Abstract: There is provided a plasma processing apparatus including: a chamber having a processing space in which a plasma processing is performed on a substrate and a synthetic space in which electromagnetic waves are synthesized; a dielectric window configured to partition the processing space and the synthetic space; an antenna unit including a plurality of antennas configured to radiate the electromagnetic waves to the synthetic space; an electromagnetic wave output part configured to output the electromagnetic waves to the antenna unit; and a controller configured to control the antenna unit to function as the phased array antenna, wherein the plurality of antennas are helical antennas.

Abstract: A printing system includes a hardware processor that: acquires a restriction to be applied in a case where a user uses a first printer; acquires a print condition in a case where the user uses a second printer; determines whether the print condition infringes on the restriction; and notifies the user of a determination result.

Abstract: A substrate processing apparatus includes; a carrier block; a first processing block including first lower and upper processing blocks to deliver a substrate to and from the carrier block; a second processing block including second lower and upper processing blocks provided adjacent to the first lower and upper processing blocks; a relay block including a lifting and transferring mechanism that delivers the substrate between the second lower and upper processing blocks; a controller that controls an operation of each main transfer mechanism such that one of upper and lower processing blocks forms an outward path through which the substrate is transferred from the carrier block to the relay block and the other forms a return path through which the substrate is transferred from the relay block to the carrier block; and a bypass transfer mechanism provided for each of the first and second processing blocks.

Abstract: The plasma processing apparatus according to an exemplary embodiment includes a processing container, a stage, an upper electrode, a dielectric plate, and a waveguide. The stage is provided in the processing container. The dielectric plate is provided above the stage with a space in the processing container interposed therebetween. The upper electrode is provided above the dielectric plate. The waveguide has an end and guides high frequency waves in a VHF band or a UHF band. The end is arranged to face the space to radiate high frequency waves to the space. The dielectric plate includes a conductive film. The conductive film is provided on an upper surface of the dielectric plate. The upper surface faces the upper electrode. The conductive film is electrically connected to the upper electrode.

Abstract: A substrate treatment system includes: a wet system having a wet treatment apparatus which performs in a wet mode one of substrate treatments from a formation treatment of a resist film to a developing treatment of the resist film after exposure, and coupled to an exposure apparatus; a dry system having a dry treatment apparatus which performs in a dry mode a same kind of substrate treatment by the wet treatment apparatus; and a relay transfer system which transfers the substrate between the wet system and the dry system, wherein: when viewed from a coupling direction, the wet system is arranged such that the exposure apparatus projects from one side in a depth direction perpendicular to the coupling direction in top view; and the dry system is arranged to be adjacent to the one side of the wet system in the depth direction.

Abstract: A substrate processing apparatus includes a carrier block, a first processing block including first lower and upper processing blocks to deliver a substrate to and from the carrier block, a second processing block including second lower and upper processing blocks provided adjacent to the first lower and upper processing blocks, a relay block including a lifting and transferring mechanism that delivers the substrate between the second lower and upper processing blocks, a controller that controls an operation of each main transfer mechanism such that one of upper and lower processing blocks forms an outward path through which the substrate is transferred from the carrier block to the relay block and the other forms a return path through which the substrate is transferred from the relay block to the carrier block, and a bypass transfer mechanism provided for each of the first and second processing blocks.

Abstract: Provided is a polyurethane elastic fiber wherein surface treating agents do not bleed even after lengthy storage, thereby preventing contamination of packing material, and which exhibits stable friction performance independent of storage duration, making the fiber suitable for a stable gathered member with low occurrence of core slip-back. This polyurethane elastic fiber is a multifilament polyurethane elastic fiber and is characterized by having, in the multifilament cross section, a void part demarcated by the constituent individual filaments being in contact with one another and by having a cross-sectional void part area ratio of 15% to 60% as calculated according to the formula (cross-sectional void part area ratio [%])=100×(area of the void part)/(total cross-sectional area), where the total cross-sectional area is the sum of the area of the void part and the cross-sectional areas of all individual filaments that constitute the multifilament.

Abstract: An automated pizza-making system builds and bakes a pizza according to a customer order. The system includes a pizza assembly route and a plurality of ingredient dispensing stations for dispensing ingredients onto the pizza along the route. The uncooked pizza is automatically transferred to the oven for cooking. After the pizza is cooked, the system automatically slices and boxes the cooked pizza. A motion translator places the closed pizza box containing the pizza in a storage locker for customer pickup. A computing device is operable to manage the orders, manage the cooking steps for preparing each order, controls each functional station to build, cook, box, and store the pizza, and notify the customer for pickup when the pizza is ready. Related methods are also described.

Abstract: A substrate processing apparatus includes a carrier block on which a carrier configured to store a substrate is placed, first processing block including a plurality of first processing modules, and a first transport mechanism shared by the plurality of first processing modules to transport the substrate, second processing block overlapping the first processing block, including a plurality of second processing modules, and a second transport mechanism shared by the plurality of second processing modules to transport the substrate, and configured to transport the substrate to the carrier block. The substrate processing apparatus includes a lifting and transferring mechanism including a shaft extending in a horizontal direction and a support part configured to face and support the substrate, and a rotation mechanism configured to rotate the support part around the shaft such that an orientation of the support part is changed between a first orientation and the second position.

Abstract: A substrate processing apparatus includes a carrier block on which a carrier configured to store a substrate is placed, first processing block including a plurality of first processing modules, and a first transport mechanism shared by the plurality of first processing modules to transport the substrate, second processing block overlapping the first processing block, including a plurality of second processing modules, and a second transport mechanism shared by the plurality of second processing modules to transport the substrate, and configured to transport the substrate to the carrier block. The substrate processing apparatus includes a lifting and transferring mechanism including a shaft extending in a horizontal direction and a support part configured to face and support the substrate, and a rotation mechanism configured to rotate the support part around the shaft such that an orientation of the support part is changed between a first orientation and the second position.

Abstract: A substrate processing apparatus includes; a carrier block; a first processing block including first lower and upper processing blocks to deliver a substrate to and from the carrier block; a second processing block including second lower and upper processing blocks provided adjacent to the first lower and upper processing blocks; a relay block including a lifting and transferring mechanism that delivers the substrate between the second lower and upper processing blocks; a controller that controls an operation of each main transfer mechanism such that one of upper and lower processing blocks forms an outward path through which the substrate is transferred from the carrier block to the relay block and the other forms a return path through which the substrate is transferred from the relay block to the carrier block; and a bypass transfer mechanism provided for each of the first and second processing blocks.

Abstract: A liquid processing apparatus for performing liquid processing with respect to a substrate using processing fluid, includes: a plurality of substrate holding units arranged side by side in a left-right direction; a nozzle configured to supply the processing fluid to the substrate held in each of the substrate holding units; and a nozzle moving mechanism configured to move the nozzle forward and backward in a front-rear direction intersecting an arrangement direction of the substrate holding units between a supplying position in which the processing fluid is supplied to a region including a central portion of the substrate and a waiting position which is defined at a rear side of a row of the substrate holding units opposite to a front side of the row of the substrate holding units at which the substrate is loaded and unloaded.

Abstract: A substrate warpage correction method according to this disclosure corrects warpage of a substrate without performing a process on a front surface of the substrate. The substrate warpage correction method includes a surface roughening of performing a surface roughening process on a rear surface of the substrate using a surface roughening processing apparatus configured to be able to perform the surface roughening process on the rear surface of the substrate, to form grooves in the rear surface to thereby correct the warpage of the substrate.

Abstract: An image forming apparatus includes: an operation panel that sets a type of a sheet loaded into a paper feed cassette; a sensor that detects the type of the sheet; and a controller that controls execution of a print job. When a sheet type set by the operation panel does not match a sheet type detected by the sensor and when a predetermined condition is met, the controller continues the print job at a setting corresponding to the sheet type detected by the sensor. When the predetermined condition is not met, the controller suspends the print job as a process when the sheet type set by the operation panel does not match the sheet type detected by the sensor.

Abstract: A substrate processing apparatus includes: a first holding part configured to hold a substrate; a second holding part configured to hold the substrate; a sliding member configured to rotate about a vertical axis so that the sliding member slides on a back surface of the substrate; a revolution mechanism configured to revolve the sliding member under rotation about a vertical revolution axis; and a relative movement mechanism configured to horizontally move a relative position between the substrate and a revolution trajectory of the sliding member so that when the substrate is held by the first holding part, the sliding member slides on a central portion of the back surface of the substrate, and when the substrate is held by the second holding part, the sliding member slides on the peripheral portion of the back surface of the substrate under rotation.

Abstract: Provided is a polyurethane elastic fiber wherein surface treating agents do not bleed even after lengthy storage, thereby preventing contamination of packing material, and which exhibits stable friction performance independent of storage duration, making the fiber suitable for a stable gathered member with low occurrence of core slip-back. This polyurethane elastic fiber is a multifilament polyurethane elastic fiber and is characterized by having, in the multifilament cross section, a void part demarcated by the constituent individual filaments being in contact with one another and by having a cross-sectional void part area ratio of 15% to 60% as calculated according to the formula (cross-sectional void part area ratio [%])=100×(area of the void part)/(total cross-sectional area), where the total cross-sectional area is the sum of the area of the void part and the cross-sectional areas of all individual filaments that constitute the multifilament.

Abstract: Disclosed is a liquid processing apparatus for performing a liquid processing by supplying a processing liquid from a nozzle to a substrate. The apparatus includes: a cup body provided to surround a substrate holding unit; a nozzle arm provided with a nozzle and supported by a support unit; a moving mechanism configured to move the nozzle arm via the support unit between a stand-by position and a processing position; an elevating mechanism configured to move up and down the support unit; a cover member including a top plate portion provided above a driving region and configured to partition the driving region from a region where the substrate is held within the cup body; an opening formed in a portion corresponding to a moving path of the support unit in the top plate portion; and an exhaust mechanism configured to evacuate the driving region.

Abstract: The image processing apparatus performs a communication process targeting an external apparatus via a network. When performing a communication process, the image processing apparatus determines whether or not the external apparatus which is a target of the communication process is registered in a destination list in which apparatuses corresponding to a predetermined condition are registered. In accordance with the timeout period determined based on the determination result, the image processing apparatus determines that a timeout has occurred in the communication process. The image processing apparatus updates the destination list according to the determination result of the occurrence of the timeout and the determination result as to whether or not the external apparatus is registered in the destination list. Thereby, it is possible to provide an image processing apparatus capable of quickly executing communication process because the transmission/reception buffer is less likely to run out.

Abstract: An image forming apparatus includes a virus check unit that performs a virus check, a reception unit that receives data from an external apparatus, and an execution control unit that causes the virus check unit to perform the virus check on the data when a specific condition is satisfied after the receipt of the data.

Abstract: There is disclosed a polishing cleaning mechanism configured to be in contact with a rear surface of a substrate which is held in a substrate holding unit for holding the rear surface of the substrate and perform a polishing process and a cleaning process on the rear surface of the substrate, including a cleaning member configured to clean the rear surface of the substrate, a polishing member configured to polish the rear surface of the substrate, and a support member configured to support the polishing member and the cleaning member to face the rear surface of the substrate held in the substrate holding unit, wherein a surface of the polishing member facing the substrate and a surface of the cleaning member facing the substrate differ in relative height from each other.