Abstract: Disclosed herein is an electrochromic display device comprising a pair of transparent substrates facing each other, an anode electrode and a cathode electrode respectively formed on the transparent substrates, an electrolytic layer disposed between the anode electrode and the cathode electrode, an electrochromophore layer of a nano structure formed on at least one of the anode electrode and the cathode electrode, and a redox promoter layer coated with a conductive compound, on the other electrode.

Abstract: Disclosed herein is a method for forming a metal pattern with a low resistivity. The method comprises the steps of: (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film layer; (ii) coating a water-soluble polymeric compound onto the photocatalytic film layer to form a water-soluble polymer layer; (iii) selectively exposing the two layers to light to form a latent pattern acting as a nucleus for crystal growth; and (iv) plating the latent pattern with a metal to grow metal crystals thereon. According to the method, a multilayer wiring pattern including a low resistivity metal can be formed in a relatively simple manner at low cost, and the metals constituting the respective layers can be freely selected according to the intended application. The low resistivity metal pattern can be advantageously applied to flat panel display devices, e.g., LCDs, PDPs and ELDs.

Abstract: A method for forming a metal pattern with a low resistivity. The method may include the steps of: (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film layer; (ii) coating a water-soluble polymeric compound onto the photocatalytic film layer to form a water-soluble polymer layer; (iii) selectively exposing the two layers to light to form a latent pattern acting as a nucleus for crystal growth; and (iv) plating the latent pattern with a metal to grow metal crystals thereon. According to the method, a multilayer wiring pattern including a low resistivity metal may be formed in a relatively simple manner at low cost, and the metals constituting the respective layers can be freely selected according to the intended application. The low resistivity metal pattern may be advantageously applied to flat panel display devices, e.g., LCDs, PDPs and ELDs.

Abstract: Disclosed herein is an electrochromic display device comprising a pair of transparent substrates facing each other, an anode electrode and a cathode electrode respectively formed on the transparent substrates, an electrolytic layer disposed between the anode electrode and the cathode electrode, an electrochromophore layer of a nano structure formed on at least one of the anode electrode and the cathode electrode, and a redox promoter layer coated with a conductive compound, on the other electrode.

Abstract: Disclosed herein is an improved method for forming a metal pattern with low contact resistance. The metal pattern may be applied to various flat panel display devices with high resolution. Further disclosed is a flat panel display using a metal pattern formed by the method.

Abstract: The invention relates to the use of proteins designated ULIP/POP in the diagnosis and therapy of cancers and paraneoplastic neurological syndromes.

Abstract: The invention concerns a purified polypeptide, biologically active polypeptide derivative or fragment of said purified polypeptide, comprising an amino acid sequence selected among SEQ.ID. No. 2, No. 4, No. 6 and No. 8.

Abstract: A method for forming a metal pattern with a low resistivity. The method may include the steps of: (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film layer; (ii) coating a water-soluble polymeric compound onto the photocatalytic film layer to form a water-soluble polymer layer; (iii) selectively exposing the two layers to light to form a latent pattern acting as a nucleus for crystal growth; and (iv) plating the latent pattern with a metal to grow metal crystals thereon. According to the method, a multilayer wiring pattern including a low resistivity metal may be formed in a relatively simple manner at low cost, and the metals constituting the respective layers can be freely selected according to the intended application. The low resistivity metal pattern may be advantageously applied to flat panel display devices, e.g., LCDs, PDPs and ELDs.

Abstract: Disclosed herein is a method for forming a metal pattern with a low resistivity. The method comprises the steps of: (i) coating a photocatalytic compound onto a substrate to form a photocatalytic film layer; (ii) coating a water-soluble polymeric compound onto the photocatalytic film layer to form a water-soluble polymer layer; (iii) selectively exposing the two layers to light to form a latent pattern acting as a nucleus for crystal growth; and (iv) plating the latent pattern with a metal to grow metal crystals thereon. According to the method, a multilayer wiring pattern including a low resistivity metal can be formed in a relatively simple manner at low cost, and the metals constituting the respective layers can be freely selected according to the intended application. The low resistivity metal pattern can be advantageously applied to flat panel display devices, e.g., LCDs, PDPs and ELDs.

Abstract: The present invention relates to the use of sFRP1 polypeptide in the induction of stem cell proliferation, and to its function in the treatment of depleted cellular populations.