Abstract: A method for editing a machining program includes obtaining tool information specifying a tool mountable on a machine tool. A program editing window and at least one assistance window are displayed. The program editing window shows a program code of the machining program to control the machine tool. Each of the assistance window selectively shows the tool information and a control method. The tool is to be controlled according to the control method. In the program code, an insertion position at which a new code is to be inserted into the program code is specified. Selected information is selected from the tool information when the tool information is shown in the at least one assistance window. A command corresponding to the selected information is inserted into the program code at the insertion position.

Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, R1 represents one or two groups selected from groups below, D1 represents a polymerizable unsaturated group represented by chemical formula D1-1 or D1-2 below, R2 represents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, A1 represents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100.

Abstract: Provided is a surfactant composition that can impart good polymerization stability, that can yield an aqueous resin dispersion having good wettability, and that can improve water resistance and water-resistant adhesive strength of a resin film formed from the aqueous resin dispersion. The surfactant composition according to the present invention includes a compound C1 represented by formula (1): (in formula (1), A1 represents an alkylene group having 10 to 14 carbon atoms, A2 represents an alkylene group having 2 to 4 carbon atoms, n is an average number of moles of an oxyalkylene group A2O added and is a number of 1 to 100, and X represents a hydrogen atom, a sulfate ester or a salt thereof, a phosphate ester or a salt thereof, or methylcarboxylic acid or a salt thereof); and a compound C2 represented by formula (2): (in formula (2), A1, A2, n, and X are as defined in formula (1)). A molar ratio C1/C2 of the compound C1 to the compound C2 is 99/1 to 84/16.

Abstract: Provided is a surfactant composition having the capability of not only imparting excellent polymerization stability, but also imparting excellent mechanical stability to the aqueous resin dispersion to be obtained through emulsion polymerization, even when the amount of the surfactant composition used is small.

Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.

Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). In the formula, R1 represents one or two groups selected from groups below, D1 represents a polymerizable unsaturated group represented by chemical formula D1-1 or D1-2 below, R2 represents a hydrogen atom or a methyl group, m1 and m2 represent 1 to 2, A1 represents an alkylene group with 2 to 4 carbon atoms, and m3 represents 1 to 100.

Abstract: Provided is a copolymer that can be used as a dispersant having high dispersibility and high slump retention capability. A copolymer according to an embodiment is a water-soluble copolymer that contains, as constituent monomers, at least one monomer selected from a monomer (A) represented by formula (1) and a monomer (B) represented by formula (2), and at least one monomer (C) selected from an unsaturated carboxylic acid monomer (C-1) and an oxyethylene group-containing unsaturated carboxylic acid ester (C-2). The content of the monomer (C) is 20 mass % or more and 99 mass % or less.

Abstract: The polymerization stability and the chemical stability and the water resistance of resin films are improved. A surfactant composition according to an embodiment contains a surfactant (A) represented by general formula (1) and an anionic surfactant (B) having a hydrophobic group different from that of the surfactant (A). R1 represents an alkyl group with 8 to 14 carbon atoms, A represents an alkylene group with 2 to 4 carbon atoms, and n representing an average number of moles of an oxyalkylene group added represents 1 to 100.