Abstract: An object of the present invention is to provide a treatment liquid and a treatment method that are capable of enhancing the corrosion resistance of a net material. This object is achieved by, after forming a chemical conversion treatment film on the surface of a metal material, forming a film using a film-forming treatment liquid, the treatment liquid comprising: a silicon compound containing at least one member selected from the group consisting of alkoxysilyl, alkoxysilylene, and a siloxane bond; an organometallic compound; and water.

Abstract: Improved plating is provided. The present invention provides a plated product which comprises a base, a deposit layer formed by plating on a surface of the base, and a silica-compound-containing coating layer formed on the surface of the deposit layer. The coating layer has a thickness of 0.1-100 ?m, preferably 0.1-20 ?m, more preferably 0.1-10 ?m, even more preferably 0.1-5 ?m. The coating layer may contain a dye and/or a pigment.

Abstract: An object of the present invention is to provide a near-infrared shielding film having low initial haze and resistance to haze increase in weathering tests, to provide a method for producing such a near-infrared shielding film, and to provide a pressure-sensitive adhesive composition. The near-infrared shielding film of the present invention includes a transparent substrate and a component layer that is provided on at least one surface of the substrate and includes, as compounds, resin A shown below, at least one of resin B or C shown below, and oxide fine particles D shown below. Resin A: A resin having an acid value of less than 0.5 mgKOH/g and a hydroxy value of 5 to 60 mgKOH/g Resin B: A resin having an acid value of 1 to 60 mgKOH/g Resin C: A resin having an acid value of at least 1 mgKOH/g and a hydroxy value of 5 to 60 mgKOH/g Oxide fine particles D: Tungsten oxide fine particles or composite tungsten oxide fine particles.

Abstract: Provided is means that enables a hard coat layer to resist cracking and to have improved scratch resistance in a laminated film including a substrate, a surfactant-containing layer on one surface of the substrate, and the hard coat layer on the other surface of the substrate. The laminated film includes a substrate, a surfactant-containing layer that is disposed on one surface of the substrate and contains a surfactant, and a hard coat layer disposed on the other surface of the substrate, wherein the hard coat layer contains 0.001 to 3% by weight of a (meth)acrylic modified silicone compound.

Abstract: An object of the present invention is to provide a near-infrared shielding film having low initial haze and resistance to haze increase in weathering tests, to provide a method for producing such a near-infrared shielding film, and to provide a pressure-sensitive adhesive composition. The near-infrared shielding film of the present invention includes a transparent substrate and a component layer that is provided on at least one surface of the substrate and includes, as compounds, resin A shown below, at least one of resin B or C shown below, and oxide fine particles D shown below. Resin A: A resin having an acid value of less than 0.

Abstract: Provided is means that enables a hard coat layer to resist cracking and to have improved scratch resistance in a laminated film including a substrate, a surfactant-containing layer on one surface of the substrate, and the hard coat layer on the other surface of the substrate. The laminated film includes a substrate, a surfactant-containing layer that is disposed on one surface of the substrate and contains a surfactant, and a hard coat layer disposed on the other surface of the substrate, wherein the hard coat layer contains 0.001 to 3% by weight of a (meth)acrylic modified silicone compound.

Abstract: An object of the present invention is to provide a dielectric multilayer coating film with high weather-resistant adhesion. The dielectric multilayer coating film includes a dielectric multilayer coating having a stack of high and low refractive index layers; and a hard coat layer, wherein at least one of the high and low refractive index layers contains a compound with photocatalytic activity, and when the dielectric multilayer coating is divided into two halves along its thickness direction, there is a difference of 0.1% to less than 10% between the volume shrinkage of the half distal to the hard coat layer and the volume shrinkage of the hard coat layer.

Abstract: Disclosed are: an organic electroluminescent element which has high power efficiency, excellent resistance to luminance decrease due to continuous operation and excellent storage stability at high temperatures, while being reduced in chromatically change of color developing light; and a method for manufacturing the organic electroluminescent element. Specifically disclosed is an organic electroluminescent element that has a positive electrode and a negative electrode on a supporting substrate, while comprising an organic layer, which contains at least one light-emitting layer, between the positive electrode and the negative electrode. The organic electroluminescent element is characterized in that at least one layer in the organic layer contains a crown ether compound and a compound having a dibenzofuran skeleton.

Abstract: [Problem] To provide a an infrared shielding film which realizes a balance between the hard coating properties of the cured resin layer and the suppression of peeling or cracking of the film, while having heat shielding characteristics of an infrared shielding film. [Solution] An infrared shielding film including a substrate; an infrared reflecting layer having at least one or more low refractive index layers and at least one or more high refractive index layers laminated therein; and a cured resin layer formed at the outermost surface, laminated together, the cured resin layer containing inorganic nanoparticles, in which the hardness obtainable by the pencil hardness test described in JIS K5600-5-4:1999 is from 2B to 3H; the number of scratches obtainable by a steel wool test (load 500 g/cm2, 10 reciprocations) is 15 or less; and the mandrel diameter at which the hard coated surface begins to crack in the bending test described in JIS K5600-5-1:1999 (cylindrical mandrel method) is 15 mm or less.

Abstract: In a case where a functional film that includes an acrylic layer 7, an intermediate layer 8, and a protection layer 9 adjacent to one another on a resin substrate 3, and has the protection layer 9 on its outermost surface is manufactured, the protection layer 9 contains at least a polysiloxane compound, and the intermediate layer 8 contains at least one of the following materials: polyvinyl alcohol resin, polyvinyl acetate, cellulose, and water glass. With this structure, interlayer coupling between the acrylic layer 7 and the intermediate layer 8, and interlayer coupling between the intermediate layer 8 and the protection layer 9 can be strengthened, and detachment of each of the acrylic layer 7, the intermediate layer 8, and the protection layer 9 can be reduced. Accordingly, a functional film that is highly resistant to damage can be obtained.

Abstract: Disclosed are: an organic electroluminescent element which has high power efficiency, excellent resistance to luminance decrease due to continuous operation and excellent storage stability at high temperatures, while being reduced in chromatically change of color developing light; and a method for manufacturing the organic electroluminescent element. Specifically disclosed is an organic electroluminescent element that has a positive electrode and a negative electrode on a supporting substrate, while comprising an organic layer, which contains at least one light-emitting layer, between the positive electrode and the negative electrode. The organic electroluminescent element is characterized in that at least one layer in the organic layer contains a crown ether compound and a compound having a dibenzofuran skeleton.

Abstract: Disclosed is a method of processing a light sensitive planographic printing plate material comprising an aluminum support, and provided thereon, a photopolymerizable light sensitive layer containing a polymerizable ethylenically unsaturated compound, a photopolymerization initiator, and a polymer binder, the method comprising the steps of imagewise exposing the light sensitive planographic printing plate material, developing the exposed light sensitive planographic printing plate material with a developer to obtain a planographic printing plate, the developer containing no silicate or containing a silicate in amount of not more than 0.1% by weight in terms of SiO2, and plate processing the resulting planographic printing plate with a plate protecting solution containing a phosphonic acid compound at a temperature of from 40 to 90° C.

Abstract: An objective is to provide a photosensitive planographic printing plate material, a photosensitive composition for the photosensitive planographic printing plate material, and a method of recording the planographic printing plate material which are suitable for exposure employing laser light having an emission wavelength of 350-450 nm, and exhibit excellent resistance to chemicals and excellent linearity, together with an excellent safe light property. Also disclosed is a photosensitive composition comprising (A) an addition-polymerizable ethylenic double bond-containing compound that is represented by the following Formula (1), (B) a biimidazole compound that acts as a photopolymerization initiator, (C) a polymer binder, and (D) a dye exhibiting an absorption maximum wavelength of 350-450 nm.

Abstract: Disclosed is a method of processing a light sensitive planographic printing plate material comprising an aluminum support, and provided thereon, a photopolymerizable light sensitive layer containing a polymerizable ethylenically unsaturated compound, a photopolymerization initiator, and a polymer binder, the method comprising the steps of imagewise exposing the light sensitive planographic printing plate material, developing the exposed light sensitive planographic printing plate material with a developer to obtain a planographic printing plate, the developer containing no silicate or containing a silicate in amount of not more than 0.1% by weight in terms of SiO2, and plate processing the resulting planographic printing plate with a plate protecting solution containing a phosphonic acid compound at a temperature of from 40 to 90° C.

Abstract: A laser-induced thermal transfer ink sheet for forming a transfer image, comprising a support having thereon a light-to-heat converting layer containing a light-to-heat converting compound, an interlayer containing a resin, and an ink layer in that order, wherein the light-to-heat converting compound and the resin satisfy one of the following requirements (a) and (b); (a) the light-to-heat converting compound is soluble in an organic solvent and the resin is soluble in water; and (b) the light-to-heat converting compound is soluble in water and the resin is soluble in an organic solvent.

Abstract: A laser thermal-transfer to transfer an ink image by being imagewise exposed with a laser beam, comprising: at a support; a photo-thermal conversion layer; and an ink layer having at least one kind of a thermoplastic resin and a pigment, wherein an average transmittance of the ink layer for a light having wavelength of 350 to 650 nm is not more than 70% and L* value of the ink layer is not less than 60.

Abstract: A laser-induced thermal transfer ink sheet for forming a transfer image, comprising a support having thereon a light-to-heat converting layer containing a light-to-heat converting compound, an interlayer containing a resin, and an ink layer in that order, wherein the light-to-heat converting compound and the resin satisfy one of the following requirements (a) and (b);

Abstract: A laser thermal-transfer to transfer an ink image by being imagewise exposed with a laser beam, comprising: at a support; a photo-thermal conversion layer; and an ink layer having at least one kind of a thermoplastic resin and a pigment, wherein an average transmittance of the ink layer for a light having wavelength of 350 to 650 nm is not more than 70% and L* value of the ink layer is not less than 60.