Abstract: An electrochemical cell for a secondary battery, preferably for use in an electric vehicle, is provided. The cell includes a solid metallic anode, which is deposited over a suitable current collector substrate during the cell charging process. Several variations of compatible electrolyte are disclosed, along with suitable cathode materials for building the complete cell.

Abstract: An electrochemical cell for a secondary battery, preferably for use in an electric vehicle, is provided. The cell includes a solid metallic anode, which is deposited over a suitable current collector substrate during the cell charging process. Several variations of compatible electrolyte are disclosed, along with suitable cathode materials for building the complete cell.

Abstract: The present application relates to an electrochemical cell comprising a nitrile-based solvent based electrolyte wherein, the electrolyte salt comprises NaClO4 and, at any stage of charge of the electrochemical cell, the electrolyte salt has a high Molar concentration in the discharged state.

Abstract: An electrochemical cell for an energy-dense rechargeable battery is provided. The cell includes a solid metallic sodium anode, which is deposited over a suitable current collector during the cell charging process. Several variations of compatible electrolytes are disclosed, along with novel cathode materials for building the complete high-energy battery cell.

Abstract: An electrochemical cell for a secondary battery, preferably for use in an electric vehicle, is provided. The cell includes a solid metallic anode, which is deposited over a suitable current collector substrate during the cell charging process. Several variations of compatible electrolyte are disclosed, along with suitable cathode materials for building the complete cell.

Abstract: Disclosed is an apparatus for processing a surface of a substrate by subjecting the surface of a substrate to successive surface reactions of at least a first precursor and a second precursor. The apparatus includes at least one nozzle head having two or more two or more precursor zones for subjecting the surface of the substrate to at least the first and second precursors and a moving mechanism for moving the nozzle head in oscillating movement between a first end position and a second end position. The moving mechanism is arranged to store at least part of the kinetic energy of the nozzle head released in oscillating movement of the nozzle head.

Abstract: There is provided a thin film reflector, a method and an ALD-system for producing the thin film reflector. The method includes the steps of providing a substrate including at least one type of material, and providing a thin film including a metallic compound on at least part of the substrate. The method also includes the step of coating at least part of the thin film with a first barrier layer by applying Low Temperature Atomic Layer Deposition with at least one first material, and the step of providing a second barrier layer on at least part of the first barrier layer by applying High Temperature Atomic Layer Deposition, with at least one second material to thereby obtain a multi-layered thin film reflector. There is also an ALD control system for controlling the ALD-system. There is furthermore provided a computer program for controlling the temperature to be used by an ALD-tool.

Abstract: Methods for providing one or more coating layers on a surface of a substrate by successive surface reactions of at least a first and second precursor are provided. The methods generally include supplying the first precursor from a first precursor nozzle and the second precursor from a second precursor nozzle to the surface of the substrate, and moving the substrate relative to at least one of the first and second precursor nozzle. The methods can further include subjecting only one or more first limited sub-areas of the surface of the substrate to the first and second precursor by cooperation of supplying the first and second precursor and simultaneously moving the substrate relative to at least one of the first and second precursor nozzle.

Abstract: The invention relates to a method and an apparatus for providing one or more coating layers on a surface of a substrate by successive surface reactions of at least a first and second precursor. The method includes supplying the first precursor from a first precursor nozzle and the second precursor from a second precursor nozzle to the surface of the substrate, and moving the substrate relative to at least one of the first and second precursor nozzle. The method further includes subjecting only one or more first limited sub-areas of the surface of the substrate to the first and second precursor by cooperation of supplying the first and second precursor and simultaneously moving the substrate relative to at least one of the first and second precursor nozzle.

Abstract: A nozzle and nozzle head arranged to subject a surface of a substrate to gaseous precursors. The nozzle includes an output face via which the precursor is supplied, a longitudinal precursor supply element for supplying precursor and a longitudinal discharge channel open to and along the output face for discharging at least a fraction of the precursor supplied from the precursor channel. The precursor supply element is arranged to extend inside the discharge channel such that the precursor supply element divides the discharge channel in the longitudinal direction to a first discharge sub-channel and a second discharge sub-channel on opposite sides of the precursor supply element for supplying precursor through the discharge channel.

Abstract: Disclosed is an apparatus for processing a surface of a substrate by subjecting the surface of a substrate to successive surface reactions of at least a first precursor and a second precursor. The apparatus includes at least one nozzle head having two or more two or more precursor zones for subjecting the surface of the substrate to at least the first and second precursors and a moving mechanism for moving the nozzle head in oscillating movement between a first end position and a second end position. The moving mechanism is arranged to store at least part of the kinetic energy of the nozzle head released in oscillating movement of the nozzle head.

Abstract: A decorative coating and a method for forming a decorative coating on a substrate (2). The decorative coating comprises an absorbing film (1) to attenuate the transmission of visible light through the coating. The method comprises the steps of bringing the substrate (2) into a reaction space, and depositing the absorbing film (1) on the substrate (2). Depositing the absorbing film (1) on the substrate comprises the steps of forming a preliminary deposit of transition metal oxide on the deposition surface and subsequently purging the reaction space, and treating the deposition surface with an organometallic chemical comprising first metal and subsequently purging the reaction space. The steps of forming the preliminary deposit and treating the deposition surface are alternately repeated to increase absorption of the absorbing film (1).