechanism which supplies the liquid to the liquid-immersion space; a substrate stage which moves the substrate; and a measuring stage on which a reference mark is formed. To clean the liquid-immersion space-forming member, a cleaning liquid is supplied to a space between the measuring stage and the liquid-immersion space-forming member. The exposure apparatus is provided with various types of cleaning mechanisms for cleaning the liquid-immersion space-forming member. The liquid-immersion exposure can be performed while efficiently performing maintenance of the exposure apparatus.Type: ApplicationFiled: November 21, 2008Publication date: April 30, 2009Applicant: NIKON CORPORATIONInventors: Yuichi Shibazaki, Takeyuki Mizutani, Go Ichinose, Makoto Shibuta
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Publication number: 20080318152Abstract: A substrate for exposure prevents interference with a substrate holder at the time of being loaded onto the substrate holder and prevents a liquid from entering into a rear plane side after being loaded. A substrate (P) for exposure is a substrate to be exposed by irradiation of exposure light through the liquid, and has a size tolerance (DP) of an outer diameter (LP) of ±0.02 mm or less.Type: ApplicationFiled: September 16, 2005Publication date: December 25, 2008Inventor: Takeyuki Mizutani
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Publication number: 20080246931Abstract: An immersion type lithographic apparatus includes at least one immersion space and an immersion system configured to at least partially fill the immersion space with a liquid. The apparatus is configured to rinse at least part of the immersion space with a rinsing liquid before the apparatus is used to project a patterned beam of radiation onto a substrate.Type: ApplicationFiled: June 9, 2008Publication date: October 9, 2008Applicant: NIKON CORPORATIONInventors: Katsushi Nakano, Masahiko Okumura, Tarou Sugihara, Takeyuki Mizutani, Tomoharu Fujiwara
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Publication number: 20080239275Abstract: The some aspects of the present invention provides a substrate holding apparatus that comprises: a base part; a support part that is formed on the base part and supports a rear surface of the substrate; a first circumferential wall that: is formed on the base part; has a first upper surface that opposes the rear surface of the substrate, which is supported by the support part; and surrounds a first space that is between the substrate, which is supported by the support part, and the base part; a second circumferential wall that: is formed on the base part; has a second upper surface that opposes the rear surface of the substrate, which is supported by the support part, with a gap interposed therebetween; and surrounds the first circumferential wall; a third circumferential wall that: is formed on the base part; has a third upper sure that opposes the rear surface of the substrate, which is supported by the support part; and surrounds the support part and the second circumferential wall; a fluid flow port thatType: ApplicationFiled: June 5, 2008Publication date: October 2, 2008Applicant: NIKON CORPORATIONInventors: Takeyuki MIZUTANI, Yuichi Shibazaki, Makoto Shibuta
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Publication number: 20080165330Abstract: A liquid removing apparatus (1) evacuates a gas present in a specified space formed on a rear surface (Pb) side of a substrate (P) taken out from a substrate holder (PH), to remove liquid adhered to the rear surface (Pb) of an exposure target substrate (P).Type: ApplicationFiled: January 18, 2006Publication date: July 10, 2008Applicant: NIKON CORPORATIONInventor: Takeyuki Mizutani
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Publication number: 20080143980Abstract: Disclosed is a substrate processing method which includes an exposure step wherein an immersion area of a first liquid is formed on a substrate and the substrate is exposed by being irradiated with an exposure light through the first liquid, and an immersion step wherein the substrate is immersed in a second liquid before the exposure step. By this method, occurrences of problems caused by adhesion marks, which are always involved in immersion exposure, can be reduced.Type: ApplicationFiled: October 25, 2005Publication date: June 19, 2008Applicant: NIKON CORPORATIONInventors: Katsushi Nakano, Masahiko Okumura, Tarou Sugihara, Takeyuki Mizutani, Tomoharu Fujiwara
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Publication number: 20080137047Abstract: An exposure apparatus is provided with a first stage and a second stage. A maintenance apparatus carries out maintenance on the second stage during exposure processing of a wafer held on the first stage.Type: ApplicationFiled: January 8, 2008Publication date: June 12, 2008Applicant: NIKON CORPORATIONInventors: Takeyuki Mizutani, Masahiko Okumura, Hirotaka Kohno
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Publication number: 20080032234Abstract: An exposure apparatus includes a nozzle member which has at least one of a supply port for supplying a liquid and a recovery port for recovering the liquid, and a nozzle adjusting mechanism which adjusts at least one of a position and a posture of the nozzle member depending on a position or a posture of a substrate. The exposure apparatus forms an immersion area of the liquid on the substrate, and performs exposure for the substrate through the liquid in the immersion area. Accordingly, the liquid is satisfactorily retained between the projection optical system and the substrate, thereby making it possible to realize the exposure highly accurately.Type: ApplicationFiled: September 16, 2005Publication date: February 7, 2008Inventor: Takeyuki Mizutani
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Publication number: 20070242248Abstract: A device manufacturing method includes applying, in a lithographic apparatus, a prewetting liquid on top of a layer of radiation sensitive material of a substrate, on a substrate table, or on both; providing an immersion liquid for use in projecting a patterned beam of radiation on the prewet substrate and/or substrate table; and projecting a patterned beam of radiation, through the immersion liquid, onto the substrate and/or the substrate table.Type: ApplicationFiled: June 8, 2007Publication date: October 18, 2007Applicant: NIKON CORPORATIONInventors: Katsushi Nakano, Masahiko Okumura, Tarou Sugihara, Takeyuki Mizutani, Tomoharu Fujiwara
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Publication number: 20070206167Abstract: An exposure method for transferring a pattern on a mask onto a substrate using a catadioptric projection optical system having partial lens barrels that hold optical systems having optical axes that extend in mutually different directions. The method includes measuring an amount of rotation of the catadioptric projection optical system about an optical axis intersecting at least one of the mask and the substrate; and adjusting at least one of an attitude and a scan direction of at least one of the mask and the substrate based on a measurement result of the amount of rotation. The substrate is exposed by adjusting at least one of the attitude and the scan direction of at least one of the mask and the substrate so that the rotation of the projected image on the substrate attributable to the rotation of the projection optical system is offset; thus, excellent exposure accuracy is achieved.Type: ApplicationFiled: December 22, 2004Publication date: September 6, 2007Inventor: Takeyuki Mizutani