Patents by Inventor Takuya OMIYA

Takuya OMIYA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230400767
    Abstract: A radiation-sensitive resin composition includes: a polymer including a first structural unit represented by formula (1); and a radiation-sensitive acid generator. In the formula (1), R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; R2, R3, and R4 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; R5 represents a monovalent organic group having 1 to 20 carbon atoms; and L represents a single bond or a divalent organic group having 1 to 20 carbon atoms.
    Type: Application
    Filed: August 29, 2023
    Publication date: December 14, 2023
    Applicant: JSR CORPORATION
    Inventors: Takuya OMIYA, Katsuaki NISHIKORI, Kazuya KIRIYAMA, Natsuko KINOSHITA, Tetsurou KANEKO
  • Publication number: 20230384676
    Abstract: A radiation-sensitive resin composition includes: a resin including a structural unit represented by formula (1); a radiation-sensitive acid generator; and a solvent. R1 is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; L1 represents a single bond or —COO-L-; L represents a substituted or unsubstituted alkanediyl group; R2 represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; L2 represents a single bond or a divalent linking group; and Ar represents a group obtained by removing (n+1) hydrogen atoms from an aromatic ring. R3 is independently a halogen atom, a halogenated hydrocarbon group, a hydroxy group, a monovalent hydrocarbon group having 1 to 10 carbon atoms, or a monovalent alkyl ether group having 1 to 10 carbon atoms, and at least one R3 is a halogen atom or a halogenated hydrocarbon group.
    Type: Application
    Filed: April 18, 2023
    Publication date: November 30, 2023
    Applicant: JSR CORPORATION
    Inventors: Takuya OMIYA, Katsuaki NISHIKORI, Kazuya KIRIYAMA, Yuushi MATSUMURA, Natsuko KINOSHITA
  • Publication number: 20230104260
    Abstract: A radiation-sensitive resin composition includes a resin, a radiation-sensitive acid generator, and a solvent. The resin includes a structural unit A represented by formula (1) and a structural unit B having an acid-dissociable group. The structural unit represented by the formula (1) is excluded from the structural unit B. In the formula (1), A is a monovalent aromatic hydrocarbon group in which —ORY is bonded to a carbon atom adjacent to a carbon atom to which L? is bonded, and hydrogen atoms on other carbon atoms are unsubstituted, or a part or all of the hydrogen atoms are substituted with a cyano group, a nitro group, an alkyl group, an alkoxy group, an alkoxycarbonyl group, an alkoxycarbonyloxy group, an acyl group, or an acyloxy group.
    Type: Application
    Filed: January 20, 2021
    Publication date: April 6, 2023
    Applicant: JSR CORPORATION
    Inventors: Takuya OMIYA, Katsuaki NISHIKORI, Kazuya KIRIYAMA, Natsuko KINOSHITA