Patents by Inventor Takuji Taguchi

Takuji Taguchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Resin for thermal imprinting
    Patent number: 9242407
    Abstract: A cyclic-olefin-based thermoplastic resin for thermal imprint to be used in the production of a sheet or a film which contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]<30. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved.
    Type: Grant
    Filed: August 1, 2014
    Date of Patent: January 26, 2016
    Assignees: SCIVAX CORPORATION, MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Toshifumi Takemori, Yoshiaki Takaya, Takahito Mita, Tetsuya Iizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
  • RESIN FOR THERMAL IMPRINTING
    Publication number: 20140339735
    Abstract: A cyclic-olefin-based thermoplastic resin for thermal imprint to be used in the production of a sheet or a film which contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]<30. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved.
    Type: Application
    Filed: August 1, 2014
    Publication date: November 20, 2014
    Inventors: Takemori Toshifumi, Yoshiaki Takaya, Takahito Mita, Tetsuya Iizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
  • Resin for thermal imprint
    Patent number: 8721950
    Abstract: A resin for thermal imprint include a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg(° C.
    Type: Grant
    Filed: November 1, 2012
    Date of Patent: May 13, 2014
    Assignees: Scivax Corporation, Maruzen Petrochemical Co., Ltd.
    Inventors: Takemori Toshifumi, Yoshiaki Takaya, Takahito Mita, Tetsuya Iizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
  • Resin for thermal imprint
    Patent number: 8324332
    Abstract: A resin for thermal imprint including a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg (° C.
    Type: Grant
    Filed: August 25, 2006
    Date of Patent: December 4, 2012
    Assignees: Scivax Corporation, Maruzen Petrochemical Co., Ltd.
    Inventors: Takemori Toshifumi, Yoshiaki Takaya, Takahito Mita, Tetsuya Iizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
  • Resin for Thermal Imprinting
    Publication number: 20100019410
    Abstract: A cyclic-olefin-based thermoplastic resin for thermal imprint to be used in the production of a sheet or a film which contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]<30. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg(° C.
    Type: Application
    Filed: July 12, 2006
    Publication date: January 28, 2010
    Applicants: SCIVAX CORPORATION, MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Takemori Toshifumi, Yoshiaki Takaya, Takahito Mita, Tetsuya Lizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
  • Resin for Thermal Imprint
    Publication number: 20100013122
    Abstract: A resin for thermal imprint comprises a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260 ° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved. Tg (° C.
    Type: Application
    Filed: August 25, 2006
    Publication date: January 21, 2010
    Applicants: SCIVAX CORPORATON, MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Takemori Toshifumi, Yoshiaki Takaya, Takahito Mita, Tetsuya Iizuka, Yuji Hashima, Takahisa Kusuura, Mitsuru Fujii, Takuji Taguchi, Anupam Mitra
  • Method and unit for regeneration of solution for cleaning glass, method and unit for cleaning silicate glass, and cathode-ray tube
    Patent number: 6521575
    Abstract: A treatment solution (2) containing fluoride is added to a cleaning solution (1) drained from a cleaning tank (11). Fluoride is allowed to react with fluorosilicic acid in the cleaning solution to settle a precipitate (4) containing fluorosilicate, and the precipitate (4) is removed. The cleaning solution regenerated in a regeneration apparatus (10) is again returned to the cleaning tank (11), and used as a cleaning solution for a CRT panel (20).
    Type: Grant
    Filed: April 6, 2000
    Date of Patent: February 18, 2003
    Assignees: Matsushita Electric Industrial Co., Ltd., Kaken Co.
    Inventors: Kenji Fujiwara, Hisanori Yatoh, Masao Gotoh, Juichi Sasada, Masanori Yamauchi, Katsuyoshi Tatenuma, Osamu Arai, Takuji Taguchi