Patents by Inventor Taku Sumitomo
Taku Sumitomo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8651701Abstract: A light source device that irradiates a discharge vessel with a laser beam to produce radiant light that is reflected by an ellipsoidal reflecting surface efficiently utilizes the light produced by directing the laser beam through an unirradiated region where reflected light from the ellipsoidal reflector is blocked by the discharge vessel, through an opening side of the ellipsoidal reflector to the discharge vessel. The discharge vessel has an emission substance enclosed inside which is excited by the laser beam and produces radiant light, is arranged at a focal point of the ellipsoidal reflector. A planar mirror, with which radiant light reflected by the ellipsoidal reflector is reflected in a different direction has a window in an unirradiated region where reflected light from the ellipsoidal reflector is blocked by the discharge vessel through which the laser beam passes to the discharge vessel.Type: GrantFiled: December 17, 2009Date of Patent: February 18, 2014Assignees: Ushio Denki Kabushiki Kaisha, Energetio Technology, Inc.Inventors: Yukio Yasuda, Taku Sumitomo, Masaki Kato
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Patent number: 8540757Abstract: A phototherapy device using excimer radiation in which, by skillful use of the individual peak wavelength of 308 nm and of the emission range of shorter wavelengths than 308 nm, the therapy effect is enhanced, and in which, at the same time, harm can be reduced is achieved using a XeCl excimer lamp and in which diseased sites of skin disorders are irradiated with UV-B radiation with an optical filter being used for changing the spectral shape of the UV-B radiation with which the diseased sites are irradiated.Type: GrantFiled: December 13, 2006Date of Patent: September 24, 2013Assignee: Ushiodenki Kabushiki KaishaInventors: Taku Sumitomo, Tatumi Hiramoto, Akimichi Morita
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Patent number: 8358069Abstract: A method of lighting a light source apparatus that has a discharge lamp, a reflection mirror for reflecting light emitted from the discharge lamp, a light emission optical system for irradiating a work piece with light, one or more laser oscillator for emitting a laser beam to the discharge lamp, and a discharge starting unit for starting discharge. The method includes removing deposits adhering to an inner face of the discharge lamp by irradiating a discharge vessel with the laser beam from the first laser oscillator, starting discharge in the discharge vessel by the discharge starting unit, and condensing the laser beam from a second laser oscillator, into the discharge vessel.Type: GrantFiled: March 4, 2010Date of Patent: January 22, 2013Assignees: Ushio Denki Kabushiki Kaisha, Engergetiq Technology, Inc.Inventors: Taku Sumitomo, Toshio Yokota
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Patent number: 8288947Abstract: In a light source device provided with a light emission tube in which a light emitting element is enclosed and at least one laser oscillator part for radiating a laser beam towards said light emission tube, for focusing a beam within a light emission tube with a large solid angle and for preventing that the beam with a high energy density impinges upon the wall of the light emission tube, the light emission tube has a tube wall, part of which is made to function as a focusing means, or the light emission tube has a focusing means at the inner surface thereof.Type: GrantFiled: October 13, 2010Date of Patent: October 16, 2012Assignees: Ushio Denki Kabushiki Kaisha, Energetiq Technology, Inc.Inventors: Toshio Yokota, Taku Sumitomo, Yukio Yasuda
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Patent number: 8253926Abstract: An exposure device for producing semiconductors and liquid crystals has an optical system capable of effectively using light generated without making a hole in a lamp discharge vessel when high energy laser light is supplied to it for emitting light, such as ultraviolet light. The exposure device has a light source for emitting ultraviolet light, a laser device for emitting laser light, an elliptical reflector for reflecting ultraviolet light emitted from the light source, and an optical system for directing light reflected by the elliptical reflector to an article to be treated via optical elements including a collimator lens and an integrator lens, and a beam splitter having a wavelength selecting ability provided in the optical path for light reflected by the elliptical reflector to allow laser light to be incident on the light source from and opening side of the elliptical reflector.Type: GrantFiled: September 24, 2009Date of Patent: August 28, 2012Assignees: Ushio Denki Kabushiki Kaisha, Energetiq Technology, Inc.Inventors: Taku Sumitomo, Kiyoyuki Kabuki, Toshio Yokota
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Patent number: 8242695Abstract: An laser driven light source comprises a bulb that encloses a discharge medium, a laser beam unit for emitting a laser beam, wherein the laser beam is focused in the bulb for generating a discharge, and a beam shield element that is provided in the bulb to shield peripheral devices from the laser beam, which passes through the discharge generated in the bulb.Type: GrantFiled: April 13, 2010Date of Patent: August 14, 2012Assignees: Ushio Denki Kabushiki Kaisha, Energetiq Technology, Inc.Inventors: Taku Sumitomo, Yukio Yasuda, Toshio Yokota
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Patent number: 8182127Abstract: A light source is provided. The light source includes: an elliptical reflection mirror having first and second focal points; a discharge chamber in which a luminescent substance is enclosed and which is disposed on the first focal point; a laser light generator which emits the laser light; and a laser light guide which guides the laser light from an opening side of the elliptical reflection mirror into the discharge chamber. The luminescent substance is excited by providing the laser light to the luminescent substance so as to emit light, and the light is reflected by the elliptical reflection mirror. The laser light guide is disposed in a shade area in which the light reflected by the elliptical reflection mirror is blocked by the discharge chamber.Type: GrantFiled: December 23, 2009Date of Patent: May 22, 2012Assignees: Ushio Denki Kabushiki Kaisha, Energetiq Technology, Inc.Inventors: Yukio Yasuda, Taku Sumitomo, Masaki Kato
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Publication number: 20110085337Abstract: In a light source device provided with a light emission tube in which a light emitting element is enclosed and at least one laser oscillator part for radiating a laser beam towards said light emission tube, for focusing a beam within a light emission tube with a large solid angle and for preventing that the beam with a high energy density impinges upon the wall of the light emission tube, the light emission tube has a tube wall, part of which is made to function as a focusing means, or the light emission tube has a focusing means at the inner surface thereof.Type: ApplicationFiled: October 13, 2010Publication date: April 14, 2011Applicant: USHIO DENKI KABUSHIKI KAISHAInventors: Toshio YOKOTA, Taku SUMITOMO, Yukio YASUDA
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Publication number: 20100264820Abstract: An laser driven light source comprises a bulb that encloses a discharge medium, a laser beam unit for emitting a laser beam, wherein the laser beam is focused in the bulb for generating a discharge, and a beam shield element that is provided in the bulb to shield peripheral devices from the laser beam, which passes through the discharge generated in the bulb.Type: ApplicationFiled: April 13, 2010Publication date: October 21, 2010Applicant: USHIO DENKI KABUSHIKI KAISHAInventors: Taku Sumitomo, Yukio Yasuda, Toshio Yokota
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Publication number: 20100225232Abstract: A method of lighting a light source apparatus that has a discharge lamp, a reflection mirror for reflecting light emitted from the discharge lamp, a light emission optical system for irradiating a work piece with light, one or more laser oscillator for emitting a laser beam to the discharge lamp, and a discharge starting unit for starting discharge. The method includes removing deposits adhering to an inner face of the discharge lamp by irradiating a discharge vessel with the laser beam from the first laser oscillator, starting discharge in the discharge vessel by the discharge starting unit, and condensing the laser beam from a second laser oscillator, into the discharge vessel.Type: ApplicationFiled: March 4, 2010Publication date: September 9, 2010Applicant: USHIO DENKI KABUSHIKI KAISHAInventors: Taku Sumitomo, Toshio Yokota
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Publication number: 20100164347Abstract: A light source device that irradiates a discharge vessel with a laser beam to produce radiant light that is reflected by an ellipsoidal reflecting surface efficiently utilizes the light produced by directing the laser beam through an unirradiated region where reflected light from the ellipsoidal reflector is blocked by the discharge vessel, through an opening side of the ellipsoidal reflector to the discharge vessel. The discharge vessel has an emission substance enclosed inside which is excited by the laser beam and produces radiant light, is arranged at a focal point of the ellipsoidal reflector. A planar mirror, with which radiant light reflected by the ellipsoidal reflector is reflected in a different direction has a window in an unirradiated region where reflected light from the ellipsoidal reflector is blocked by the discharge vessel through which the laser beam passes to the discharge vessel.Type: ApplicationFiled: December 17, 2009Publication date: July 1, 2010Applicant: USHIO DENKI KABUSHIKI KAISHAInventors: Yukio YASUDA, Taku SUMITOMO, Masaki KATO
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Publication number: 20100165656Abstract: A light source is provided. The light source includes: an elliptical reflection mirror having first and second focal points; a discharge chamber in which a luminescent substance is enclosed and which is disposed on the first focal point; a laser light generator which emits the laser light; and a laser light guide which guides the laser light from an opening side of the elliptical reflection mirror into the discharge chamber. The luminescent substance is excited by providing the laser light to the luminescent substance so as to emit light, and the light is reflected by the elliptical reflection mirror. The laser light guide is disposed in a shade area in which the light reflected by the elliptical reflection mirror is blocked by the discharge chamber.Type: ApplicationFiled: December 23, 2009Publication date: July 1, 2010Applicant: USHIO DENKI KABUSHIKI KAISHAInventors: Yukio YASUDA, Taku SUMITOMO, Masaki KATO
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Publication number: 20100164380Abstract: A light source is provided. The light source includes: a discharge lamp in which a pair of electrodes facing each other is disposed and a discharge medium is enclosed; and an energy beam irradiation unit that emits an energy beam toward a gap between the pair of electrodes. The energy beam irradiation unit emits the energy beam toward a bright spot that is formed near a tip end of the electrode when the discharge lamp is turned on by applying a voltage to the electrodes.Type: ApplicationFiled: December 23, 2009Publication date: July 1, 2010Applicant: USHIO DENKI KABUSHIKI KAISHAInventor: Taku SUMITOMO
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Publication number: 20100085549Abstract: An exposure device for producing semiconductors and liquid crystals has an optical system capable of effectively using light generated without making a hole in a lamp discharge vessel when high energy laser light is supplied to it for emitting light, such as ultraviolet light. The exposure device has a light source for emitting ultraviolet light, a laser device for emitting laser light, an elliptical reflector for reflecting ultraviolet light emitted from the light source, and an optical system for directing light reflected by the elliptical reflector to an article to be treated via optical elements including a collimator lens and an integrator lens, and a beam splitter having a wavelength selecting ability provided in the optical path for light reflected by the elliptical reflector to allow laser light to be incident on the light source from and opening side of the elliptical reflector.Type: ApplicationFiled: September 24, 2009Publication date: April 8, 2010Applicant: USHIODENKI KABUSHIKI KAISHAInventors: Taku SUMITOMO, Kiyoyuki KABUKI, Toshio YOKOTA
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Patent number: 7479645Abstract: An extreme UV radiation producing device in which adhesion of solid tin in the vacuum pump of an evacuation device is restricted, so that the maintenance period and the replacement period of the pump is prolonged is achieved by the provision of a treatment unit between a radiation source chamber and the evacuation device. The treatment device has a hydrogen radical producing part in which tin and/or a tin compound in the evacuated gas from the radiation source chamber is/are made into a tin hydride; and a heat treatment part in which the tin hydride is thermally decomposed and in which the tin produced liquefied and separated from the evacuated gas. The liquid tin is fed into a collecting/storage vessel and the evacuated gas from which the tin and/or a tin compound has been removed fed to the evacuation device.Type: GrantFiled: July 21, 2006Date of Patent: January 20, 2009Assignee: Ushiodenki Kabushiki KaishaInventors: Hironobu Yabuta, Taku Sumitomo
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Patent number: 7459708Abstract: To suppress the adherence of debris as a result of a radiating fuel, such as tin or the like, within a vessel for forming high density and high temperature plasma of an extreme UV radiation source device, and to eliminate deposited tin and/or tin compounds with high efficiency, hydrogen radical producing parts are provided in the vessel; and hydrogen radicals are produced in the vessel so that deposition of tin and/or a tin compound is suppressed in the area with a low temperature of the device, such as a focusing mirror or the like, and the deposited tin and/or tin compound is eliminated.Type: GrantFiled: January 24, 2006Date of Patent: December 2, 2008Assignee: Ushiodenki Kabushiki KaishaInventors: Masaki Inoue, Hironobu Yabuta, Taku Sumitomo, Kyohei Seki, Masaki Yoshioka
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Publication number: 20070233210Abstract: A phototherapy device which obtains an advantageous therapeutic effect and suppresses side effects at least to a certain degree by irradiation of diseased sites with therapeutic radiation with a spectrum in the UV-B radiation wavelength range that is continuous at least in the wavelength range of at most 303 nm with a lower boundary wavelength value of at least 297 nm. The phototherapy device has a light source which emits light with a spectrum having an emission peak in the wavelength range from 300 nm to 315 nm and which is continuous in the wavelength range of this emission peak at least up to 295 nm; and a radiation emission window in which the light from the light source is incident and via which the therapeutic radiation is emitted with a spectrum with a lower boundary value in the wavelength range from 297 nm to 303 nm.Type: ApplicationFiled: March 30, 2007Publication date: October 4, 2007Applicant: USHIODENKI KABUSHIKI KAISHAInventors: Akimichi Morita, Tatsumi Hiramoto, Taku Sumitomo, Makoto Kimura, Takashi Saga
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Publication number: 20070135872Abstract: A phototherapy device using excimer radiation in which, by skillful use of the individual peak wavelength of 308 nm and of the emission range of shorter wavelengths than 308 nm, the therapy effect is enhanced, and in which, at the same time, harm can be reduced is achieved using a XeCl excimer lamp and in which diseased sites of skin disorders are irradiated with UV-B radiation with an optical filter being used for changing the spectral shape of the UV-B radiation with which the diseased sites are irradiated.Type: ApplicationFiled: December 13, 2006Publication date: June 14, 2007Applicant: USHIODENKI KABUSHIKI KAISHAInventors: Taku SUMITOMO, Tatumi HIRAMOTO, Akimichi MORITA
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Publication number: 20070018119Abstract: An extreme UV radiation producing device in which adhesion of solid tin in the vacuum pump of an evacuation device is restricted, so that the maintenance period and the replacement period of the pump is prolonged is achieved by the provision of a treatment unit between a radiation source chamber and the evacuation device. The treatment device has a hydrogen radical producing part in which tin and/or a tin compound in the evacuated gas from the radiation source chamber is/are made into a tin hydride; and a heat treatment part in which the tin hydride is thermally decomposed and in which the tin produced liquefied and separated from the evacuated gas. The liquid tin is fed into a collecting/storage vessel and the evacuated gas from which the tin and/or a tin compound has been removed fed to the evacuation device.Type: ApplicationFiled: July 21, 2006Publication date: January 25, 2007Applicant: Ushiodenki Kabushiki KaishaInventors: Hironobu Yabuta, Taku Sumitomo
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Publication number: 20060163500Abstract: To suppress the adherence of debris as a result of a radiating fuel, such as tin or the like, within a vessel for forming high density and high temperature plasma of an extreme UV radiation source device, and to eliminate deposited tin and/or tin compounds with high efficiency, hydrogen radical producing parts are provided in the vessel; and hydrogen radicals are produced in the vessel so that deposition of tin and/or a tin compound is suppressed in the area with a low temperature of the device, such as a focusing mirror or the like, and the deposited tin and/or tin compound is eliminated.Type: ApplicationFiled: January 24, 2006Publication date: July 27, 2006Applicant: Ushiodenki Kabushiki KaishaInventors: Masaki Inoue, Hironobu Yabuta, Taku Sumitomo, Kyohei Seki, Masaki Yoshioka