Patents by Inventor Tammo Utterdijk

Tammo Utterdijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8208123
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Grant
    Filed: August 27, 2004
    Date of Patent: June 26, 2012
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Roelof Loopstra, Johannes Jacobus Matheus Baselmans, Marcel Mathijs Theodore Marie Dierichs, Johannes Christiaan Maria Jasper, Hendricus Johannes Maria Meijer, Uwe Mickan, Johannes Catharinus Hubertus Mulkens, Matthew Lipson, Tammo Utterdijk
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050094119
    Abstract: A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate. Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed.
    Type: Application
    Filed: August 27, 2004
    Publication date: May 5, 2005
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Loopstra, Johannes Baselmans, Marcel Mathijs Theodore Dierichs, Johannes Jasper, Hendricus Meijer, Uwe MicKan, Johannes Catharinus Mulkens, Matthew Lipson, Tammo Utterdijk