Patents by Inventor Tanya Serzhanyuk

Tanya Serzhanyuk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for determining positions of a plurality of pixels to be introduced in a substrate of a photolithographic mask
    Patent number: 11366383
    Abstract: The present invention refers to a method and an apparatus for determining positions of a plurality of pixels to be introduced into a substrate of a photolithographic mask by use of a laser system, wherein the pixels serve to at least partly correct one or more errors of the photolithographic mask. The method comprises the steps: (a) obtaining error data associated with the one or more errors; (b) obtaining first parameters of an illumination system, the first parameters determining an illumination of the photolithographic mask of the illumination system when processing a wafer by illuminating with the illumination system using the photolithographic mask; and (c) determining the positions of the plurality of pixels based on the error data and the first parameters.
    Type: Grant
    Filed: October 1, 2019
    Date of Patent: June 21, 2022
    Assignee: Carl Zeiss SMS Ltd.
    Inventors: Vladimir Dmitriev, Kujan Gorhad, Joachim Welte, Tanya Serzhanyuk
  • METHOD AND APPARATUS FOR DETERMINING POSITIONS OF A PLURALITY OF PIXELS TO BE INTRODUCED IN A SUBSTRATE OF A PHOTOLITHOGRAPHIC MASK
    Publication number: 20200124959
    Abstract: The present invention refers to a method and an apparatus for determining positions of a plurality of pixels to be introduced into a substrate of a photolithographic mask by use of a laser system, wherein the pixels serve to at least partly correct one or more errors of the photolithographic mask. The method comprises the steps: (a) obtaining error data associated with the one or more errors; (b) obtaining first parameters of an illumination system, the first parameters determining an illumination of the photolithographic mask of the illumination system when processing a wafer by illuminating with the illumination system using the photolithographic mask; and (c) to determining the positions of the plurality of pixels based on the error data and the first parameters.
    Type: Application
    Filed: October 1, 2019
    Publication date: April 23, 2020
    Inventors: Vladimir Dmitriev, Kujan Gorhad, Joachim Welte, Tanya Serzhanyuk