Patents by Inventor Takuaki Sekiguchi
Takuaki Sekiguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8254662Abstract: A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.Type: GrantFiled: September 13, 2011Date of Patent: August 28, 2012Assignee: Hitachi High-Technologies CorporationInventors: Hidetoshi Nishiyama, Minori Noguchi, Tetsuya Watanabe, Takuaki Sekiguchi
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Publication number: 20120002196Abstract: A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.Type: ApplicationFiled: September 13, 2011Publication date: January 5, 2012Inventors: Hidetoshi Nishiyama, Minori Noguchi, Tetsuya Watanabe, Takuaki Sekiguchi
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Patent number: 8045148Abstract: A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.Type: GrantFiled: March 2, 2009Date of Patent: October 25, 2011Assignee: Hitachi High-Technologies CorporationInventors: Hidetoshi Nishiyama, Minori Noguchi, Tetsuya Watanabe, Takuaki Sekiguchi
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Patent number: 7953567Abstract: A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors.Type: GrantFiled: January 7, 2010Date of Patent: May 31, 2011Assignee: Hitachi High-Technologies CorporationInventors: Kei Shimura, Minori Noguchi, Masaaki Ito, Kenji Aiko, Shuichi Chikamatsu, Shigeo Otsuki, Shigeru Abe, Masayuki Ochi, Takuaki Sekiguchi, Hiroyuki Yamashita
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Publication number: 20100106443Abstract: A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors.Type: ApplicationFiled: January 7, 2010Publication date: April 29, 2010Applicant: Hitachi High-Technologies CorporationInventors: Kei Shimura, Minori Noguchi, Masaaki Ito, Kenji Aiko, Shuichi Chikamatsu, Shigeo Otsuki, Shigeru Abe, Masayuki Ochi, Takuaki Sekiguchi, Hiroyuki Yamashita
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Patent number: 7672799Abstract: A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors.Type: GrantFiled: August 29, 2007Date of Patent: March 2, 2010Assignee: Hitachi High-Technologies CorporationInventors: Kei Shimura, Minori Noguchi, Masaaki Ito, Kenji Aiko, Shuichi Chikamatsu, Shigeo Otsuki, Shigeru Abe, Masayuki Ochi, Takuaki Sekiguchi, Hiroyuki Yamashita
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Publication number: 20090177413Abstract: A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.Type: ApplicationFiled: March 2, 2009Publication date: July 9, 2009Inventors: Hidetoshi Nishiyama, Minori Noguchi, Tetsuya Watanabe, Takuaki Sekiguchi
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Patent number: 7499157Abstract: A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.Type: GrantFiled: March 23, 2007Date of Patent: March 3, 2009Assignee: Hitachi Electronics Engineering Co, Ltd.Inventors: Hidetoshi Nishiyama, Minori Noguchi, Tetsuya Watanabe, Takuaki Sekiguchi
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Publication number: 20080059094Abstract: A defect inspection apparatus includes: stages each mounting an inspecting object on which a circuit pattern having a group of parallel lines is formed, and each running perpendicular or parallel to the group of lines; an illumination optical system which illuminating a surface of the inspecting object with a slit beam being slit light so that a longitudinal direction of the slit beam is substantially perpendicular to the running directions of the stages, and which has a first inclined angle formed by the direction of the group of lines and a projection line, of an optical axis of the slit beam, to the inspecting object; a spatial filter that shields or transmits reflected and scattered light of the inspecting object according to a difference in distribution of orientation; and a detection optical system that detects the reflected and scattered light transmitted through the spatial filter by image sensors.Type: ApplicationFiled: August 29, 2007Publication date: March 6, 2008Applicant: Hitachi High-Technologies CorporationInventors: Kei SHIMURA, Minori Noguchi, Masaaki Ito, Kenji Aiko, Shuichi Chikamatsu, Shigeo Otsuki, Shigeru Abe, Masayuki Ochi, Takuaki Sekiguchi, Hiroyuki Yamashita
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Publication number: 20070165212Abstract: A system for monitoring foreign matter includes a manufacturing line having plural process processing apparatuses, a production management system which manages the processing of workpieces in the manufacturing line, plural optical heads which monitor foreign matter in relation to at least one of the workpieces, and which provide an output signal indicative thereof, and at least one image signal processing unit provided in a lesser number than a number of the plural optical heads for processing the output signal therefrom.Type: ApplicationFiled: March 23, 2007Publication date: July 19, 2007Inventors: Hidetoshi Nishiyama, Minori Noguchi, Tetsuya Watanabe, Takuaki Sekiguchi
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Patent number: 7196785Abstract: A foreign matter monitoring system comprises: a production management system which manages the processing of workpieces in a manufacture line; foreign matter monitors mounted as on-machine equipment in plural process processing apparatuses of the manufacture line, said foreign matter monitors each having an optical head containing a detecting optical system for irradiating a workpiece with light and a detecting optical system for receiving reflected and scattered light from the workpiece and converting the received light to a detection image signal and an A/D converter for converting the detection image signal, which is obtained through conversion by the detecting optical system, to a detection digital image signal; and a base system having a control unit for acquiring control information, a buffer memory for storing said detection digital image signal which is acquired from each foreign matter monitor, a database storing inspection recipes each associated with a foreign matter monitor and an image signal proType: GrantFiled: July 31, 2003Date of Patent: March 27, 2007Assignee: Hitachi High-Technologies CorporationInventors: Hidetoshi Nishiyama, Minori Noguchi, Tetsuya Watanabe, Takuaki Sekiguchi
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Publication number: 20040021856Abstract: A foreign matter monitoring system comprises: a production management system which manages the processing of workpieces in a manufacture line; foreign matter monitors mounted as on-machine equipment in plural process processing apparatuses of the manufacture line, said foreign matter monitors each having an optical head containing a detecting optical system for irradiating a workpiece with light and a detecting optical system for receiving reflected and scattered light from the workpiece and converting the received light to a detection image signal and an A/D converter for converting the detection image signal, which is obtained through conversion by the detecting optical system, to a detection digital image signal; and a base system having a control unit for acquiring control information, a buffer memory for storing said detection digital image signal which is acquired from each foreign matter monitor, a database storing inspection recipes each associated with a foreign matter monitor and an image signal proType: ApplicationFiled: July 31, 2003Publication date: February 5, 2004Inventors: Hidetoshi Nishiyama, Minori Noguchi, Tetsuya Watanabe, Takuaki Sekiguchi