Abstract: A distillation system includes a pot and a rectification column. Vapor is produced in the pot and the rectification column receives the vapor from the pot. The rectification column includes a first plate, a first ring, and a fluid distribution system. The first plate is positioned within the rectification column. The first ring is positioned within the rectification column. The first ring includes a first plurality of apertures. The fluid distribution system receives a pressurized cleaning fluid and provides the pressurized cleaning fluid to the first ring such that the pressurized cleaning fluid is propelled from the first ring via the first plurality of apertures into the rectification column. At least some of the first plurality of apertures are configured to cause the pressurized cleaning fluid propelled therefrom to contact the first plate.