Abstract: An optical apparatus having at least one optical element arranged along an optical path of an irradiation light. A first hermetic chamber is defined along the optical path separating the optical path from ambient air and charged with a predetermined gas. A second hermetic chamber is located in the first hermetic chamber separating the optical path from the gas in the first hermetic chamber and retaining the optical elements.

Abstract: An optical apparatus having at least one optical element arranged along an optical path of an irradiation light. A first hermetic chamber is defined along the optical path separating the optical path from ambient air and charged with a predetermined gas. A second hermetic chamber is located in the first hermetic chamber separating the optical path from the gas in the first hermetic chamber and retaining the optical elements.

Abstract: Optical exposure apparatus and methods of using same, for patterning a workpiece and photo-cleaning the optical components in the apparatus, which can be contaminated by moisture and organic compounds in the atmosphere. The apparatus comprises an illumination optical system having a light source and one or more optical components, and a projection lens having an object plane and an image plane and one or more optical components. The optical exposure apparatus includes an exposure optical path or an exposure light beam through a predetermined space in the optical exposure system. An optical path deflection member for deflecting light is introduced into the exposure optical path so as to create a second optical path that differs from the exposure optical path. Also disclosed is a method of photo-cleaning the aforementioned optical components, including the steps of forming an exposure optical path and then changing this path to create a second optical path that differs from the exposure optical path.

Abstract: A laser beam emitted from an exposure laser beam source has a uniform illuminance distribution after passing through a fly-eye lens selected according to the aperture stop. The exposure light is projected onto a reticle on which a predetermined pattern is formed, and the reticle pattern is projected onto a wafer by means of a projection optical system having a pupil filter inserted therein. A cleaning light beam branching off from the exposure light beam is projected through a beam splitter and a total reflection mirror onto the fly-eye lens located at a retraction position. A plane-parallel plate at the retraction position is irradiated with a cleaning light beam. The fly-eye lens and the plane-parallel plate are self-cleansed by the cleaning light beam, so that the transmissivity is kept higher than a predetermined value during standby.

Abstract: Transmittances of the optical system are calculated and a predicitive line of time-varying transmittance is calculated. When the exposure is started, the transmittance of the optical system is calculated at the elapsed time of exposure based on the predictive line of time-varying transmittance, and the intensity of exposure light is controlled The illuminance on the wafer can be compensated for depending on the actual variation of the transmittance. The accumulated quantity of exposure light incident to the wafer is regulated to ensure a target exposure dose of the wafer regardless of the variation in the transmittance of an illumination optical system or a projection optical system during exposure.

Abstract: A laser beam emitted from an exposure laser beam source has a uniform illuminance distribution after passing through a fly-eye lens selected according to the aperture stop. The exposure light is projected onto a reticle on which a predetermined pattern is formed, and the reticle pattern is projected onto a wafer by means of a projection optical system having a pupil filter inserted therein. A cleaning light beam branching off from the exposure light beam is projected through a beam splitter and a total reflection mirror onto the fly-eye lens located at a retraction position. A plane-parallel plate at the retraction position is irradiated with a cleaning light beam. The fly-eye lens and the plane-parallel plate are self-cleansed by the cleaning light beam, so that the transmissivity is kept higher than a predetermined value during standby.

Abstract: A laser beam emitted from an exposure laser beam source has a uniform illuminance distribution after passing through a fly-eye lens selected according to the aperture stop. The exposure light is projected onto a reticle on which a predetermined pattern is formed, and the reticle pattern is projected onto a wafer by means of a projection optical system having a pupil filter inserted therein. A cleaning light beam branching off from the exposure light beam is projected through a beam splitter and a total reflection mirror onto the fly-eye lens located at a retraction position. A plane-parallel plate at the retraction position is irradiated with a cleaning light beam. The fly-eye lens and the plane-parallel plate are self-cleansed by the cleaning light beam, so that the transmissivity is kept higher than a predetermined value during standby.

Abstract: Optical exposure apparatus and methods of using same, for patterning a workpiece and photo-cleaning the optical components in the apparatus, which can be contaminated by moisture and organic compounds in the atmosphere. The apparatus comprises an illumination optical system having a light source and one or more optical components, and a projection lens having an object plane and an image plane and one or more optical components. The optical exposure apparatus includes an exposure optical path or an exposure light beam through a predetermined space in the optical exposure system. An optical path deflection member for deflecting light is introduced into the exposure optical path so as to create a second optical path that differs from the exposure optical path. Also disclosed is a method of photo-cleaning the aforementioned optical components, including the steps of forming an exposure optical path and then changing this path to create a second optical path that differs from the exposure optical path.

Abstract: Optical exposure apparatus and methods of using same, for patterning a workpiece and photo-cleaning the optical components in the apparatus, which can be contaminated by moisture and organic compounds in the atmosphere. The apparatus comprises an illumination optical system having a light source and one or more optical components, and a projection lens having an object plane and an image plane and one or more optical components. The optical exposure apparatus includes an exposure optical path or an exposure light beam through a predetermined space in the optical exposure system. An optical path deflection member for deflecting light is introduced into the exposure optical path so as to create a second optical path that differs from the exposure optical path. Also disclosed is a method of photo-cleaning the aforementioned optical components, including the steps of forming an exposure optical path and then changing this path to create a second optical path that differs from the exposure optical path.