Patents by Inventor Talat Fatima Hasan

Talat Fatima Hasan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Measurement system cluster
    Patent number: 7283226
    Abstract: Systems and methods are disclosed for measuring semiconductor wafers in a fabrication process using one or more of a plurality of measurement systems. A measurement system cluster is provided having a plurality of such measurement systems, along with a system for transferring wafers to one or more of the measurement systems according to one or more selection criteria. Measurement systems may be selected for use based on availability and throughput capabilities, whereby overall system throughput and efficiency may be improved within the required accuracy capabilities required for measuring process parameters associated with the wafers.
    Type: Grant
    Filed: July 28, 2006
    Date of Patent: October 16, 2007
    Assignee: Tokyo Electron Limited
    Inventor: Talat Fatima Hasan
  • Systems and methods for metrology recipe and model generation
    Patent number: 7254458
    Abstract: Systems and methodologies are disclosed for generating setup information for use measuring process parameters associated with semiconductor devices. A system comprises an off-line measurement instrument to measure an unpatterned wafer and a setup information generator to generate setup information according to the unpatterned wafer measurement. The system then provides the setup information to a process measurement system for use in measuring production wafers in a semiconductor manufacturing process.
    Type: Grant
    Filed: June 21, 2006
    Date of Patent: August 7, 2007
    Assignee: Tokyo Electron Limited
    Inventor: Talat Fatima Hasan
  • Measurement system cluster
    Patent number: 7106433
    Abstract: Systems and methods are disclosed for measuring semiconductor wafers in a fabrication process using one or more of a plurality of measurement systems. A measurement system cluster is provided having a plurality of such measurement systems, along with a system for transferring wafers to one or more of the measurement systems according to one or more selection criteria. Measurement systems may be selected for use based on availability and throughput capabilities, whereby overall system throughput and efficiency may be improved within the required accuracy capabilities required for measuring process parameters associated with the wafers.
    Type: Grant
    Filed: December 15, 2004
    Date of Patent: September 12, 2006
    Assignee: Tokyo Electron Limited
    Inventor: Talat Fatima Hasan
  • Systems and methods for metrology recipe and model generation
    Patent number: 7089075
    Abstract: Systems and methodologies are disclosed for generating setup information for use measuring process parameters associated with semiconductor devices. A system comprises an off-line measurement instrument to measure an unpatterned wafer and a setup information generator to generate setup information according to the unpatterned wafer measurement. The system then provides the setup information to a process measurement system for use in measuring production wafers in a semiconductor manufacturing process.
    Type: Grant
    Filed: April 24, 2002
    Date of Patent: August 8, 2006
    Assignee: Tokyo Electron Limited
    Inventor: Talat Fatima Hasan
  • Measurement system cluster
    Patent number: 6999164
    Abstract: Systems and methods are disclosed for measuring semiconductor wafers in a fabrication process using one or more of a plurality of measurement systems. A measurement system cluster is provided having a plurality of such measurement systems, along with a system for transferring wafers to one or more of the measurement systems according to one or more selection criteria. Measurement systems may be selected for use based on availability and throughput capabilities, whereby overall system throughput and efficiency may be improved within the required accuracy capabilities required for measuring process parameters associated with the wafers.
    Type: Grant
    Filed: April 24, 2002
    Date of Patent: February 14, 2006
    Assignee: Tokyo Electron Limited
    Inventor: Talat Fatima Hasan
  • Measurement system cluster
    Publication number: 20020176074
    Abstract: Systems and methods are disclosed for measuring semiconductor wafers in a fabrication process using one or more of a plurality of measurement systems. A measurement system cluster is provided having a plurality of such measurement systems, along with a system for transferring wafers to one or more of the measurement systems according to one or more selection criteria. Measurement systems may be selected for use based on availability and throughput capabilities, whereby overall system throughput and efficiency may be improved within the required accuracy capabilities required for measuring process parameters associated with the wafers.
    Type: Application
    Filed: April 24, 2002
    Publication date: November 28, 2002
    Inventor: Talat Fatima Hasan
  • Systems and methods for metrology recipe and model generation
    Publication number: 20020165636
    Abstract: Systems and methodologies are disclosed for generating setup information for use measuring process parameters associated with semiconductor devices. A system comprises an off-line measurement instrument to measure an unpatterned wafer and a setup information generator to generate setup information according to the unpatterned wafer measurement. The system then provides the setup information to a process measurement system for use in measuring production wafers in a semiconductor manufacturing process.
    Type: Application
    Filed: April 24, 2002
    Publication date: November 7, 2002
    Inventor: Talat Fatima Hasan