Patents by Inventor Takuhiro Kimura

Takuhiro Kimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9034810
    Abstract: The present invention is directed to provide a semiconductor surface treating agent; composition which is capable of stripping an anti-reflection coating layer, a resist layer, and a cured resist layer in the production process of a semiconductor device and the like easily and in a short time, as well as a method for treating a semiconductor surface, comprising that the composition is used.
    Type: Grant
    Filed: September 1, 2010
    Date of Patent: May 19, 2015
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Hironori Mizuta, Takuhiro Kimura
  • Publication number: 20120157368
    Abstract: The present invention is directed to provide a semiconductor surface treating agent composition which is capable of stripping an anti-reflection coating layer, a resist layer, and a cured resist layer in the production process of a semiconductor device and the like easily and in a short time, as well as a method for treating a semiconductor surface, comprising that the composition is used.
    Type: Application
    Filed: September 1, 2010
    Publication date: June 21, 2012
    Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.
    Inventors: Hironori Mizuta, Takuhiro Kimura
  • Patent number: 7049464
    Abstract: A process for producing an aminoalkylsulfonic acid of formula [2]: wherein R1 and R2 are each independently hydrogen, alkyl, aryl or aralkyl; and R3 and R4 are each independently hydrogen or alkyl, comprising reacting an aminoalkylsulfonate salt of formula [1]: wherein M is alkali metal, organic ammonium or ammonium ion; and R1 to R4 are as described above, an aqueous solution thereof, or a solution dissolving any one of them in a water-soluble organic solvent, selected from alcohols having 1 to 3 carbon, carboxylic acids having 2 to 12 carbon and dimethylformamide, with an organic acid; and a method of salt exchange for an aminoalkylsulfonate salt of formula [1?]: wherein M? is alkali metal, organic ammonium or ammonium ion; and R1 and R4 are as described above, comprising reacting the aminoalkylsulfonate salt formula [2] with a hydroxide of formula [6]: M?OH[6] wherein M? is as described above, in alcohol or water.
    Type: Grant
    Filed: August 27, 2003
    Date of Patent: May 23, 2006
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Takuhiro Kimura, Tsutomu Tani, Reiji Miyahara
  • Publication number: 20050261370
    Abstract: A process for producing an aminoalkylsulfonic acid of formula [2]: wherein R1 and R2 are each independently hydrogen, alkyl, aryl or aralkyl; and R3 and R4 are each independently hydrogen or alkyl, comprising reacting an aminoalkylsulfonate salt of formula [1]: wherein M is alkali metal, organic ammonium or ammonium ion; and R1 to R4 are as described above, an aqueous solution thereof, or a solution dissolving any one of them in a water-soluble organic solvent, selected from alcohols having 1 to 3 carbon, carboxylic acids having 2 to 12 carbon and dimethylformamide, with an organic acid; and a method of salt exchange for an aminoalkylsulfonate salt of formula [1?]: wherein M? is alkali metal, organic ammonium or ammonium ion; and R1 and R4 are as described above, comprising reacting the aminoalkylsulfonate salt formula [2] with a hydroxide of formula [6]: M?OH??[6] wherein M? is as described above, in alcohol or water.
    Type: Application
    Filed: August 27, 2003
    Publication date: November 24, 2005
    Inventors: Takuhiro Kimura, Tsutomo Tani, Reiji Miyahara
  • Patent number: 6414159
    Abstract: The present invention provides a method for preparation of a quaternary ammonium salt comprising reacting an alkyl halide with 2 equimolar amount or more per the alkyl halide of a pyridine compound or an N-lower alkyl imidazole at 120° C. to 350° C., and a method for the continuous production of a quatemary ammonium salt comprises introducing continuously an alkyl halide and 2 equimolar amount or more per the alkyl halide of a pyridine compound or an N-lower alkyl imidazole into a pipe reactor from the one end thereof under heating at 120 to 350° C. to pass through the pipe reactor wherein a reaction is allowed to take place, and taking out continuously the resulting quaternary ammonium salt from the other end of the reactor.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: July 2, 2002
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Kimihiko Sano, Yoji Urano, Takuhiro Kimura, Atsunori Sano
  • Publication number: 20010018526
    Abstract: The present invention provides a method for preparation of a quaternary ammonium salt comprising reacting an alkyl halide with 2 equimolar amount or more per the alkyl halide of a pyridine compound or an N-lower alkyl imidazole at 120° C. to 350°C., and a method for the continuous production of a quatemary ammonium salt comprises introducing continuously an alkyl halide and 2 equimolar amount or more per the alkyl halide of a pyridine compound or an N-lower alkyl imidazole into a pipe reactor from the one end thereof under heating at 120 to 350° C. to pass through the pipe reactor wherein a reaction is allowed to take place, and taking out continuously the resulting quaternary ammonium salt from the other end of the reactor.
    Type: Application
    Filed: February 9, 2001
    Publication date: August 30, 2001
    Applicant: WAKO PURE CHEMICAL INDUSTRIES, LTD.
    Inventors: Kimihiko Sano, Yoji Urano, Takuhiro Kimura, Atsunori Sano