Abstract: In a method, a resin layer of a stack (e.g., resin layer over sacrificial layer over transparent substrate) is imprinted to form a convex region including first region with first height and second region with second height <first height. Stack portions are etched around the convex region to expose a substrate portion. The stack is utilized to develop a curable layer to define a cured layer over the exposed substrate portion. The convex region and cured layer are etched. The resin layer and a sacrificial layer portion underlying the second region are removed. A second substrate portion is exposed and a third substrate portion remains covered by a remaining sacrificial layer portion. The cured layer is substantially co-planar with the remaining sacrificial layer portion. A depression is formed extending to the second substrate portion. The remaining sacrificial layer portion is utilized to define functionalized layers over different depression regions.

Abstract: In an example method, a polymeric hydrogel is applied to a surface of a substrate including depressions separated by interstitial regions. Before or after the polymeric hydrogel is applied, a primer set is grafted to the polymeric hydrogel to form a grafted layer. The primer set includes cleavable first primers and uncleavable second primers. At a predetermined region of the grafted layer within a portion of at least some of the depressions, some of the cleavable first primers and some of the uncleavable second primers are altered to respectively introduce cleavable second primers and uncleavable first primers.

Abstract: Provided herein are various examples of a method of coupling oligonucleotides to a polymer. The method may include selectively irradiating first inactive moieties in a one or more first region of a polymer with light, while not irradiating second inactive moieties in a one or more second region of the polymer, to generate first active moieties in the one or more first region of the polymer. The method may also include coupling the first active moieties to first oligonucleotides. The method may further include irradiating the second inactive moieties in the one or more second region of the polymer with light to generate second active moieties in the one or more second region of the polymer. The method may also include coupling the second active moieties to second oligonucleotides.

Abstract: Examples of flow cells include substrates. Embodiments of the present disclosure also relate to methods of fabricating flow cell substrates. Some example workflows exploit light blocking properties of an imprint layer such that the process does not include etch steps. Such processes may be used to create substrates compatible with simultaneous paired-end sequencing methods.

Abstract: An example of a flow cell includes a substrate; a plurality of reactive regions spatially separated from one another across the substrate; and a plurality of independently removable coatings respectively positioned over each of the plurality of reactive regions. Each of the plurality of reactive regions includes a polymeric hydrogel layer; and a reactive entity attached to the polymeric hydrogel layer.

Abstract: An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network.

Abstract: A polymeric hydrogel is applied to a surface of a substrate including depressions separated by interstitial regions. Each depression includes a UV blocking layer positioned at a first region, and a second region that is transparent to UV and adjacent to the first region. Before or after the hydrogel is applied, a primer set is grafted to the hydrogel. The primer set includes 3? blocked uncleavable first and second pre-primers. The hydrogel or grafted layer is removed from the interstitial regions. At a first predetermined region of the grafted layer within the second region: the first pre-primers are altered to introduce cleavable first primers; and the second pre-primers are altered to introduce uncleavable second primers. At a second predetermined region of the grafted layer within the first region: the first pre-primers are altered to introduce uncleavable first primers; and the second pre-primers are blocked to introduce cleavable second primers.

Abstract: In an example method, a polymeric hydrogel is applied to a surface of a substrate including depressions separated by interstitial regions. Before or after the polymeric hydrogel is applied, a primer set is grafted to the polymeric hydrogel to form a grafted layer. The primer set includes cleavable first primers and uncleavable second primers. At a predetermined region of the grafted layer within a portion of at least some of the depressions, some of the cleavable first primers and some of the uncleavable second primers are altered to respectively introduce cleavable second primers and uncleavable first primers.

Abstract: In a method, a resin layer of a stack (e.g., resin layer over sacrificial layer over transparent substrate) is imprinted to form a convex region including first region with first height and second region with second height <first height. Stack portions are etched around the convex region to expose a substrate portion. The stack is utilized to develop a curable layer to define a cured layer over the exposed substrate portion. The convex region and cured layer are etched. The resin layer and a sacrificial layer portion underlying the second region are removed. A second substrate portion is exposed and a third substrate portion remains covered by a remaining sacrificial layer portion. The cured layer is substantially co-planar with the remaining sacrificial layer portion. A depression is formed extending to the second substrate portion. The remaining sacrificial layer portion is utilized to define functionalized layers over different depression regions.

Abstract: Provided herein are various examples of a method of coupling oligonucleotides to a polymer. The method may include selectively irradiating first inactive moieties in a one or more first region of a polymer with light, while not irradiating second inactive moieties in a one or more second region of the polymer, to generate first active moieties in the one or more first region of the polymer. The method may also include coupling the first active moieties to first oligonucleotides. The method may further include irradiating the second inactive moieties in the one or more second region of the polymer with light to generate second active moieties in the one or more second region of the polymer. The method may also include coupling the second active moieties to second oligonucleotides.

Abstract: An imprinting apparatus includes a silicon master and an anti-stick layer coating the silicon master. The silicon master includes a plurality of features positioned at an average pitch of less than about 425 nm, each of the plurality of features comprises a depression having an opening with its largest opening dimension being less than about 300 nm. The anti-stick layer includes a crosslinked silane polymer network.

Abstract: Provided are methods and systems that characterize a property of a particle suspended in a fluid sample in a label-free manner. Detection elements are provided fluidically adjacent upstream and downstream from a modulation element. Fluid sample containing particles flows across a first detection element and a first particle parameter detected for each particle that passes the first detection element or a first aggregate particle parameter for a plurality of particles that pass the first detection element. The particles flow from the first detection element to a first modulation element, wherein the first modulation element effects a change in a property of the particles flowing past the first modulation element. A second detection element then detects the particle parameter again or a second aggregate particle parameter for a plurality of particles that pass the second detection element. Comparing the first and second particle or aggregate parameters thereby characterizes the particle property.