Patents by Inventor TAL ZAHARONI

TAL ZAHARONI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Metrology and process control for semiconductor manufacturing
    Patent number: 11763181
    Abstract: A semiconductor metrology system including a spectrum acquisition tool for collecting, using a first measurement protocol, baseline scatterometric spectra on first semiconductor wafer targets, and for various sources of spectral variability, variability sets of scatterometric spectra on second semiconductor wafer targets, the variability sets embodying the spectral variability, a reference metrology tool for collecting, using a second measurement protocol, parameter values of the first semiconductor wafer targets, and a training unit for training, using the collected spectra and values, a prediction model using machine learning and minimizing an associated loss function incorporating spectral variability terms, the prediction model for predicting values for production semiconductor wafer targets based on their spectra.
    Type: Grant
    Filed: August 12, 2021
    Date of Patent: September 19, 2023
    Assignee: NOVA LTD
    Inventors: Eitan Rothstein, Ilya Rubinovich, Noam Tal, Barak Bringoltz, Yongha Kim, Ariel Broitman, Oded Cohen, Eylon Rabinovich, Tal Zaharoni, Shay Yogev, Daniel Kandel
  • METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
    Publication number: 20220036218
    Abstract: A semiconductor metrology system including a spectrum acquisition tool for collecting, using a first measurement protocol, baseline scatterometric spectra on first semiconductor wafer targets, and for various sources of spectral variability, variability sets of scatterometric spectra on second semiconductor wafer targets, the variability sets embodying the spectral variability, a reference metrology tool for collecting, using a second measurement protocol, parameter values of the first semiconductor wafer targets, and a training unit for training, using the collected spectra and values, a prediction model using machine learning and minimizing an associated loss function incorporating spectral variability terms, the prediction model for predicting values for production semiconductor wafer targets based on their spectra.
    Type: Application
    Filed: August 12, 2021
    Publication date: February 3, 2022
    Inventors: EITAN ROTHSTEIN, ILYA RUBINOVICH, NOAM TAL, BARAK BRINGOLTZ, YONGHA KIM, ARIEL BROITMAN, ODED COHEN, EYLON RABINOVICH, TAL ZAHARONI, SHAY YOGEV, DANIEL KANDEL
  • Metrology and process control for semiconductor manufacturing
    Patent number: 11093840
    Abstract: A semiconductor metrology system including a spectrum acquisition tool for collecting, using a first measurement protocol, baseline scatterometric spectra on first semiconductor wafer targets, and for various sources of spectral variability, variability sets of scatterometric spectra on second semiconductor wafer targets, the variability sets embodying the spectral variability, a reference metrology tool for collecting, using a second measurement protocol, parameter values of the first semiconductor wafer targets, and a training unit for training, using the collected spectra and values, a prediction model using machine learning and minimizing an associated loss function incorporating spectral variability terms, the prediction model for predicting values for production semiconductor wafer targets based on their spectra.
    Type: Grant
    Filed: June 14, 2019
    Date of Patent: August 17, 2021
    Assignee: NOVA MEASURING INSTRUMENTS LTD.
    Inventors: Eitan Rothstein, Ilya Rubinovich, Noam Tal, Barak Bringoltz, Yongha Kim, Ariel Broitman, Oded Cohen, Eylon Rabinovich, Tal Zaharoni, Shay Yogev, Daniel Kandel
  • METROLOGY AND PROCESS CONTROL FOR SEMICONDUCTOR MANUFACTURING
    Publication number: 20210150387
    Abstract: A semiconductor metrology system including a spectrum acquisition tool for collecting, using a first measurement protocol, baseline scatterometric spectra on first semiconductor wafer targets, and for various sources of spectral variability, variability sets of scatterometric spectra on second semiconductor wafer targets, the variability sets embodying the spectral variability, a reference metrology tool for collecting, using a second measurement protocol, parameter values of the first semiconductor wafer targets, and a training unit for training, using the collected spectra and values, a prediction model using machine learning and minimizing an associated loss function incorporating spectral variability terms, the prediction model for predicting values for production semiconductor wafer targets based on their spectra.
    Type: Application
    Filed: June 14, 2019
    Publication date: May 20, 2021
    Inventors: EITAN ROTHSTEIN, ILYA RUBINOVICH, NOAM TAL, BARAK BRINGOLTZ, YONGHA KIM, ARIEL BROITMAN, ODED COHEN, EYLON RABINOVICH, TAL ZAHARONI, SHAY YOGEV, DANIEL KANDEL