Abstract: An image forming apparatus includes a first rotatable member, a second rotatable member, an air nozzle, and a pipe. The pipe includes a portion provided in a range overlapping with the first rotatable member and making one reciprocation or more in a case that when a direction crossing a feeding direction of a recording material fed in a nip is a widthwise direction of the first rotatable member, the pipe is viewed in a direction perpendicular to the widthwise direction.

Abstract: An image forming apparatus includes a first rotatable member, a second rotatable member, an air nozzle, and a pipe. The pipe includes a portion extending along a widthwise direction of the first rotatable member perpendicular to a recording material feeding direction.

Abstract: An image forming apparatus includes a reception unit to receive a job, heating and pressing rotary members to form a nip portion, and a spraying member having a nozzle and a cylinder. The nozzle discharges air to the heating rotary member and a recording material. During a period after the reception unit receives the job and before a leading edge of a first sheet of the recording material reaches the nip portion, the spraying member performs a spraying operation of spraying air in an amount greater than or equal to a predetermined amount. The air that the spraying member sprays on the first sheet of the recording material during the job is higher in temperature than the air that the spraying member sprays during the period after the reception unit receives the job and before the leading edge of the first sheet of the recording material reaches the nip portion.

Abstract: A photoelectric-surface electron source includes: a glass substrate that receives laser light from a substrate light-receiving surface including microlenses and that focuses the laser light toward a substrate main surface located on the opposite side from the substrate light-receiving surface; a photoelectric surface that is provided to the substrate main surface, and that receives the focused laser light and emits photoelectrons; and an extraction electrode that is fixed to the substrate main surface and that extracts the photoelectrons from the photoelectric surface. The extraction electrode is disposed away from the photoelectric surface along the normal direction of the substrate main surface and has: an electrode part in which electrode holes for allowing the photoelectrons to pass therethrough are provided; and a frame part that is fixed to a region surrounding the photoelectric surface in the substrate main surface.

Abstract: To provide a method for producing a fluorovinyl ether compound, whereby it is possible to suppress the generation of byproducts. The method for producing a fluorovinyl ether compound of the present invention is a method for producing a fluorovinyl ether compound, which comprises heat-treating a compound having a group represented by the formula (1): F—C(?O)—CF(X)—(CF2)n—O— in the presence of an oxide containing at least one element selected from the group consisting of alkali metal elements and alkaline earth metal elements, to obtain a fluorovinyl ether compound having a group represented by the formula (2): CF2?CF—O—, wherein the specific surface area of the oxide before the heat treatment is at least 1.0 m2/g. In the formula (1), n is 0 or 1, wherein when n is 0, X is CF3 and when n is 1, X is F.

Abstract: The present invention relates to an adsorbent including: an inorganic porous body; and an amine compound, in the inorganic porous body has an oil absorption value of 230 ml/100 g or more, and a peak diameter of a pore size, which is obtained based on a nitrogen adsorption method, of 20 nm or more and 100 nm or less. The present invention relates to an adsorbent including: an inorganic porous body; and an amine compound, in which the inorganic porous body has a pore volume of 1.2 cm3/g or more and 3.5 cm3/g or less, and a peak diameter of a pore size, which is obtained based on a nitrogen adsorption method, of 20 nm or more and 100 nm or less.

Abstract: A photoelectric surface electron source includes a glass substrate configured to receive laser light incident from a substrate back surface to emit the laser light from a substrate main surface, a photoelectric surface provided on the substrate main surface and configured to receive the laser light and emit a photoelectron, a lens array disposed on the substrate back surface and including a plurality of microlenses for condensing the laser light toward the photoelectric surface, and a light shielding portion provided on the glass substrate. The light shielding portion has a back surface-side light shielding layer provided on a back surface-side light shielding surface interposed between the plurality of microlenses on the substrate back surface, and a main surface-side light shielding layer provided on a main surface-side light shielding surface.

Abstract: According to one aspect of the present invention, an electron beam irradiation apparatus includes a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate electron beams from a side of a back surface; a blanking aperture array mechanism provided with passage holes corresponding to the electron beams and configured to perform deflection control on each of the plurality of electron beams passing through the passage holes; and an adjustment mechanism configured to adjust at least one of an orbit of transmitted light that passes through at least one of arrangement objects including the photoelectric surface, the blanking aperture array mechanism, and the limit aperture substrate up to the stage and reaches the stage, among an irradiated excitation light, and an orbit of the electron beams, wherein the arrangement objects shield at least a part of the transmitted light.

Abstract: A multiple electron beam writing apparatus includes an excitation light source to emit an excitation light, a multi-lens array to divide the excitation light into a plurality of lights, a photoemissive surface to receive the plurality of lights incident through its upper side, and emit multiple photoelectron beams from its back side, a blanking aperture array mechanism to provide, by deflecting each beam of the multiple photoelectron beams, an individual blanking control which individually switches each beam between ON and OFF, an electron optical system to include an electron lens, and to irradiate, using the electron lens, a target object with the multiple photoelectron beams having been controlled to be beam ON, and a control circuit to interconnect, for each shot of the multiple photoelectron beams, a timing of switching the excitation light between emission and non-emission with a timing of switching the each beam between ON and OFF.

Abstract: In one embodiment, a multi-charged-particle-beam writing method includes dividing a data path into a plurality of first blocks based on at least either one of each of a plurality of input/output circuits and a plurality of wiring groups, and calculating a first shift amount for multiple beams for each of the plurality of first blocks. The data path is for inputting control data to a cell array on a blanking aperture array substrate. The control data is for controlling ON/OFF of each beam of the multiple beams. Each of the plurality of wiring groups includes a plurality of pieces of wiring connected to the plurality of input/output circuits and grouped together based on inter-wiring distance. The first shift amount is due to at least one of an electric field and a magnetic field for each of the plurality of first blocks. An irradiation position or a dose of the multiple beams is corrected based on the first shift amount, and irradiation is performed.

Abstract: A method for controlling operation of an electron emission source includes acquiring, while varying an emission current of an electron beam, a characteristic between a surface current of a target object at a position on the surface of the target object irradiated with the electron beam, and the emission current, calculating, based on the characteristic, first gradient values each obtained by dividing the surface current of the target object by the emission current, in a predetermined range of the emission current in the characteristic, calculating a second gradient value by dividing a surface current of the target object by an emission current in a state where the electron beam has been adjusted, and adjusting a cathode temperature to make the second gradient value in the state where the electron beam has been adjusted be in the range of the first gradient values in the predetermined range of the emission current.

Abstract: A difference between a calculated amount of drift and an actual amount of drift is reduced.

Abstract: A method of producing a hydrofluoroolefin includes reacting a chlorofluoroolefin that is represented by Formula (I) or Formula (II) and that has 8 or less carbon atoms with a hydrogen molecule, in the presence of an intermetallic compound containing at least one first metal that is selected from the group consisting of palladium, platinum, rhodium, copper and iridium, and containing a second metal that is different from the first metal, to obtain a hydrofluoroolefin in which a hydrogen atom is substituted for at least a chlorine atom represented by Cl among chlorine atoms contained in Formula (I) or Formula (II).

Abstract: According to one aspect of the present invention, an electron beam irradiation apparatus includes a photoelectric surface configured to receive irradiation of excitation light on a side of a front surface, and generate electron beams from a side of a back surface; a blanking aperture array mechanism provided with passage holes corresponding to the electron beams and configured to perform deflection control on each of the plurality of electron beams passing through the passage holes; and an adjustment mechanism configured to adjust at least one of an orbit of transmitted light that passes through at least one of arrangement objects including the photoelectric surface, the blanking aperture array mechanism, and the limit aperture substrate up to the stage and reaches the stage, among an irradiated excitation light, and an orbit of the electron beams, wherein the arrangement objects shield at least a part of the transmitted light.

Abstract: A method for controlling operation of an electron emission source includes acquiring, while varying an emission current of an electron beam, a characteristic between a surface current of a target object at a position on the surface of the target object irradiated with the electron beam, and the emission current, calculating, based on the characteristic, first gradient values each obtained by dividing the surface current of the target object by the emission current, in a predetermined range of the emission current in the characteristic, calculating a second gradient value by dividing a surface current of the target object by an emission current in a state where the electron beam has been adjusted, and adjusting a cathode temperature to make the second gradient value in the state where the electron beam has been adjusted be in the range of the first gradient values in the predetermined range of the emission current.

Abstract: A multiple electron beam writing apparatus includes an excitation light source to emit an excitation light, a multi-lens array to divide the excitation light into a plurality of lights, a photoemissive surface to receive the plurality of lights incident through its upper side, and emit multiple photoelectron beams from its back side, a blanking aperture array mechanism to provide, by deflecting each beam of the multiple photoelectron beams, an individual blanking control which individually switches each beam between ON and OFF, an electron optical system to include an electron lens, and to irradiate, using the electron lens, a target object with the multiple photoelectron beams having been controlled to be beam ON, and a control circuit to interconnect, for each shot of the multiple photoelectron beams, a timing of switching the excitation light between emission and non-emission with a timing of switching the each beam between ON and OFF.

Abstract: Drift correction is performed with high accuracy while reducing the calculation amount.

Abstract: Drift correction is performed with high accuracy while reducing the calculation amount.

Abstract: A planar illumination device according to an embodiment includes a light source and a light guide plate. The light source emits light in a predetermined direction. The light guide plate includes a side surface, an emission surface as one of principal surfaces, and a back surface as the other principal surface, the back surface including a prism formed thereon, the prism emitting, through an emission surface, light emitted from the light source and entered from the side surface. The prism includes, at a section parallel to the predetermined direction, a first region substantially parallel to the emission surface and a second region tilted relative to the emission surface, the first region and the second region extending in a direction oblique to the predetermined direction.