Abstract: A center shift amount estimating apparatus for estimating a deviation between a rotation axis of the sample and a center of a detector with respect to an X-ray source in a CT device, comprises a region specifying unit for specifying a region of interest in a reconstructed uncorrected image to avoid an area where there is an extremely different pixel value from the surrounding area, a temporary correction unit for correcting an assumed center shift amount to reconstruct a temporarily corrected image with respect to the region of interest, an index analyzing unit for searching an extreme value of an index representing variation of pixel values in the temporarily corrected image, and a center shift amount specifying unit for specifying an actual center shift amount with respect to the extreme value.

Abstract: A correction apparatus reduces calculation costs for correcting artifacts due to a beam hardening effect in reconstructing a CT image by correcting an artifact due to a beam hardening effect caused in reconstructing a CT image. The correction apparatus includes processing circuitry configured to acquire an incident X-ray distribution, acquire a linear absorption coefficient model representing an energy dependency of a linear absorption coefficient by a scale factor including a parameter, acquire a projection image, and correct the projection image using the incident X-ray distribution and the linear absorption coefficient model.

Abstract: The correction apparatus comprises a projection image acquiring section for acquiring a measured projection image, a virtual energy setting section for setting a virtual energy different from the measured energy that is the energy of the X-ray irradiated at the time of acquiring the measured projection image, a dual energy decomposing section for calculating a projection image under an assumed condition at the time of irradiating the X-ray of the virtual energy and performing dual energy decomposition, a consistency index evaluating section for evaluating a temporarily corrected image obtained by the dual energy decomposition with a consistency index to identify an optimum condition among the assumed conditions, and a correction image generating section for generating a projection image under the optimum condition as a corrected image.

Abstract: A processing apparatus, a system, a method and a program for applying non-negative matrix factorization to one or more measured profiles of X-ray powder diffraction based on known information are provided. A processing apparatus for applying non-negative matrix factorization to a measured profile of X-ray powder diffraction comprises a measured profile acquiring section for acquiring one or more measured profiles, a known information acquiring section for acquiring known information including a shape of a predetermined profile corresponding to a background or a predetermined substance included in the measured profile, or a restriction of a coefficient matrix of the predetermined profile, and a decomposition section for applying non-negative matrix factorization to the measured profile based on the known information.

Abstract: A tolerance error estimating apparatus, method, program, reconstruction apparatus and control apparatus capable of estimating a deviation of a drive axis from a reference position with respect to driving time are provided. A tolerance error estimating apparatus (processing apparatus 300) X-ray analysis apparatus comprises a specific position calculating section 320 for obtaining a specific position of a reference sample at each rotation driving time from X-ray detection images and a deviation amount calculating section 330 for calculating the deviation amount ?x in the x direction and ?y in the y direction of the center position of a rotation drive shaft as the rotation drive axis at each rotation driving time from the reference position based on the specific position, when the z direction of the orthogonal coordinate system fixed to the sample is set the direction parallel to the rotation drive axis.

Abstract: A system that can reduce the cost for correcting artifacts due to motion in the reconstruction of CT images includes acquiring the temporarily corrected projection image and determining the reference center position correction function and the parameter of the temporary reference center position correction function by calculating a degree of coincidence between the temporarily corrected projection image and the projection image at the imaging angle opposing thereto, and correcting the main imaging data or the projection image based on the main imaging data using the reference center position correction function and the relative motion correction function.

Abstract: Correcting artifacts by motion according to reconstruction of a CT image includes circuitry configured to acquire a projection image of 360-degree scanning; calculate a motion amount using parameters by setting a motion model including the parameters; calculate a relative motion amount of a projection data from the projection data of the projection image and opposite data thereto; prepare a fixed-point equation including the motion amount and the relative motion amount; determine the parameters in the motion model by self-consistently solving the fixed-point equation; and correct the projection image using the motion amount.

Abstract: A sequential data analysis unit that cyclically generates a model for analyzing time-series data representing an operational status of an analysis target system using a clustering technology; and a management unit that manages the model, parameter information of the model, a classification result of the time-series data by the clustering technology, and version information given each time the model is generated are included. Then, when the version information of the model is selected, the management unit executes processing of regenerating the model by using the parameter information associated with the selected version information and the classification result of the time-series data.

Abstract: The angle error estimating apparatus 310 comprises a storing section 315 for storing a series of projection data of an X-ray CT and control values of projection angles respectively associated with the projection data, a temporary correction section 330 for correcting the control values of the projection angles to temporary correction values with an error model using an assumed parameter, a temporary reconstruction section 332 for reconstructing a plurality of temporarily corrected images using the temporary correction values of the projection angles for each of different projection data sets composed of a part of the series of projection data, a consistency evaluating section 340 for evaluating consistency of the plurality of temporarily corrected images, and a parameter determining section 345 for determining an optimum parameter used for the error model based on the evaluated consistency.

Abstract: A tolerance error estimating apparatus, method, program, reconstruction apparatus and control apparatus capable of estimating a deviation of a drive axis from a reference position with respect to driving time are provided. A tolerance error estimating apparatus (processing apparatus 300) X-ray analysis apparatus comprises a specific position calculating section 320 for obtaining a specific position of a reference sample at each rotation driving time from X-ray detection images and a deviation amount calculating section 330 for calculating the deviation amount ?x in the x direction and ?y in the y direction of the center position of a rotation drive shaft as the rotation drive axis at each rotation driving time from the reference position based on the specific position, when the z direction of the orthogonal coordinate system fixed to the sample is set the direction parallel to the rotation drive axis.

Abstract: A center shift amount estimating apparatus for estimating a deviation between a rotation axis of the sample and a center of a detector with respect to an X-ray source in a CT device, comprises a region specifying unit for specifying a region of interest in a reconstructed uncorrected image to avoid an area where there is an extremely different pixel value from the surrounding area, a temporary correction unit for correcting an assumed center shift amount to reconstruct a temporarily corrected image with respect to the region of interest, an index analyzing unit for searching an extreme value of an index representing variation of pixel values in the temporarily corrected image, and a center shift amount specifying unit for specifying an actual center shift amount with respect to the extreme value.

Abstract: An imprint apparatus includes a template holder configured to hold a template that has a pattern formed thereon, the pattern to be transferred to a substrate by an imprinting process, a stage configured to hold the substrate, a liquid ejecting device configured to eject a resin precursor onto the substrate, an electric field plate configured to apply an electric field to the resin precursor on the substrate, and an electric field controller configured to apply a voltage to the electric field plate.

Abstract: A pattern forming device uses a template having a plurality of protrusions and recesses configured to imprint a reverse image thereof on a resin on a substrate. The pattern forming device has a holding part, a stage, a driving part, and a curing part. The holding part includes a contact portion having a friction reducing contact portion, which is configured to engage against the template to hold the template. The stage carries the substrate. The driving part is configured to move at least one of the holding part and the stage to have the pattern in contact with the resin. The curing part cures the resin. The contact portion has a main body portion configured to move forward/backward with respect to the template and a tip portion arranged on the main body portion.

Abstract: According to one embodiment, an imprinting apparatus includes an ejecting unit, a stage, a moving unit, and an observation unit. The ejecting unit ejects and drips a hardening resin material onto a substrate to be processed. The substrate to be processed is placed onto the stage. The moving unit relatively moves the ejecting unit and the stage. The observation unit observes the dripped hardening resin material and the pattern with the state in which the dripped hardening resin material and the pattern are overlaid on a plane, before the template is brought into contact with the hardening resin material.

Abstract: According to one embodiment, the template treatment method includes a substrate having a principal surface, a first pattern formed on the principal surface and including a plurality of recesses, and a second pattern formed on the principal surface at a position different from the first pattern and including a plurality of recesses. The first pattern contains a first material and the second pattern contains a second material different from the first material. The second pattern is coated with a coating containing a third material different from the first and second materials. The template is cleaned while the second pattern is coated. After the coating is removed, the second pattern is exposed.

Abstract: According to one embodiment, a mold cleaning apparatus includes a holding unit, a medium supply unit and a deformation unit. The holding unit is configured to hold a mold. The mold has a concave pattern feature. The concave pattern feature is provided on a first surface of a base plate. The medium supply unit is configured to supply a medium to the concave pattern feature. The deformation unit is configured to bend the mold such that the first surface of the mold is convex.

Abstract: In an imprint method according to one embodiment, a template on which a template pattern is formed is pushed against resist on a substrate to be transferred while the resist is cured in this state. The template is subsequently separated from the cured resist. The template is then degassed from the template pattern surface side between after the template is separated from the cured resist and till the template is pushed against resist at the next shot.

Abstract: According to one embodiment, an imprinting apparatus includes an ejecting unit, a stage, a moving unit, and an observation unit. The ejecting unit ejects and drips a hardening resin material onto a substrate to be processed. The substrate to be processed is placed onto the stage. The moving unit relatively moves the ejecting unit and the stage. The observation unit observes the dripped hardening resin material and the pattern with the state in which the dripped hardening resin material and the pattern are overlaid on a plane, before the template is brought into contact with the hardening resin material.

Abstract: According to one embodiment, an imprinting apparatus includes an ejecting unit, a stage, a moving unit, and an observation unit. The ejecting unit ejects and drips a hardening resin material onto a substrate to be processed. The substrate to be processed is placed onto the stage. The moving unit relatively moves the ejecting unit and the stage. The observation unit observes the dripped hardening resin material and the pattern with the state in which the dripped hardening resin material and the pattern are overlaid on a plane, before the template is brought into contact with the hardening resin material.

Abstract: According to one embodiment, a plurality of test drop recipes are first created based on design data on a semiconductor integrated circuit. Based on a defect inspection result of a pattern of a hardening resin material, which is formed by pressing a template on which patterns of the semiconductor integrated circuit are formed onto the hardening resin material applied to a substrate to be processed by use of the test drop recipes, a drop recipe with least defects is selected per press position on the substrate to be processed from the test drop recipes. The selected drop recipes for respective press positions are collected per functional circuit block configuring the semiconductor integrated circuit, thereby to generate a drop recipe creation assistant database.