Patents by Inventor Takumi Yoshino

Takumi Yoshino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Defect inspection apparatus, method for inspecting defect, and method for manufacturing photomask blank
    Patent number: 11940391
    Abstract: A defect inspection apparatus has a defect detection unit 152 that acquires first defect information on a defect of a photomask blank MB as a substrate; and a comparative information acquisition unit 150 that acquires a result of comparison between predetermined defect information stored in a storage unit 155 and the first defect information.
    Type: Grant
    Filed: April 1, 2022
    Date of Patent: March 26, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Ryusei Terashima, Takumi Yoshino, Tsuneo Terasawa
  • DEFECT INSPECTION APPARATUS, METHOD FOR INSPECTING DEFECT, AND METHOD FOR MANUFACTURING PHOTOMASK BLANK
    Publication number: 20220317061
    Abstract: A defect inspection apparatus has a defect detection unit 152 that acquires first defect information on a defect of a photomask blank MB as a substrate; and a comparative information acquisition unit 150 that acquires a result of comparison between predetermined defect information stored in a storage unit 155 and the first defect information.
    Type: Application
    Filed: April 1, 2022
    Publication date: October 6, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Ryusei TERASHIMA, Takumi Yoshino, Tsuneo Terasawa
  • Polymer, resist composition containing polymer, and method for manufacturing device using same
    Patent number: 10781276
    Abstract: An object of the present invention is to provide a polymer used for a resist composition having high absorption efficiency for a particle beam or an electromagnetic wave, and excellence in sensitivity, resolution and pattern performance characteristics, and provide a resist composition containing the polymer and a method of manufacturing a device using thereof. The polymer comprises: a unit A; and a unit B, wherein the unit A has an onium salt structure and generates a first radical by irradiation with a particle beam or an electromagnetic wave, the unit B has a radical generating structure containing at least one multiple bond which is between a carbon atom and a carbon atom or between a carbon atom and a heteroatom, and generates a second radical by irradiation with a particle beam or an electromagnetic wave, and the multiple bond is not one contained in a benzenoid aromatic.
    Type: Grant
    Filed: September 29, 2016
    Date of Patent: September 22, 2020
    Assignee: TOYO GOSEI CO., LTD.
    Inventors: Satoshi Enomoto, Takumi Yoshino
  • POLYMER, RESIST COMPOSITION CONTAINING POLYMER, AND METHOD FOR MANUFACTURING DEVICE USING SAME
    Publication number: 20180273664
    Abstract: An object of the present invention is to provide a polymer used for a resist composition having high absorption efficiency for a particle beam or an electromagnetic wave, and excellence in sensitivity, resolution and pattern performance characteristics, and provide a resist composition containing the polymer and a method of manufacturing a device using thereof. The polymer comprises: a unit A; and a unit B, wherein the unit A has an onium salt structure and generates a first radical by irradiation with a particle beam or an electromagnetic wave, the unit B has a radical generating structure containing at least one multiple bond which is between a carbon atom and a carbon atom or between a carbon atom and a heteroatom, and generates a second radical by irradiation with a particle beam or an electromagnetic wave, and the multiple bond is not one contained in a benzenoid aromatic.
    Type: Application
    Filed: September 29, 2016
    Publication date: September 27, 2018
    Applicant: TOYO GOSEI CO., LTD.
    Inventors: Satoshi ENOMOTO, Takumi YOSHINO
  • COMPOUNDERS FOR ENHANCING GENERATION OF CHEMICAL SPECIES
    Publication number: 20150376438
    Abstract: A reagent that enhances acid generation of a photoacid generator and composition containing such reagent is disclosed.
    Type: Application
    Filed: June 25, 2015
    Publication date: December 31, 2015
    Applicant: TOYO GOSEI CO., LTD.
    Inventors: Satoshi Enomoto, Yusuke Suga, Takumi Yoshino