Patents by Inventor Tamaki Iida

Tamaki Iida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6235348
    Abstract: A rust preventive composition including (a) a silicic acid compound and (b) an aromatic amine-based condensation product is provided, which is effective in preventing a Zn-based metallic coating from rusting. Rusting is prevented by forming a coating film contaning the components (a) and (b) on the surface of the Zn-based metallic coating formed on a base such as a metal plate. The resulting coating film exhibits an excellent corrosion resistance, gives no fear of a health problem such as carcinogensis and provides a desirable black or blackish appearance to a metal surface. In an embodiment wherein a second coating film containing a silicic acid compound is formed on the first coating film, the corrosion resistance is further improved.
    Type: Grant
    Filed: May 12, 1999
    Date of Patent: May 22, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihide Shimizu, Mikio Watanabe, Tamaki Iida
  • Patent number: 6159910
    Abstract: An aluminum nitride composition including an aluminum nitride powder and an aromatic amine-based condensate is provided. In the composition, the aluminum nitride may hardly undergo decomposition even under severe conditions of high temperature and high humidity, and the electrical insulating properties and high thermal conductivity inherent in aluminum nitride powder can be maintained under such severe conditions. Accordingly, this composition is useful as a durable heat-dissipating composition, in particular, as a heat-dissipating coating material, grease or sheet.
    Type: Grant
    Filed: June 1, 1999
    Date of Patent: December 12, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshihide Shimizu, Mikio Watanabe, Tamaki Iida
  • Patent number: 6156236
    Abstract: A conductive organopolysiloxane composition is provided which includes (A) 100 parts by weight of an organopolysiloxane; and (B) 0.1 to 800 parts by weight of a conductive material obtained by subjecting a member selected from the group consisting of a conductive metal, a conductive metal compound, a filler surface-treated with a conductive metal and a filler surface-treated with a conductive metal compound, to surface treatment with a compound selected from the group consisting of a compound represented by the formula (1) and a compound represented by the formula (2). ##STR1## wherein R.sup.1 represents --O-- or --NH--, and R.sup.2 represents a hydrogen atom or a phenyl group. This composition is useful for the formation of a silicone rubber having a sufficient electrical conductivity and also stably retainable of electrical conductivity almost without undergoing a change in electrical conductivity even in a high-temperature environment.
    Type: Grant
    Filed: March 19, 1999
    Date of Patent: December 5, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Osamu Hayashida, Takeo Yoshida, Toshihide Shimizu, Tamaki Iida
  • Patent number: 5882822
    Abstract: Proposed is an improvement in the method for the preparation of a battery electrode consisting of a spongy metal sheet to serve as a substrate having a three-dimensional skeletal structure with intercommunicating open pores and an active material filling the open pores of the skeletal structure of the substrate.
    Type: Grant
    Filed: August 28, 1996
    Date of Patent: March 16, 1999
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tamaki Iida, Masaki Kasashima
  • Patent number: 5427826
    Abstract: Proposed is an improvement in the process for forming a superhard carbonaceous coating film on various articles by the plasma-induced CVD method using an apparatus in which microwaves generated in an oscillator are introduced into the CVD chamber through a waveguide duct partitioned from the CVD chamber by a gas shield.
    Type: Grant
    Filed: September 29, 1994
    Date of Patent: June 27, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Tamaki Iida
  • Patent number: 4980021
    Abstract: An edged medical tool, such as scalpels and injection needles, is imparted with unexpectedly improved incisiveness by first providing a carbonaceous coating layer of 1 to 20 nm thickness having a crystalline structure of diamond by a method of plasma-induced vapor-phase deposition in an atmosphere of a mixture of hydrogen gas and a hydrocarbon gas at a microwave frequency of 1 to 10 GHz and then etching the thus formed diamond-like coating layer in a plasma of hydrogen gas to such an extent that the thus etched surface has a roughness of 0.5 to 5 nm.
    Type: Grant
    Filed: April 21, 1989
    Date of Patent: December 25, 1990
    Assignee: Shin-Etsu Chemical Co. Ltd.
    Inventors: Hajime Kitamura, Tamaki Iida
  • Patent number: 4839195
    Abstract: A microtome blade made of, for example, sapphire is imparted with greatly improved cutting power as well as durability and anti-corrosion resistance by providing a coating layer of diamond thereon. Such a coating layer can be formed by subjecting a base blade to a treatment of plasma-induced chemical vapor deposition of diamond in an atmosphere of a gaseous mixture of a hydrocarbon compound and hydrogen followed by a heat treatment at 700.degree.-1300.degree. C. to expel any adsorbed impurities in the diamond layer.
    Type: Grant
    Filed: February 9, 1988
    Date of Patent: June 13, 1989
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hajime Kitamura, Tamaki Iida
  • Patent number: 4778573
    Abstract: An improved aqueous electrolyte solution suitable as an electrolytic plating bath is disclosed which is capable of giving a magnetic layer of a cobalt-based alloy on a substrate of a magnetic recording medium used in a high-density vertical-mode magnetization. The electrolyte solution characteristically contains, in addition to the conventional salts of cobalt, manganese and nickel, reducing agent and pH buffering and controlling agents, a water-soluble rhenium salt such as ammonium perrhenate in a concentration of 0.002 to 0.015 mole/liter.
    Type: Grant
    Filed: October 27, 1987
    Date of Patent: October 18, 1988
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshinari Tabe, Tamaki Iida
  • Patent number: 4615945
    Abstract: A copper-foiled laminate suitable as a base plate of printed circuit boards and the like electronic parts. The laminate is composed of an aluminum plate as the base, a layer of aluminum oxide formed on the aluminum plate, a layer of an amorphous silicon carbide formed on the aluminum oxide layer and a copper foil adhesively bonded to the surface of the silicon carbide layer so that the laminate has a high thermal conductivity providing a heat dissipative surface essential in high-performance electronic parts.
    Type: Grant
    Filed: February 14, 1985
    Date of Patent: October 7, 1986
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Tamaki Iida
  • Patent number: 4601950
    Abstract: A manufacturing method for a magnetic recording medium is disclosed which comprises the steps of forming a metallic magnetic layer on a non-magnetic substrate such as a polyester film with or without a non-magnetic metal layer deposited thereon by a method of electroless plating or electroplating, forming a vapor-phase plasma-polymerized layer of a silane compound, e.g. 1,1,2,2-tetramethyl disilane and 1,1,2,2,3,3-hexamethyl trisilane, and forming a thin layer of a fluorocarbon resin. The thus manufactured magnetic recording medium has advantages in several properties such as the surface lubricity sufficient to give satisfactory smoothness of travelling, durability in abrasion resistance and weatherability.
    Type: Grant
    Filed: September 10, 1985
    Date of Patent: July 22, 1986
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tamaki Iida, Kaname Inoue