Abstract: A microstructured antireflective texture is disclosed comprised of an engineered array of protuberances arranged on a non-periodic lattice. The average distance between said protuberances is in the subwavelength regime of the waveband for which the antireflective effect is desired. The non-periodic arrangement of protuberances acts to suppress blue-green backscattered light that is commonly seen diffracting from antireflective textures that use strictly periodic lattice arrangements. Embodiments of the invention include the randomized square pattern, and the quasicrystal pattern.

Abstract: A method employing a photolithography mask for producing microtextured antireflective surfaces is disclosed. The photolithography mask is used during the exposure of photoresist to a pattern of ultraviolet light. The exposed photoresist is subsequently processed to obtain a microtextured surface possessing antireflective properties. The antireflective surface profile comprises an array of sub-micron protuberances that may reside in a periodic arrangement, a quasiperiodic arrangement, or in an arbitrary non-periodic arrangement. The antireflective surface is designed for visible light. It may be scaled-up to large areas, and is suitable for replication into inexpensive polymer materials.

Abstract: A microstructured antireflective texture is disclosed comprised of an engineered array of protuberances arranged on a non-periodic lattice. The average distance between said protuberances is in the subwavelength regime of the waveband for which the antireflective effect is desired. The non-periodic arrangement of protuberances acts to suppress blue-green backscattered light that is commonly seen diffracting from antireflective textures that use strictly periodic lattice arrangements. Embodiments of the invention include the randomized square pattern, and the quasicrystal pattern.