Patents by Inventor Taku Shintani
Taku Shintani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9099127Abstract: A magnetic read head and associated circuitry for reducing side track noise and decreasing read width, thereby providing increased data density. The magnetic read head includes first and second sensor elements that are aligned with one another in a data track direction, with the first sensor element being wider than the second sensor element. Electrical circuitry is connected with the read head in such a manner as to read a first signal from the first sensor element and a second signal from a second sensor element. Because the second sensor element is wider than the first sensor element, it will read more side signal noise from adjacent data tracks than will the second sensor element. The circuitry connected with the first and second sensor element detects and distinguishes the side signal noise and separates it out from the data signal, based sensor width difference and location difference.Type: GrantFiled: May 30, 2014Date of Patent: August 4, 2015Assignee: HGST Netherlands B.V.Inventors: Taku Shintani, Yohji Maruyama, Kouichi Nishioka, Masafumi Mochizuki
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Patent number: 8137571Abstract: Embodiments of the present invention help to provide a method for manufacturing a perpendicular magnetic recording head including a main magnetic pole having a width that does not generally vary. According to one embodiment, a magnetic film, a first inorganic mask film, an organic film, a second inorganic mask film, and a resist pattern are formed in this order. Reactive ion etching (RIE) is performed using the resist pattern as a mask to etch the second inorganic mask film and the organic film and form a mask for the subsequent step. A flow rate of an Ar gas is then controlled, and ion milling is performed, to correct a difference between the width of the mask located at the central portion of the wafer and the width of the mask located at the outer peripheral portion of the wafer. The magnetic film is processed to have a uniform track width. Ion milling is then performed to form the main magnetic pole having an inverted trapezoidal shape.Type: GrantFiled: March 17, 2009Date of Patent: March 20, 2012Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Tomohiro Okada, Hisashi Kimura, Taku Shintani, Tadashi Umezawa
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Patent number: 7881022Abstract: Embodiments in accordance with the present invention provide a sensor to produce high output with a small track width. Particular embodiments include forming a magnetoresistive sensor of a read head to be substantially vertical in its upper portion and gently upwardly convexly curved in its lower portion.Type: GrantFiled: April 17, 2007Date of Patent: February 1, 2011Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Hisako Takei, Nobuo Yoshida, Hiroyuki Hoshiya, Taku Shintani
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Patent number: 7859799Abstract: Embodiments in accordance with the present invention reduce the influence of etching damage at junction edge of a magnetoresistive film in the sensor height direction, lower the deterioration of dielectric breakdown voltage between an upper magnetic shield layer and a lower magnetic shield layer and instability of reproducing property resulting from shield process, and maintain electrostatic capacity to a small value in a CPP magnetoresistive head. In an embodiment of a magnetoresistive head of the present invention, length in the sensor height direction of bottom surface of a pinning layer is longer than the length in the sensor height direction of bottom surface of a first ferromagnetic layer.Type: GrantFiled: February 13, 2007Date of Patent: December 28, 2010Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Katsuro Watanabe, Taku Shintani, Kazuhiro Ueda, Masahiro Osugi
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Publication number: 20090236307Abstract: Embodiments of the present invention help to provide a method for manufacturing a perpendicular magnetic recording head including a main magnetic pole having a width that does not generally vary. According to one embodiment, a magnetic film, a first inorganic mask film, an organic film, a second inorganic mask film, and a resist pattern are formed in this order. Reactive ion etching (RIE) is performed using the resist pattern as a mask to etch the second inorganic mask film and the organic film and form a mask for the subsequent step. A flow rate of an Ar gas is then controlled, and ion milling is performed, to correct a difference between the width of the mask located at the central portion of the wafer and the width of the mask located at the outer peripheral portion of the wafer. The magnetic film is processed to have a uniform track width. Ion milling is then performed to form the main magnetic pole having an inverted trapezoidal shape.Type: ApplicationFiled: March 17, 2009Publication date: September 24, 2009Inventors: Tomohiro Okada, Hisashi Kimura, Taku Shintani, Tadashi Umezawa
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Patent number: 7561384Abstract: A high output magneto-resistive sensor is provided by suppressing leftover resist mask after lift-off and generation of a fence, and by making it easy to remove the redepositions deposited on the side wall in the track width direction or on the side wall in the sensor height direction of the magnetoresistive film. As a means to solve a fence and lift-off leftover of a resist in a process for forming a track and a process for forming a sensor height, a stopper layer is provided on the magnetoresistive film and the stopper layer on the refill film, and performing lift-off by CMP. By using a metallic material which has a small CMP polishing rate for at least the first stopper layer, the magnetoresistive film and the first stopper layer can be etched simultaneously and a pattern formed. As a result, decrease of the height of the resist mask by RIE can be suppressed and lift-off leftover can be prevented.Type: GrantFiled: November 29, 2005Date of Patent: July 14, 2009Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Masahiro Osugi, Taku Shintani, Katsuro Watanabe, Nobuo Yoshida
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Patent number: 7536776Abstract: A fabrication method for thin film magnetic heads, comprises, forming a Current Perpendicular to a Plane (CPP) sensor film over a lower shield and a first chemical mechanical polishing (CMP) stop film over the CPP sensor film, etching the CPP sensor film and forming a track width on the CPP sensor film, and covering at least the etching section of the CPP sensor film with an insulating film. The method further comprises forming a CMP dummy film over the insulating film and a second CMP stop film over the CMP dummy film, exposing the first CMP stop film, and removing the first CMP stop film and the second CMP stop film by oxygen reactive ion etching (RIE) and the CMP dummy film by fluorine RIE, and forming an upper shield film over the insulating film and over the CPP sensor film.Type: GrantFiled: June 13, 2006Date of Patent: May 26, 2009Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Nobuo Yoshida, Taku Shintani, Hisako Takei
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Patent number: 7446981Abstract: This invention provides a high-output magnetic head with a high yield, which is capable of minimizing sense current leak or noise caused by a shift of the magnetic wall of an upper shield layer. In one embodiment, the magnetic head is fabricated so that the height of the upper surface of the refill film along the sensor height direction is the same as that of the magnetoresistance layer in a portion where the refill film along the sensor height direction comes in contact with the magnetoresistance layer and the distance from the upper surface of the refill film along the sensor height direction to the upper surface of the lower shield layer gradually increases in a region from the portion where the refill film along the sensor height direction comes in contact with the magnetoresistance layer to a point at a certain distance away from the portion.Type: GrantFiled: July 24, 2006Date of Patent: November 4, 2008Assignee: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Taku Shintani, Katsuro Watanabe, Nobuo Yoshida, Hisako Takei
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Publication number: 20070253117Abstract: Embodiments in accordance with the present invention provide a sensor to produce high output with a small track width. Particular embodiments include forming a magnetoresistive sensor of a read head to be substantially vertical in its upper portion and gently upwardly convexly curved in its lower portion.Type: ApplicationFiled: April 17, 2007Publication date: November 1, 2007Applicant: Hitachi Global Storage Technologies Inc.Inventors: Hisako Takei, Nobuo Yoshida, Hiroyuki Hoshiya, Taku Shintani
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Patent number: 7274542Abstract: A magnetic sensor includes a spacer having at least a nonmagnetic metal layer inserted between the upper shield layer and the longitudinal bias layers or between the upper shield layer and the longitudinal bias layers plus the magnetoresistive film, the shortest distance between the longitudinal bias layers and the free layer of the magnetoresistive film is set smaller than the shortest distance between the longitudinal bias layers and the upper shield layer, and this arrangement ensures that the amount of magnetic flux entering the magnetoresistive film from the longitudinal bias layers is larger than that absorbed by the upper shield layer, thus realizing a magnetic sensor whose Barkhausen noise is suppressed.Type: GrantFiled: February 5, 2003Date of Patent: September 25, 2007Assignee: Hitachi Global Storage Technologies Japan, Ltd.Inventors: Taku Shintani, Katsuro Watanabe, Masahiko Hatatani, Kikuo Kusukawa
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Publication number: 20070206333Abstract: Embodiments in accordance with the present invention reduce the influence of etching damage at junction edge of a magnetoresistive film in the sensor height direction, lower the deterioration of dielectric breakdown voltage between an upper magnetic shield layer and a lower magnetic shield layer and instability of reproducing property resulting from shield process, and maintain electrostatic capacity to a small value in a CPP magnetoresistive head. In an embodiment of a magnetoresistive head of the present invention, length in the sensor height direction of bottom surface of a pinning layer is longer than the length in the sensor height direction of bottom surface of a first ferromagnetic layer.Type: ApplicationFiled: February 13, 2007Publication date: September 6, 2007Applicant: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Katsuro Watanabe, Taku Shintani, Kazuhiro Ueda, Masahiro Osugi
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Publication number: 20070030592Abstract: This invention provides a high-output magnetic head with a high yield, which is capable of minimizing sense current leak or noise caused by a shift of the magnetic wall of an upper shield layer. In one embodiment, the magnetic head is fabricated so that the height of the upper surface of the refill film along the sensor height direction is the same as that of the magnetoresistance layer in a portion where the refill film along the sensor height direction comes in contact with the magnetoresistance layer and the distance from the upper surface of the refill film along the sensor height direction to the upper surface of the lower shield layer gradually increases in a region from the portion where the refill film along the sensor height direction comes in contact with the magnetoresistance layer to a point at a certain distance away from the portion.Type: ApplicationFiled: July 24, 2006Publication date: February 8, 2007Applicant: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Taku Shintani, Katsuro Watanabe, Nobuo Yoshida, Hisako Takei
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Patent number: 7154713Abstract: A high output, magnetoresistive head with a CPP structure is disclosed which reduces or prevents deformation near the air bearing surface of the read element portion layer at the time of air bearing surface processing. In the CPP structure magnetoresistive head, the deformation near the air bearing surface as a result of mechanical polishing during the air bearing surface processing can be reduced by forming deformation prevention layers having a higher shear modulus than the first ferromagnetic layer, and a second ferromagnetic layer between a magnetoresistive film and at least one of a lower shield layer and an upper shield layer.Type: GrantFiled: January 3, 2006Date of Patent: December 26, 2006Assignee: Hitachi Global Storage Technologies Japan, Ltd.Inventors: Katsuro Watanabe, Kikuo Kusukawa, Taku Shintani, Kenichi Meguro
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Publication number: 20060278604Abstract: Embodiments of the invention provide a manufacturing method for thin magnetic heads capable of achieving narrow tracks, preventing shape defects and electrical short defects, as well as improving the production yield. Shape defects and short defects can be reduced and a high production yield achieved even with a narrow track width by lift-off technology utilizing planarizing techniques with CMP for forming the track width and stripe height and employing a process and structure for positioning the CMP dummy film.Type: ApplicationFiled: June 13, 2006Publication date: December 14, 2006Applicant: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Nobuo Yoshida, Taku Shintani, Hisako Takei
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Publication number: 20060132983Abstract: A high output magneto-resistive sensor is provided by suppressing leftover resist mask after lift-off and generation of a fence, and by making it easy to remove the redepositions deposited on the side wall in the track width direction or on the side wall in the sensor height direction of the magnetoresistive film. As a means to solve a fence and lift-off leftover of a resist in a process for forming a track and a process for forming a sensor height, a stopper layer is provided on the magnetoresistive film and the stopper layer on the refill film, and performing lift-off by CMP. By using a metallic material which has a small CMP polishing rate for at least the first stopper layer, the magnetoresistive film and the first stopper layer can be etched simultaneously and a pattern formed. As a result, decrease of the height of the resist mask by RIE can be suppressed and lift-off leftover can be prevented.Type: ApplicationFiled: November 29, 2005Publication date: June 22, 2006Applicant: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Masahiro Osugi, Taku Shintani, Katsuro Watanabe, Nobuo Yoshida
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Publication number: 20060109592Abstract: A high output, magnetoresistive head with a CPP structure is disclosed which reduces or prevents deformation near the air bearing surface of the read element portion layer at the time of air bearing surface processing. In the CPP structure magnetoresistive head, the deformation near the air bearing surface as a result of mechanical polishing during the air bearing surface processing can be reduced by forming deformation prevention layers having a higher shear modulus than the first ferromagnetic layer, and a second ferromagnetic layer between a magnetoresistive film and at least one of a lower shield layer and an upper shield layer.Type: ApplicationFiled: January 3, 2006Publication date: May 25, 2006Inventors: Katsuro Watanabe, Kikuo Kusukawa, Taku Shintani, Kenichi Meguro
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Patent number: 7031119Abstract: A high output, magnetoresistive head with a CPP structure is disclosed which reduces or prevents deformation near the air bearing surface of the read element portion layer at the time of air bearing surface processing. In the CPP structure magnetoresistive head, the deformation near the air bearing surface as a result of mechanical polishing during the air bearing surface processing can be reduced by forming deformation prevention layers having a higher shear modulus than a first ferromagnetic layer, and a second ferromagnetic layer between a magnetoresistive film and at least one of a lower shield layer and an upper shield layer.Type: GrantFiled: February 21, 2003Date of Patent: April 18, 2006Assignee: Hitachi, Ltd.Inventors: Katsuro Watanabe, Kikuo Kusukawa, Taku Shintani, Kenichi Meguro
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Publication number: 20060007603Abstract: Embodiments of the invention provide a high-output magnetic reading head by making it easy to remove a re-deposited substance that deposits on the side wall surface in the track width direction or the side wall surface in the sensor height direction of a magneto-resistance film in a fabrication process of the magnetic reading head. In one embodiment, a refill film that is fabricated first of a refill film along track width direction or a refill film along sensor height direction is fabricated such that a layer in contact with the magneto-resistance film is formed of a material that is slow in etching rate but possible to minimize deterioration of characteristics due to thermal treatment and a layer(s) other than the layer in contact with the magneto-resistance film is formed of a material(s) that is fast in etching rate.Type: ApplicationFiled: July 8, 2005Publication date: January 12, 2006Applicant: Hitachi Global Storage Technologies Netherlands B.V.Inventors: Kenichi Meguro, Taku Shintani, Katsuro Watanabe, Nobuo Yoshida
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Publication number: 20040257711Abstract: The influence of ion milling is extremely suppressed even in a composite magnetic thin film head comprising a magnetoresistive thin film head used by passing an electric current perpendicularly to a multilayer structure. The number of ion milling steps after the formation of a magnetoresistive thin film head is reduced as much as possible, whereby the influence of electrostatic charging arising from an ion milling apparatus is obviated. In specific embodiments, an inductive magnetic thin film head is first formed on a substrate, and thereafter a magnetoresistive thin film head is formed thereon. The magneto resistive thin film head includes a magneto resistive film having a multilayer structure and configured to be used by passing a detection current perpendicularly to the multilayer structure. In one embodiment, the inductive magnetic thin film head has a structure in which a coil is buried at the same horizontal position as a lower pole.Type: ApplicationFiled: June 18, 2004Publication date: December 23, 2004Applicant: Hitachi Global Storage Technologies, Japan , Ltd.Inventors: Masahiro Ushiyama, Ichiro Oodake, Katsuro Watanabe, Taku Shintani
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Publication number: 20040080873Abstract: A magnetic sensor includes a spacer having at least a nonmagnetic metal layer inserted between the upper shield layer and the longitudinal bias layers or between the upper shield layer and the longitudinal bias layers plus the magnetoresistive film, the shortest distance between the longitudinal bias layers and the free layer of the magnetoresistive film is set smaller than the shortest distance between the longitudinal bias layers and the upper shield layer, and this arrangement ensures that the amount of magnetic flux entering the magnetoresistive film from the longitudinal bias layers is larger than that absorbed by the upper shield layer, thus realizing a magnetic sensor whose Barkhausen noise is suppressed.Type: ApplicationFiled: February 5, 2003Publication date: April 29, 2004Inventors: Taku Shintani, Katsuro Watanabe, Masahiko Hatatani, Kikuo Kusukawa