Patents by Inventor Taro MIYOSHI

Taro MIYOSHI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12265329
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a solubility in a developer, which changes by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation; and an acid diffusion control agent, in which a molecular weight of the acid diffusion control agent is 420 or more, and a distance Ra between a Hansen solubility parameter of the acid diffusion control agent and a Hansen solubility parameter of the air satisfies 15?Ra?45.
    Type: Grant
    Filed: August 4, 2021
    Date of Patent: April 1, 2025
    Assignee: FUJIFILM Corporation
    Inventors: Kotaro Takahashi, Yasunori Yonekuta, Taro Miyoshi
  • Publication number: 20250004377
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin having a repeating unit (a) having a group that is decomposed by the action of an acid to generate a carboxylic acid and (B) a compound that generates an acid upon irradiation with an actinic ray or a radiation and is represented by a specified general formula (1). The repeating unit (a) is represented by a general formula (a), and the compound (B) is represented by a general formula (1).
    Type: Application
    Filed: January 28, 2024
    Publication date: January 2, 2025
    Applicant: FUJIFILM Corporation
    Inventors: Eiji FUKUZAKI, Shuhei YAMAGUCHI, Tomoaki YOSHIOKA, Taro MIYOSHI
  • Patent number: 12164230
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a solubility in an alkali developer that increases through decomposition by an action of an acid and (B) a compound that generates an acid upon irradiation with actinic rays or radiation and is represented by a specific structure; an actinic ray-sensitive or radiation-sensitive film using the composition; a pattern forming method; a method for manufacturing an electronic device; and a compound.
    Type: Grant
    Filed: February 3, 2021
    Date of Patent: December 10, 2024
    Assignee: FUJIFILM Corporation
    Inventors: Taro Miyoshi, Yasunori Yonekuta, Eiji Fukuzaki
  • Publication number: 20240241443
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having (A) a repeating unit having a group that is decomposed by the action of an acid to generate a carboxylic acid and represented by a specified general formula (a) and (B) a repeating unit having a group that is decomposed by irradiation with an actinic ray or a radiation to generate an acid and represented by a specified general formula (b), and a solvent including a solvent having a boiling point of 150° C. or more, a solvent having a boiling point of 150° C. or more being contained in 45 mass % or more with respect to the total amount of the solvent.
    Type: Application
    Filed: January 25, 2024
    Publication date: July 18, 2024
    Applicant: FUJIFILM Corporation
    Inventors: Eiji FUKUZAKI, Shuhei YAMAGUCHI, Tomoaki YOSHIOKA, Taro MIYOSHI
  • Publication number: 20240210826
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition including: a resin (A) that is decomposed by the action of an acid and thereby increased in polarity; and a compound (C) that generates an acid upon irradiation with actinic rays or radiation and that is represented by a specific formula. The resin (A) includes a specific repeating unit represented by specific general formula (AI).
    Type: Application
    Filed: February 26, 2024
    Publication date: June 27, 2024
    Applicant: FUJIFILM Corporation
    Inventors: Taro MIYOSHI, Shuhei YAMAGUCHI, Tomoaki YOSHIOKA, Eiji FUKUZAKI, Yuka KAMINO
  • Publication number: 20230408920
    Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition in which LWR of a pattern to be obtained is excellent; a resist film; a pattern forming method; and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition contains a resin having a group which is decomposed by action of acid to generate a polar group, in which the resin includes a repeating unit represented by General Formula (A2), and at least one of a requirement 1 or a requirement 2 is satisfied.
    Type: Application
    Filed: August 30, 2023
    Publication date: December 21, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Shuhei YAMAGUCHI, Taro MIYOSHI
  • Publication number: 20230393473
    Abstract: An object of the present invention is to provide an actinic ray-sensitive or radiation-sensitive resin composition having excellent sensitivity to exposure. Another object of the present invention is to provide a resist film, a pattern forming method, and a method for manufacturing an electronic device, which relate to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a resin which is decomposed by action of acid to increase polarity, in which at least one of a requirement that the actinic ray-sensitive or radiation-sensitive resin composition further contains a compound represented by Formula (1), or a requirement that the resin which is decomposed by action of acid to increase polarity has a residue formed by removing one hydrogen atom from the compound represented by Formula (1) is satisfied.
    Type: Application
    Filed: August 14, 2023
    Publication date: December 7, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Taro MIYOSHI, Shuhei YAMAGUCHI, Eiji FUKUZAKI, Tomoaki YOSHIOKA
  • Publication number: 20230393472
    Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition having excellent temporal stability and excellent LWR suppression property of a pattern to be formed; a resist film; a positive tone pattern forming method; and a method for manufacturing an electronic device, which relate to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition contains a resin (A) having a repeating unit (a) and a basic compound, a pKa of a conjugate acid of which is 13.
    Type: Application
    Filed: August 8, 2023
    Publication date: December 7, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Shuhei YAMAGUCHI, Taro MIYOSHI
  • Publication number: 20230384674
    Abstract: Provided are an actinic ray-sensitive or radiation-sensitive resin composition with which LWR of a pattern to be formed can be reduced; a resist film; a pattern forming method; and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of the present invention is an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (A) having a repeating unit (a), in which the repeating unit (a) is a repeating unit having an ionic group which generates an acid in a case where a leaving group is eliminated by irradiation with an actinic ray or a radiation, in which a repeating unit obtained by replacing the leaving group with a hydrogen atom has a molecular weight of 300 or less, and the repeating unit (a) is a predetermined amount or more with respect to a total solid content of the actinic ray-sensitive or radiation-sensitive resin composition.
    Type: Application
    Filed: August 11, 2023
    Publication date: November 30, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Shuhei YAMAGUCHI, Taro Miyoshi, Tomoaki Yoshioka, Eiji Fukuzaki
  • Publication number: 20230123203
    Abstract: A method for producing an actinic ray-sensitive or radiation-sensitive resin composition, the method including passing a solution including an acid compound having a pKa of 2.0 or more through a column packed with an ion-exchange resin, producing an onium salt by using the acid compound having been passed through the column, and mixing together the onium salt and a resin that undergoes an increase in polarity due to action of acid.
    Type: Application
    Filed: August 9, 2022
    Publication date: April 20, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Taro MIYOSHI, Shuhei Yamaguchi
  • Publication number: 20230120139
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (A) of which polarity increases by an action of an acid, the resin (A) having a repeating unit represented by General Formula (A1) as defined herein; and a compound (B) that generates an acid upon irradiation with actinic rays or radiation.
    Type: Application
    Filed: November 15, 2022
    Publication date: April 20, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Taro MIYOSHI, Eiji Fukuzaki, Shuhei Yamaguchi
  • Publication number: 20230075188
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a polarity that increases by an action of an acid, and (B) a compound that generates an acid upon irradiation with actinic rays or radiation, represented by a specific general formula, is which the resin (A) includes a repeating unit represented by a specific general formula; and an actinic ray-sensitive or radiation-sensitive film formed of the actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a method for manufacturing an electronic device.
    Type: Application
    Filed: September 20, 2022
    Publication date: March 9, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Taro MIYOSHI, Eiji FUKUZAKI
  • Publication number: 20230038825
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing: a resin (P) of which a solubility in a developer changes by an action of an acid; a compound (A) that has a group (a) having a polarity which changes through decomposition by an action of an acid, and generates an acid (ac1) upon irradiation with actinic rays or radiation; a compound (B) that generates an acid (ac2) having a higher pKa than the acid (ac1) generated from the compound (A), upon irradiation with actinic rays or radiation; and a basic compound (C).
    Type: Application
    Filed: September 7, 2022
    Publication date: February 9, 2023
    Applicant: FUJIFILM Corporation
    Inventors: Hideyuki ISHIHARA, Toshiya TAKAHASHI, Taro MIYOSHI, Eiji FUKUZAKI
  • Publication number: 20220382151
    Abstract: A method for producing a resin having a repeating unit that is decomposed by irradiation of an actinic ray or a radiation to generate acid, the method including polymerizing a specific compound represented by General formula (P-1) and a copolymerizable monomer compound, a method for producing an actinic ray-sensitive or radiation-sensitive resin composition, a pattern forming method, and a resin corresponding to a reaction intermediate of the resin.
    Type: Application
    Filed: April 20, 2022
    Publication date: December 1, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Tomoaki YOSHIOKA, Shuhei Yamaguchi, Eiji Fukuzaki, Taro Miyoshi
  • Publication number: 20220206386
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition containing (A) an acid-decomposable resin, (B) a compound represented by General Formula (b1), and (C) a compound represented by General Formula (c1), in which a ratio of a content of the compound (C) to a content of the compound (B) is from 0.01% by mass to 10% by mass. In the formulae, L represents a single bond or a divalent linking group. A represents a group that decomposes by the action of an acid. B represents a group that decomposes by the action of an acid, a hydroxy group, or a carboxy group. It should be noted that at least one B represents the hydroxy group or the carboxy group. n represents an integer from 1 to 5. X represents an (n+1)-valent linking group. M+ represents a sulfonium ion or an iodonium ion.
    Type: Application
    Filed: March 10, 2022
    Publication date: June 30, 2022
    Applicant: FUJIFILM Corporation
    Inventors: Taro MIYOSHI, Yasunori YONEKUTA, Eiji FUKUZAKI, Toshiya TAKAHASHI
  • Publication number: 20210373438
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a solubility in a developer, which changes by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation; and an acid diffusion control agent, in which a molecular weight of the acid diffusion control agent is 420 or more, and a distance Ra between a Hansen solubility parameter of the acid diffusion control agent and a Hansen solubility parameter of the air satisfies 15?Ra?45.
    Type: Application
    Filed: August 4, 2021
    Publication date: December 2, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Kotaro TAKAHASHI, Yasunori Yonekuta, Taro Miyoshi
  • Publication number: 20210165325
    Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin having a solubility in an alkali developer that increases through decomposition by an action of an acid and (B) a compound that generates an acid upon irradiation with actinic rays or radiation and is represented by a specific structure; an actinic ray-sensitive or radiation-sensitive film using the composition; a pattern forming method; a method for manufacturing an electronic device; and a compound.
    Type: Application
    Filed: February 3, 2021
    Publication date: June 3, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Taro MIYOSHI, Yasunori YONEKUTA, Eiji FUKUZAKI