Patents by Inventor Takumi TOGASHI

Takumi TOGASHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Proximity exposure method
    Patent number: 10768529
    Abstract: A proximity exposure method, wherein a mask (M) of which the master patterns (31) are formed larger than the resolution limit of the resist (R) is prepared with respect to the resist patterns (43) having the minimum pitch (P) equal to or smaller than the resolution limit of the resist (R); in the first exposure step, the mask (M) and the workpiece (W) are relatively step-moved by the pitch (P) of the resist patterns (43) after the mask patterns (31) are exposed and transferred onto the workpiece (W); and in the second exposure step, the mask patterns (31) are exposed and transferred onto the workpiece (W) again.
    Type: Grant
    Filed: August 23, 2017
    Date of Patent: September 8, 2020
    Assignee: V TECHNOLOGY CO., LTD.
    Inventors: Takumi Togashi, Tomonori Harada
  • PROXIMITY EXPOSURE METHOD
    Publication number: 20200026192
    Abstract: A proximity exposure method, wherein a mask (M) of which the master patterns (31) are formed larger than the resolution limit of the resist (R) is prepared with respect to the resist patterns (43) having the minimum pitch (P) equal to or smaller than the resolution limit of the resist (R); in the first exposure step, the mask (M) and the workpiece (W) are relatively step-moved by the pitch (P) of the resist patterns (43) after the mask patterns (31) are exposed and transferred onto the workpiece (W); and in the second exposure step, the mask patterns (31) are exposed and transferred onto the workpiece (W) again.
    Type: Application
    Filed: August 23, 2017
    Publication date: January 23, 2020
    Applicant: V TECHNOLOGY CO., LTD.
    Inventors: Takumi TOGASHI, Tomonori HARADA