Abstract: A substrate holder whose component members are not being corroded even if employing a high concentration of hydrofluoric acid, phosphoric acid, or sulfuric acid as a treatment solution when plural pieces of substrates are held with a substrate holder and immerses in the treatment solution in a treatment reservoir for treatment. The substrate holder 12 comprises a moving member 26 that is made of SiC and is supported to be movable between inside and outside of a treatment reservoir 10 where a treatment solution is stored; a plurality of substrate retainer frames 28 and 30 that are fixed to the moving member 26, and located in a horizontal direction along the array direction of substrates W; and retainer members 34a, 34b, 36a, 36b that are formed at the substrate retainer frames 28 and 30, and are held being in contact with the lower end portions of the substrates W.

Abstract: A substrate treating apparatus includes a storage block for accommodating foups each storing a plurality of substrates, a first treating block for treating a plurality of substrates en bloc, a second treating block for treating one substrate at a time, and a transport device for transporting the substrates between the foups, first treating block and second treating block. The substrates may be treated in a mode of treating a plurality of substrates en bloc, and/or a mode of treating one substrate at a time.