Abstract: Systems and methods include techniques for determining whether to use underbalanced coiled tubing drilling (UBCTD) or conventional drilling with hydraulic fracturing to drill a new well in deep and tight reservoirs with slow rate of penetration issues. Estimates of geomechanical properties and image log processing for past-drilled wells are completed first, then three-dimensional (3D) property modeling and natural fracture prediction (NFP) for the domain are conducted. Then a 3D geomechanics model is generated. After this the rock properties and NFP along the planned well trajectory are extracted. The diagenetic rock typing is evaluated. Required breakdown pressure for hydraulic fracturing is calculated. A determination based on the diagenetic rock typing and required breakdown pressure is made whether UBCTD or conventional drilling with hydraulic fracturing should be used for a new well.

Abstract: The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.

Abstract: A method for processing waveform data for determining a characteristic inside an object includes receiving raw waveform data collected with waveform sensors over a given object; pretraining a first neural network with the raw waveform data so that structural information within the raw waveform data is extracted; receiving a first task to be performed with regard to the object, based on the raw waveform data; fine-tuning a second neural network, based on (1) pretrained parameters from the first neural network, and (2) the first task; and generating an image of the object using the second neural network with refined parameters.

Abstract: A method for waveform inversion, the method including receiving observed data d, wherein the observed data d is recorded with sensors and is indicative of a subsurface of the earth; calculating estimated data p, based on a model m of the subsurface; calculating, using a trained neural network, a misfit function JML; and calculating an updated model mt+1 of the subsurface, based on an application of the misfit function JML to the observed data d and the estimated data p.

Abstract: The present disclosure generally relates to pharmaceutical mouth rinse compositions comprising Neem oil that are useful for treating viral infections, including coronavirus infections.

Abstract: A method for partial differential equation inversion, the method including receiving measured data do; selecting an objective function having first and second measures N1 and N2, wherein the objective function depends on three independent variables V, u, and f, V being a perturbation of a wave equation operator L from a background operator L0, u being a wavefield that satisfies the wave equation operator L, and f being a source function that describes the source of the waves; optimizing with a processor the objective function by finding a minimum or a maximum using the inversion; calculating with the processor solutions V*, u*, and f* of the three independent variables V, u, and f; and generating with the processor an image of an object based on the solutions V*, u*, and f*.

Abstract: The present disclosure generally relates to pharmaceutical mouth rinse compositions comprising Neem oil that are useful for treating viral infections, including coronavirus infections.

Abstract: A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor press

Abstract: A direct-deposition system forming a high-resolution pattern of material on a substrate is disclosed. Vaporized atoms from an evaporation source pass through a pattern of through-holes in a shadow mask to deposit on the substrate in the desired pattern. The shadow mask is held in a mask chuck that enables the shadow mask and substrate to be separated by a distance that can be less than ten microns. Prior to reaching the shadow mask, vaporized atoms pass through a collimator that operates as a spatial filter that blocks any atoms not travelling along directions that are nearly normal to the substrate surface. Vaporized atoms that pass through the shadow mask exhibit little or no lateral spread after passing through through-holes and the material deposits on the substrate in a pattern that has very high fidelity with the through-hole pattern of the shadow mask.

Abstract: Embodiments of the present disclosure describe methods for efficient wavefield solutions, the methods including defining a wave equation as a linear portion and as a nonlinear portion; and solving the wave equation via an iterative process, the iterative process including, at each iteration, performing LU decomposition before solving the nonlinear portion, or obtaining best finite difference coefficients by solving an optimization equation.

Abstract: The present disclosure provides a travel pillow including a back section and two arm sections each including a filler material, the back section comprising a pouch comprising a blanket attachable to the pillow and configured to fit in the pouch, the arm sections each range in length from about 8 inches to about 15 inches and are approximately the same length, the back section ranges in length from about 6 inches to about 12 inches, the arm sections and back section have a thickness ranging from 3 inches to 12 inches and the blanket includes a semispherical, hemispherical, and/or oval opening sufficient for accommodating a user's head.

Abstract: In a method for designing and fabricating a micro-lens array, a design is finalized by varying certain features of a shadow mask, varying a distance between a source of lens-forming material and the shadow mask, and varying other parameters until the features and distances result in the formation of a micro-lens having desired shape, etc. A shadow mask in accordance with the design is then fabricated and is appropriately positioned with respect to a micro-display and a source of lens-forming material. A plume of lens-forming material is then generated under reduced pressure and which propagates toward the shadow mask, directly patterning the micro-lenses on sub-pixels of the micro-display.

Abstract: A shadow mask that includes compensation layer operative for at least partially correcting gravity-induced sag of a shadow-mask membrane is disclosed. The compensation layer is formed on a surface of the shadow-mask membrane such that the compensation layer is characterized by a residual stress that gives rise to a first bending moment in the membrane, where the first bending moment is directed in the opposite direction to a second bending moment in the membrane that is induced by the effect of gravity.

Abstract: The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.

Abstract: Aspects of the present disclosure are directed to systems, method, and structures including a high-resolution shadow mask with tapered aperture/pixel openings that advantageously overcomes problems plaguing the prior art namely shadowing, sagging, and fragility.

Abstract: The present disclosure enables high-resolution direct patterning of a material on a substrate by establishing and maintaining a separation between a shadow mask and a substrate based on the thickness of a plurality of standoffs. The standoffs function as a physical reference that, when in contact between the substrate and shadow mask determine the separation between them. Embodiments are described in which the standoffs are affixed to an element selected from the shadow mask, the substrate, the mask chuck, and the substrate chuck.

Abstract: A method for partial differential equation inversion, the method including receiving measured data do; selecting an objective function having first and second measures N1 and N2, wherein the objective function depends on three independent variables V, u, and f, V being a perturbation of a wave equation operator L from a background operator L0, u being a wavefield that satisfies the wave equation operator L, and f being a source function that describes the source of the waves; optimizing with a processor the objective function by finding a minimum or a maximum using the inversion; calculating with the processor solutions V*, u*, and f* of the three independent variables V, u, and f; and generating with the processor an image of an object based on the solutions V*, u*, and f*.

Abstract: OLED-based displays that include pixel arrays having non-uniform sub-pixel arrangements are presented. The non-uniformity of the sub-pixel arrangements enable the pattern of light-emitting material for each sub-pixel color to be deposited through a structurally robust, high-resolution shadow mask in a single deposition. Sub-pixel arrangements in accordance with the present disclosure have larger separations between adjacent features and, therefore, shadow masks suitable for use in forming an entire same-color sub-pixel pattern have apertures that are separated by more structural material. As a result, such shadow masks have greater structural integrity than shadow masks known in the prior art. The teachings of the present disclosure are particularly well suited for the fabrication of full-color, high-resolution, side-by-side-type OLED displays that have a pixel pitch of 20 microns or less.

Abstract: A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor press

Abstract: A linear evaporation apparatus, system and method including a conductance chamber including a linear output section configured to emit a linear source deposition flux therethrough, an evaporative vapor communication conduit including an evaporative vapor mixing chamber and a plurality of crucible-receiving apertures at distal ends from the evaporative vapor mixing chamber, wherein the evaporative vapor mixing chamber is in communication with the conductance chamber and configured to transmit the linear source deposition flux therethrough, and a plurality of crucibles, each of the plurality of crucibles corresponding to one of the plurality of crucible-receiving apertures at the distal ends from the evaporative vapor mixing chamber, each of the plurality of crucibles configured to hold a material and heat the material to a corresponding material evaporation temperature, each of the plurality of crucibles further including a vapor pressure activated lid configured to open at a predetermined material vapor press