Abstract: A deposition apparatus includes a transport mechanism including a transport carrier which holds and transports a substrate and transport modules which constitute a transport path through which the transport carrier moves, an alignment chamber in which the substrate held by the transport carrier is loaded and a mask is positioned and fixed to the loaded substrate, a deposition chamber in which the substrate held by the transport carrier is loaded from the alignment chamber and deposition materials are deposited on the loaded substrate, and control means which controls a magnetic force generated between a plurality of magnets arranged in the transport carrier in a transport direction of the substrate and a plurality of coils arranged to face the plurality of magnets in each transport module by applying a current or a voltage to the plurality of coils.