Abstract: Provided are a pharmaceutical composition of (S)-ketorolac and a preparation method therefor, which belong to the technical field of pharmaceutical preparations. The pharmaceutical composition includes (S)-ketorolac or a pharmaceutically acceptable salt thereof, a stabilizer, a pH-adjusting agent, and an excipient, and the dosage form of the pharmaceutical composition is preferably lyophilized powder injection. The lyophilized powder injection prepared herein has optical purity of an active ingredient greater than or equal to 95% after being stored under long-term stability test conditions for 6 months and optical purity of an active ingredient greater than or equal to 90% after being stored under accelerated stability test conditions for 6 months. The lyophilized powder injection has important use in the preparation of non-steroidal anti-inflammatory drugs with analgesic, anti-inflammatory, antipyretic effects.

Abstract: A transcript of a conference (e.g., a video conference, an audio conference, or a telephone call with two or more participants) is processed to extract a conference summary. The transcript includes strings that are associated with respective timestamps and respective speaker identifiers. Speaker segments—sequences of consecutive strings attributed to the same speaker—are identified in the transcript. A speaker segment is selected based on its duration in time and one or more strings are selected from with the selected speaker segment for inclusion in the conference summary. A short video conference summary or a short audio conference summary is then generated using timestamps from the transcript associated with strings (e.g., sentences) that have been selected for inclusion in the conference summary. The short video or audio summary may be presented to users to enable efficient storage and transmission of information from the conference within a unified communications system.

Abstract: A phase tracking reference signal (PT-RS) may be transmitted to enable a receiver to correct phase noise in wireless communication. A UE scheduled for one PDSCH with DMRS ports in two or more DMRS CDM groups that are associated with two TCI states may be configured for PT-RS using two PT-RS ports. Therefore, rather than limiting PT-RS to a single port, the PT-RS may be transmitted to the UE using two PT-RS ports. The apparatus transmits a capability indication for more than one PT-RS port for receiving a downlink shared channel based on a first TCI and a second TCI. The apparatus receives a configuration for a maximum number of downlink PT-RS ports from a base station.

Abstract: A phase tracking reference signal (PT-RS) may be transmitted to enable a receiver to correct phase noise in wireless communication. A UE scheduled for one PDSCH with DMRS ports in two or more DMRS CDM groups that are associated with two TCI states may be configured for PT-RS using two PT-RS ports. Therefore, rather than limiting PT-RS to a single port, the PT-RS may be transmitted to the UE using two PT-RS ports. The apparatus transmits a capability indication for more than one PT-RS port for receiving a downlink shared channel based on a first TCI and a second TCI. The apparatus receives a configuration for a maximum number of downlink PT-RS ports from a base station.

Abstract: A ketorolaco derivative as shown in formula (I) has a better half-life and stability, has good pharmacokinetic properties, and has a higher stability in vitro; and as a preparation, the ketorolaco derivative can enhance efficacy and reduce toxicity. The present invention well improves the defects of frequent administration, gastrointestinal side effects, poor compliance and the like in traditional ketorolaco preparations.

Abstract: The application related to an ibuprofen ester derivative and an emulsion preparation thereof. A carboxyl group of racemic ibuprofen or S-ibuprofen is derivatized so that Compound N9 and a dextrorotatory enantiomer N9(S) thereof are obtained and further prepared into an emulsion preparation, which overcomes the problems of safety and compliance of patients existing in clinical application of existing ibuprofen/dexibuprofen injections and achieves the purposes of reducing vascular irritation, increasing clinical use approaches, and improving the stability of preparations in clinical applications.

Abstract: Provided is an ibuprofen ester prodrug represented by Structural Formula (1), a racemate, stereoisomer or pharmaceutically acceptable salt or solvate thereof, or a solvate of a pharmaceutically acceptable salt thereof. Further provided are a method for preparing the compound, a pharmaceutical composition containing the compound, and an application of the compound in preparation of nonsteroidal anti-inflammatory drugs. The pharmaceutical composition containing the ibuprofen ester prodrug may be prepared into fat emulsion injection preparations. The ibuprofen ester prodrug has good stability and good pharmacokinetic properties and overcomes the problems of ibuprofen such as a short half-life, poor stability, irritation, and incompatibility.

Abstract: Provided are an arylpropionic acid derivative represented by Formula (I), a pharmaceutical composition and a preparation method and an application thereof. The arylpropionic acid derivative has a good half-life, pharmacokinetic property and in vitro stability and can enhance efficacy and reduce toxicity after formulated into preparations, which repairs the defects of frequent administration, gastrointestinal side effects and poor patient compliance of traditional nonsteroidal anti-inflammatory drugs.

Abstract: Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping layer, a hard mask layer, and forming an opening therein. An absorber layer is then filled in the opening and over the top surface of the hard mask layer. A planarized process is provided to remove the absorber layer above the top surface of the hard mask layer and form an absorber in the opening, wherein the absorber has a top portion wider than a bottom portion.

Abstract: A photolithographic technique includes receiving a mask having a printing feature region, a sub-resolution assist feature (SRAF) region, and a third region. Each region has a different thickness of an absorptive layer disposed therein. The technique also includes exposing the mask to radiation, such that an intensity of radiation reflected by the SRAF region is substantially between an intensity of radiation reflected by the printing feature region and an intensity of radiation reflected by the third region. Using the radiation reflected by the printing feature region, the radiation reflected by the SRAF region, and the radiation reflected by the third region a workpiece is exposed.

Abstract: Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping layer, a hard mask layer, and forming an opening therein. An absorber layer is then filled in the opening and over the top surface of the hard mask layer. A planarized process is provided to remove the absorber layer above the top surface of the hard mask layer and form an absorber in the opening, wherein the absorber has a top portion wider than a bottom portion.

Abstract: A photolithographic technique includes receiving a mask having a printing feature region, a sub-resolution assist feature (SRAF) region, and a third region. Each region has a different thickness of an absorptive layer disposed therein. The technique also includes exposing the mask to radiation, such that an intensity of radiation reflected by the SRAF region is substantially between an intensity of radiation reflected by the printing feature region and an intensity of radiation reflected by the third region. Using the radiation reflected by the printing feature region, the radiation reflected by the SRAF region, and the radiation reflected by the third region a workpiece is exposed.

Abstract: Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping layer, a hard mask layer, and forming an opening therein. An absorber layer is then filled in the opening and over the top surface of the hard mask layer. A planarized process is provided to remove the absorber layer above the top surface of the hard mask layer and form an absorber in the opening, wherein the absorber has a top portion wider than a bottom portion.

Abstract: A photomask having a partial-thickness assist feature and a technique for manufacturing the photomask are disclosed. In an exemplary embodiment, the photomask includes a mask substrate, a reflective structure disposed on the mask substrate, and an absorptive layer formed on the reflective structure. A printing feature region and an assist feature region are defined on the mask. The absorptive layer has a first thickness in the printing feature region and a second thickness in the assist feature region that is different from the first thickness. In some such embodiments, the second thickness is configured such that radiation reflected by the assist feature region does not exceed an exposure threshold of a photoresist of a target.

Abstract: A photomask having a partial-thickness assist feature and a technique for manufacturing the photomask are disclosed. In an exemplary embodiment, the photomask includes a mask substrate, a reflective structure disposed on the mask substrate, and an absorptive layer formed on the reflective structure. A printing feature region and an assist feature region are defined on the mask. The absorptive layer has a first thickness in the printing feature region and a second thickness in the assist feature region that is different from the first thickness. In some such embodiments, the second thickness is configured such that radiation reflected by the assist feature region does not exceed an exposure threshold of a photoresist of a target.

Abstract: Embodiments of EUV photomasks and methods for forming a EUV photomask are provided. The method comprises providing a substrate, a reflective layer, a capping layer, a hard mask layer, and forming an opening therein. An absorber layer is then filled in the opening and over the top surface of the hard mask layer. A planarized process is provided to remove the absorber layer above the top surface of the hard mask layer and form an absorber in the opening, wherein the absorber has a top portion wider than a bottom portion.

Abstract: A method and a biomarker for detecting of acute kidney injury is provided, wherein the method of the present comprises the following steps: detecting a soluble form of hemojuvelin in a sample obtained from a subject, wherein when the soluble form of hemojuvelin is present in the sample, the subject is identified as having acute kidney injury.

Abstract: A method for fabricating a metallic member includes providing a pre-forging mould. The pre-forging mould comprises an upper mould and a lower mould. The lower mould defines a pre-forging chamber, and a die cavity defined in a bottom surface of the pre-forging chamber. A metallic stock is placed above the die cavity, and the upper mould is moved toward the lower mould to forge the metallic stock, thereby forming a pre-formed body comprising a forging portion and a pre-forged base; annealing the pre-formed body; providing a forging mould to forge the pre-formed body, thereby obtaining a forged-body with a forged base thinner than that of the pre-forged base. Then the forged-body is milled to a desired size, and sandblasted, thereby obtaining the metallic member.

Abstract: A semiconductor machine and a cleaning process are provided. The semiconductor machine includes a chamber and a cleaning module. The cleaning process includes the following steps. Firstly, the semiconductor machine is used to perform a semiconductor manufacturing process, wherein a titanium-based material is etched in the semiconductor manufacturing process. Then, a cleaning task is activated to clean the semiconductor machine by using a cleaning agent including a gas mixture of a fluoride compound and oxygen.

Abstract: The invention is directed to an organic electroluminescent (EL) display device having an improved light extracting efficiency due to a photonic crystal layer formed proximate one side of a stack. Among other elements, the stack may include a first electrode formed on a substrate, an organic light emitting layer formed above the first electrode, and a second electrode formed above the organic light emitting layer. Additionally, the photonic crystal layer may be configured to correspond to a wavelength of colored light. An organic EL display device having an improved light extracting efficiency may be manufactured using a thermal transfer donor film to adhere the photonic crystal layer to the stack.