Patents by Inventor Tamer Coskun

Tamer Coskun has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220193245
    Abstract: The present disclosure related to the field of medicine. More particularly, the disclosure is in the field of treatment of diabetes, obesity, and/or dyslipidemia. The disclosure relates to compounds that agonize both the calcitonin and amylin receptors and can lower food intake, body weight, glucose and/or triglycerides, so can be used to treat diabetes, obesity and/or dyslipidemia. The present disclosure also includes pharmaceutical compositions containing such compounds and therapeutic uses of such compounds and compositions.
    Type: Application
    Filed: December 17, 2021
    Publication date: June 23, 2022
    Inventors: Tamer COSKUN, Hongchang QU
  • Publication number: 20220125885
    Abstract: Glucagon analog agonist compounds are provided herein that have improved solubility, as well as improved chemical and physical stabilities, when compared to native, human glucagon. Also provided are pharmaceutical compositions including such glucagon analog agonist compounds, as well as methods of using the same for treating hypoglycemia, especially severe hypoglycemia.
    Type: Application
    Filed: January 29, 2020
    Publication date: April 28, 2022
    Inventors: Jorge Alsina-Fernandez, Tamer Coskun, Andrea Renee Geiser
  • Publication number: 20220048967
    Abstract: The present invention relates to compounds having activity at both the human glucose-dependent insulinotropic polypeptide (GIP) and glucagon-like peptide-1 (GLP-1) receptors. The present invention also relates to compounds having an extended duration of action at each of these receptors. Furthermore, the present invention relates to compounds that may be administered orally. Compounds may be useful in the treatment of type 2 diabetes mellitus (“T2DM”). Also, the compounds may be useful in the treatment of obesity.
    Type: Application
    Filed: July 2, 2021
    Publication date: February 17, 2022
    Inventors: Milata Mary ABRAHAM, Jorge ALSINA-FERNANDEZ, Robert Andrew BROWN, Over CABRERA, Tamer COSKUN, Robert Chadwick CUMMINS, Mohamed ElSayed Hamed ELSAYED, Hongchang QU, James Lincoln WALLIS, Kyle Wynn SLOOP, Francis Stafford WILLARD, Thi Thanh Huyen TRAN, Aktham ABURUB, Phenil Jayantilal PATEL, Amita DATTA-MANNAN, Xianyin LAI
  • Patent number: 11084861
    Abstract: The present invention relates to compounds having activity at both the human glucose-dependent insulinotropic polypeptide (GIP) and glucagon-like peptide-1 (GLP-1) receptors. The present invention also relates to compounds having an extended duration of action at each of these receptors. Furthermore, the present invention relates to compounds that may be administered orally. Compounds may be useful in the treatment of type 2 diabetes mellitus (“T2DM”). Also, the compounds may be useful in the treatment of obesity.
    Type: Grant
    Filed: July 22, 2019
    Date of Patent: August 10, 2021
    Assignee: Eli Lilly and Company
    Inventors: Milata Mary Abraham, Jorge Alsina-Fernandez, Robert Andrew Brown, Over Cabrera, Tamer Coskun, Robert Chadwick Cummins, Mohamed ElSayed Hamed Elsayed, Hongchang Qu, James Lincoln Wallis, Amita Datta-Mannan, Xianyin Lai
  • Publication number: 20210221865
    Abstract: Incretin analogs are provided that have activity at each of the GIP, GLP-1 and glucagon receptors. The incretin analogs have structural features resulting in balanced activity and extended duration of action at each of these receptors. Methods also are provided for treating diseases such as diabetes mellitus, dyslipidemia, fatty liver disease, metabolic syndrome, non-alcoholic steato-hepatitis and obesity.
    Type: Application
    Filed: December 14, 2018
    Publication date: July 22, 2021
    Inventors: Jorge Alsina-Fernandez, Tamer Coskun, Lili Guo, Hongchang Qu
  • Publication number: 20210216019
    Abstract: The present disclosure generally relates to photolithography systems, and methods for correcting positional errors in photolithography systems. When a photolithography system is first started, the system enters a stabilization period. During the stabilization period, positional readings and data, such as temperature, pressure, and humidity data, are collected as the system prints or exposes a substrate. A model is created based on the collected data and the positional readings. The model is then used to estimate errors in subsequent stabilization periods, and the estimated errors are dynamically corrected during the subsequent stabilization periods.
    Type: Application
    Filed: March 30, 2021
    Publication date: July 15, 2021
    Inventors: Tamer COSKUN, Muhammet POYRAZ, Qin ZHONG, Pacha MONGKOLWONGROJN
  • Patent number: 10996572
    Abstract: The present disclosure generally relates to photolithography systems, and methods for correcting positional errors in photolithography systems. When a photolithography system is first started, the system enters a stabilization period. During the stabilization period, positional readings and data, such as temperature, pressure, and humidity data, are collected as the system prints or exposes a substrate. A model is created based on the collected data and the positional readings. The model is then used to estimate errors in subsequent stabilization periods, and the estimated errors are dynamically corrected during the subsequent stabilization periods.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: May 4, 2021
    Assignee: Applied Materials, Inc.
    Inventors: Tamer Coskun, Muhammet Poyraz, Qin Zhong, Pacha Mongkolwongrojn
  • Patent number: 10935892
    Abstract: Methods and systems are provided that, in some embodiments, print and process a layer. The layer can be on a wafer or on an application panel. Thereafter, locations of the features that were actually printed and processed are measured. Based upon differences between the measured differences and designed locations for those features at least one distortion model is created. Each distortion model is inverted to create a corresponding correction model. When there are multiple sections, a distortion model and a correction model can be created for each section. Multiple correction models can be combined to create a global correction model.
    Type: Grant
    Filed: May 15, 2017
    Date of Patent: March 2, 2021
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Tamer Coskun, Thomas L. Laidig, Jang Fung Chen
  • Publication number: 20200331980
    Abstract: Incretin analogs are provided that have activity at each of the GIP, GLP-1 and glucagon receptors. The incretin analogs have structural features resulting in balanced activity and extended duration of action at each of these receptors. Methods also are provided for treating diseases such as diabetes mellitus, dyslipidemia, fatty liver disease, metabolic syndrome, non-alcoholic steatohepatitis and obesity.
    Type: Application
    Filed: December 14, 2018
    Publication date: October 22, 2020
    Inventors: Jorge Alsina-Fernandez, Tamer Coskun, Lili Guo, Hongchang Qu
  • Patent number: 10809637
    Abstract: In one embodiment, a method for creating a forecasting model for a multiple-imaging unit DLT is disclosed. A stage of the DLT is positioned so that a set of alignment marks provided on a substrate are placed under a set of the DLT's eyes. For each alignment mark in the set, a first image is acquired using a camera coupled to the eye above it at a first time, and a first position of the alignment mark is obtained within the camera's FOV from the first image, to determine a first measured position. One or more additional images of the alignment mark are subsequently obtained at subsequent times, and one or more corresponding subsequent measured positions are determined. Differences between sequential ones of the measured positions are respectively calculated, a forecasting model to correct for eye center drift of the set of eyes is created, and corrections digitally applied.
    Type: Grant
    Filed: May 30, 2019
    Date of Patent: October 20, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventor: Tamer Coskun
  • Publication number: 20200264514
    Abstract: The present disclosure generally relates to photolithography systems, and methods for correcting positional errors in photolithography systems. When a photolithography system is first started, the system enters a stabilization period. During the stabilization period, positional readings and data, such as temperature, pressure, and humidity data, are collected as the system prints or exposes a substrate. A model is created based on the collected data and the positional readings. The model is then used to estimate errors in subsequent stabilization periods, and the estimated errors are dynamically corrected during the subsequent stabilization periods.
    Type: Application
    Filed: February 15, 2019
    Publication date: August 20, 2020
    Applicant: Applied Materials, Inc.
    Inventors: Tamer COSKUN, Muhammet POYRAZ, Qin ZHONG, Pacha MONGKOLWONGROJN
  • Patent number: 10599055
    Abstract: A method of aligning a plate containing a substrate is disclosed wherein multiple cameras with distinct fields of view are aligned with mark cells that are within the field of view of each of the multiple cameras.
    Type: Grant
    Filed: November 15, 2018
    Date of Patent: March 24, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Tamer Coskun, Rudolf C. Brunner
  • Patent number: 10585360
    Abstract: Methods are provided that, in some embodiments that provide alignment of a first layer of a printing plate on a chuck. For example, in one embodiment, images of reference marks on a chuck are captured to determine the initial positions of the reference marks on the chuck. A reference model is created from those initial positions. Images of alignment marks on a reference plate are captured and the locations of the alignment marks are determined. A reference plate model is created from the positions of the alignment marks. A mapping model is then created from the reference model and the reference plate model.
    Type: Grant
    Filed: August 25, 2017
    Date of Patent: March 10, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Tamer Coskun, Qin Zhong
  • Publication number: 20200024322
    Abstract: The present invention relates to compounds having activity at both the human glucose-dependent insulinotropic polypeptide (GIP) and glucagon-like peptide-1 (GLP-1) receptors. The present invention also relates to compounds having an extended duration of action at each of these receptors. Furthermore, the present invention relates to compounds that may be administered orally. Compounds may be useful in the treatment of type 2 diabetes mellitus (“T2DM”). Also, the compounds may be useful in the treatment of obesity.
    Type: Application
    Filed: July 22, 2019
    Publication date: January 23, 2020
    Inventors: Milata Mary Abraham, Jorge Alsina-Fernandez, Robert Andrew Brown, Over Cabrera, Tamer Coskun, Robert Chadwick Cummins, Mohamed ElSayed Hamed Elsayed, Hongchang Qu, James Lincoln Wallis, Kyle Wynn Sloop, Francis Stafford Willard, Thi Thanh Huyen Tran, Aktham Aburub, Phenil Jayantilal Patel, Amita Datta-Mannan, Xianyin Lai
  • Patent number: 10495983
    Abstract: Methods are provided and generally relate to adjusting exposure parameters of a substrate in response to an overlay error. The method includes partitioning the substrate into one or more sections. Each section corresponds to an image projection system. A total overlay error of a first layer deposited on the substrate is determined. For each section, a sectional overlay error is calculated. For each overlap area, in which two or more sections overlap, an average overlay error is calculated. The exposure parameters are adjusted in response to the total overlay error.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: December 3, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Tamer Coskun, Hwan J. Jeong
  • Patent number: 10497658
    Abstract: In one embodiment of the invention, a method for correcting a pattern placement on a substrate is disclosed. The method begins by detecting three reference points for a substrate. A plurality of sets of three die location points are detected, each set indicative of an orientation of a die structure, the plurality of sets include a first set associated with a first dies and a second set associated with a second die. A local transformation is calculated for the orientation of the first die and the second on the substrate. Three orientation points are selected from the plurality of sets of three die location points wherein the orientation points are not set members of the same die. A first global orientation of the substrate is calculated from the selected three points from the set of points and the first global transformation and the local transformation for the substrate are stored.
    Type: Grant
    Filed: September 17, 2018
    Date of Patent: December 3, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Tamer Coskun, Jang Fung Chen
  • Patent number: 10429744
    Abstract: Methods and apparatuses are provided that determine an offset between actual feature/mark locations and the designed feature/mark locations in a maskless lithography system. For example, in one embodiment, a method is provided that includes opening a camera shutter in a maskless lithography system. Light is directed from a configuration of non-adjacent mirrors in a mirror array towards a first substrate layer. An image of the first substrate layer on a camera is captured and accumulated. Light is directed and images are captured repeatedly using different configurations of non-adjacent mirrors to cover an entire field-of-view (FOV) of the camera on the first substrate layer. Thereafter, the camera shutter is closed and the accumulated image is stored in memory.
    Type: Grant
    Filed: June 22, 2018
    Date of Patent: October 1, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Tamer Coskun, Hwan J. Jeong
  • Publication number: 20190064683
    Abstract: Methods are provided that, in some embodiments that provide alignment of a first layer of a printing plate on a chuck. For example, in one embodiment, images of reference marks on a chuck are captured to determine the initial positions of the reference marks on the chuck. A reference model is created from those initial positions. Images of alignment marks on a reference plate are captured and the locations of the alignment marks are determined. A reference plate model is created from the positions of the alignment marks. A mapping model is then created from the reference model and the reference plate model.
    Type: Application
    Filed: August 25, 2017
    Publication date: February 28, 2019
    Inventors: Tamer COSKUN, Qin ZHONG
  • Publication number: 20190033729
    Abstract: Methods are provided and generally relate to adjusting exposure parameters of a substrate in response to an overlay error. The method includes partitioning the substrate into one or more sections. Each section corresponds to an image projection system. A total overlay error of a first layer deposited on the substrate is determined. For each section, a sectional overlay error is calculated. For each overlap area, in which two or more sections overlap, an average overlay error is calculated. The exposure parameters are adjusted in response to the total overlay error.
    Type: Application
    Filed: September 28, 2018
    Publication date: January 31, 2019
    Inventors: Tamer COSKUN, Hwan J. JEONG
  • Publication number: 20190019769
    Abstract: In one embodiment of the invention, a method for correcting a pattern placement on a substrate is disclosed. The method begins by detecting three reference points for a substrate. A plurality of sets of three die location points are detected, each set indicative of an orientation of a die structure, the plurality of sets include a first set associated with a first dies and a second set associated with a second die. A local transformation is calculated for the orientation of the first die and the second on the substrate. Three orientation points are selected from the plurality of sets of three die location points wherein the orientation points are not set members of the same die. A first global orientation of the substrate is calculated from the selected three points from the set of points and the first global transformation and the local transformation for the substrate are stored.
    Type: Application
    Filed: September 17, 2018
    Publication date: January 17, 2019
    Inventors: Tamer COSKUN, Jang Fung CHEN