Abstract: A photocatalytic device for reacting with volatile organic compounds includes a photocatalyst and at least one additive, such as hafnium oxide and zirconium oxide, that is capable of forming a stable silicate with silicon dioxide. The additive reacts with volatile silicon-containing compounds to form stable silicate compounds. As a result, the silicon-containing compounds are unavailable for deactivation of the photocatalyst.

Abstract: A method for depositing a protective coating on a complex shaped substrate includes the steps of: (1) dipping a complex shaped substrate into a slurry to form a base coat thereon, the slurry comprising an aqueous solution, at least one refractory metal oxide, and at least one transient fluid additive present in an amount of about 0.1 percent to 10 percent by weight of the slurry; (2) curing the dipped substrate; (3) dipping the substrate into a precursor solution to form a top barrier coat thereon; and (4) heat treating the dipped, cured substrate to form a protective coating.

Abstract: A process for preparing a silicon based substrate with a protective coating having improved thermal resistance at temperature up to at least 1500° C., and the resulting article.

Abstract: An environmental coating system for silicon based substrates wherein a porous intermediate barrier layer having an elastic modulus of about 30 to 150 GPa is provided between a silicon metal containing bondcoat and a ceramic top environmental barrier layer.

Abstract: Non-line-of-sight processes for coating complex shaped structures such as metal and ceramic based gas turbine components are disclosed. The processes rely on slurry based methods of coating application, and microwave or plasma arc lamp heating.

Abstract: The present invention relates to a process for the deposition of protective coatings on complex shaped Si-based substrates which are used in articles and structures subjected to high temperature, aqueous environments comprises a non-line-of-sightprocess, particularly, electrophoretic deposition (EPD) process.

Abstract: A composite article includes a substrate and a protective layer on the substrate. The protective layer includes a non-oxide ceramic matrix and a refractory phase within the non-oxide ceramic matrix.

Abstract: Non-line-of-sight process for coating complexed shaped structures of Si-based substrates with protective barrier layers.

Abstract: A process for applying an oxidation resistant coating to an article includes the steps of mixing at least about 10% by volume to up to about 99% by volume of a slurry at least one silica based material having a viscosity of about 1×102 poise to about 1×107 poise at a temperature of about 1,292° F. (700° C.) to about 3,272° F. (1,800° C.) at least about 1% by volume to up to about 90% by volume of the slurry at least one oxygen scavenger, and a liquid medium to form the slurry; coating an article with the slurry to form a slurry coated article; and heat treating under an inert atmosphere the slurry coated article to form an article having at least one oxidation resistant coating layer containing the at least one oxygen scavenger.

Abstract: A bond coat system for silicon based substrates wherein a compliant layer having an elastic modulus of between 30 and 130 GPa is provided between the silicon based substrate and a silicon metal containing oxygen gettering layer.

Abstract: A method for depositing a protective coating upon a substrate includes the steps of dipping a substrate into a slurry composed of an aqueous solution, at least one refractory metal oxide, and at least one transient fluid additive present in an amount of about 0.1 percent to 10 percent by weight of the slurry; heat treating the substrate; and cooling the substrate to form a protective coating thereon.

Abstract: An article comprising a substrate containing silicon and a barrier layer which functions as an environmental barrier coating and, more particularly, a barrier layer which comprises hafnium silicate and, optionally, zirconium silicate and a method for forming the hafnium silicate as a barrier coating.

Abstract: An article comprising a substrate containing silicon and a barrier layer which functions as an environmental barrier coating and, more particularly, a barrier layer which comprises hafnium silicate and, optionally, zirconium silicate and a method for forming the hafnium silicate as a barrier coating.

Abstract: A bond coat system for silicon based substrates wherein a compliant layer having an elastic modulus of between 30 and 130 GPa is provided between the silicon based substrate and a silicon metal containing oxygen gettering layer.

Abstract: The present invention relates to a process for the deposition of protective coatings on complex shaped Si-based substrates which are used in articles and structures subjected to high temperature, aqueous environments comprises a non-line-of-sightprocess, particularly, electrophoretic deposition (EPD) process.

Abstract: Protective coatings are described herein. Embodiments of these coatings comprise substantially only specific equilibrium phases therein, and have a CTE that is substantially equal to the CTE of the substrate upon which the coating is deposited. The desired coatings can be obtained by controlling the application of the coating and/or by heat treating the coated substrate to create the desired phases or microstructure in the coating.

Abstract: Non-line-of-sight process for coating complexed shaped structures of Si-based substrates with protective barrier layers.

Abstract: A process for preparing a silicon based substrate with a protective coating having improved thermal resistance at temperature up to at least 1500° C., and the resulting article.

Abstract: The present invention relates to a process for the deposition of protective coatings on complex shaped Si-based substrates which are used in articles and structures subjected to high temperature, aqueous environments comprises a non-line-of-sight process, particularly, electrophoretic deposition (EPD) process.

Abstract: A top barrier layer for a silicon containing substrate which inhibits the formation of gaseous species of silicon when exposed to a high temperature aqueous environment and comprises at least 65 mol % hafnium oxide.