Patents by Inventor Tamiya Aiyama

Tamiya Aiyama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
    Patent number: 8627239
    Abstract: A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.
    Type: Grant
    Filed: May 4, 2012
    Date of Patent: January 7, 2014
    Assignee: Hoya Corporation
    Inventors: Hiroyuki Ishida, Tamiya Aiyama, Koichi Maruyama
  • MASK FABRICATION SUPPORTING METHOD, MASK BLANK PROVIDING METHOD, AND MASK BLANK DEALING SYSTEM
    Publication number: 20120260222
    Abstract: A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.
    Type: Application
    Filed: May 4, 2012
    Publication date: October 11, 2012
    Applicant: HOYA CORPORATION
    Inventors: Hiroyuki ISHIDA, Tamiya AIYAMA, Koichi MARUYAMA
  • Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
    Patent number: 8196070
    Abstract: A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.
    Type: Grant
    Filed: January 11, 2010
    Date of Patent: June 5, 2012
    Assignee: Hoya Corporation
    Inventors: Hiroyuki Ishida, Tamiya Aiyama, Koichi Maruyama
  • MASK FABRICATION SUPPORTING METHOD, MASK BLANK PROVIDING METHOD, AND MASK BLANK DEALING SYSTEM
    Publication number: 20100178597
    Abstract: A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.
    Type: Application
    Filed: January 11, 2010
    Publication date: July 15, 2010
    Inventors: Hiroyuki ISHIDA, Tamiya Aiyama, Koichi Maruyama
  • Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
    Patent number: 7660456
    Abstract: A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.
    Type: Grant
    Filed: March 7, 2005
    Date of Patent: February 9, 2010
    Assignee: Hoya Corporation
    Inventors: Hiroyuki Ishida, Tamiya Aiyama, Koichi Maruyama
  • Mask fabrication supporting method, mask blank providing method, and mask blank dealing system
    Publication number: 20070178387
    Abstract: A mask blank is provided by forming a plurality of films, including at least a thin film to be a transfer pattern, on a board. At the time of patterning a resist film of the mask blank according to pattern data, film information to check with a pattern is obtained for each of a plurality of the films.
    Type: Application
    Filed: March 7, 2005
    Publication date: August 2, 2007
    Applicant: HOYA CORPORATION
    Inventors: Hiroyuki Ishida, Tamiya Aiyama, Koichi Maruyama