Patents by Inventor Taro Yamamoto

Taro Yamamoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10840079
    Abstract: A substrate processing apparatus includes: a first holding part configured to hold a substrate; a second holding part configured to hold the substrate; a sliding member configured to rotate about a vertical axis so that the sliding member slides on a back surface of the substrate; a revolution mechanism configured to revolve the sliding member under rotation about a vertical revolution axis; and a relative movement mechanism configured to horizontally move a relative position between the substrate and a revolution trajectory of the sliding member so that when the substrate is held by the first holding part, the sliding member slides on a central portion of the back surface of the substrate, and when the substrate is held by the second holding part, the sliding member slides on the peripheral portion of the back surface of the substrate under rotation.
    Type: Grant
    Filed: November 28, 2017
    Date of Patent: November 17, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Yasushi Takiguchi, Taro Yamamoto, Yoshiki Okamoto, Hayato Hosaka, Teruhiko Kodama, Akihiro Kubo, Ryuto Ozasa, Yuji Ariuchi, Shinsuke Kimura
  • Patent number: 10744159
    Abstract: A method for evaluating the activity level of mesenchymal stem cells, and a method for culturing mesenchymal stem cells using the evaluation method in the field of culturing mesenchymal stem cells for regenerative medicine, and further, a method for producing a therapeutic agent for liver dysfunction and a therapeutic agent for liver dysfunction. This method for evaluating mesenchymal stem cell activity has an assay step for assaying the amount of adenylate kinase 4 (AK4) in the mesenchymal stem cells; and a determination step for determining the activity level of the mesenchymal stem cells from the assayed amount of adenylate kinase 4.
    Type: Grant
    Filed: August 19, 2015
    Date of Patent: August 18, 2020
    Assignees: YAMAGUCHI UNIVERSITY, SHIBUYA CORPORATION
    Inventors: Isao Sakaida, Shuji Terai, Taro Takami, Koichi Fujisawa, Naoki Yamamoto, Kenji Yoneda
  • Patent number: 10734222
    Abstract: A semiconductor stack includes a substrate made of silicon carbide, and an epi layer disposed on the substrate and made of silicon carbide. An epi principal surface, which is a principal surface opposite to the substrate, of the epi layer is a carbon surface having an off angle of 4° or smaller relative to a c-plane. In the epi principal surface, a plurality of first recessed portions having a rectangular circumferential shape in a planar view is formed. Density of a second recessed portion that is formed in the first recessed portions and is a recessed portion deeper than the first recessed portions is lower than or equal to 10 cm?2 in the epi principal surface.
    Type: Grant
    Filed: January 17, 2020
    Date of Patent: August 4, 2020
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Taro Nishiguchi, Yu Saitoh, Hirofumi Yamamoto
  • Patent number: 10712681
    Abstract: A toner is provided that contains a crystalline polyester resin comprising a polycondensed resin of a dicarboxylic acid represented by the following formula (1) with a diol represented by the following formula (2). A content of a cyclic ester represented by the following formula (3) in the toner, measured by a thermal extraction gas chromatographic mass spectrometry at a thermal extraction temperature of 160° C., is from 1 to 200 ppm in terms of toluene: where n represents an integer of from 2 to 12; where m represents an integer of from 2 to 12; and where n represents an integer of from 2 to 12, m represents an integer of from 2 to 12, and m+n?6 is satisfied.
    Type: Grant
    Filed: January 28, 2019
    Date of Patent: July 14, 2020
    Assignee: Ricoh Company, Ltd.
    Inventors: Minoru Masuda, Atsushi Yamamoto, Taichi Nemoto, Junichi Watanabe, Taro Araki, Takeshi Shibuya
  • Publication number: 20200190702
    Abstract: Provided is a polyurethane elastic fiber wherein surface treating agents do not bleed even after lengthy storage, thereby preventing contamination of packing material, and which exhibits stable friction performance independent of storage duration, making the fiber suitable for a stable gathered member with low occurrence of core slip-back. This polyurethane elastic fiber is a multifilament polyurethane elastic fiber and is characterized by having, in the multifilament cross section, a void part demarcated by the constituent individual filaments being in contact with one another and by having a cross-sectional void part area ratio of 15% to 60% as calculated according to the formula (cross-sectional void part area ratio [%])=100×(area of the void part)/(total cross-sectional area), where the total cross-sectional area is the sum of the area of the void part and the cross-sectional areas of all individual filaments that constitute the multifilament.
    Type: Application
    Filed: October 15, 2018
    Publication date: June 18, 2020
    Applicant: Asahi Kasei Kabushiki Kaisha
    Inventors: Hitoshi Sato, Taro Yamamoto
  • Publication number: 20200152457
    Abstract: A semiconductor stack includes a substrate made of silicon carbide, and an epi layer disposed on the substrate and made of silicon carbide. An epi principal surface, which is a principal surface opposite to the substrate, of the epi layer is a carbon surface having an off angle of 4° or smaller relative to a c-plane. In the epi principal surface, a plurality of first recessed portions having a rectangular circumferential shape in a planar view is formed. Density of a second recessed potion that is formed in the first recessed portions and is a recessed portion deeper than the first recessed portions is lower than or equal to 10 cm?2 in the epi principal surface.
    Type: Application
    Filed: January 17, 2020
    Publication date: May 14, 2020
    Inventors: Taro Nishiguchi, Yu Saitoh, Hirofumi Yamamoto
  • Patent number: 10649334
    Abstract: Disclosed is a liquid processing apparatus for performing a liquid processing by supplying a processing liquid from a nozzle to a substrate. The apparatus includes: a cup body provided to surround a substrate holding unit; a nozzle arm provided with a nozzle and supported by a support unit; a moving mechanism configured to move the nozzle arm via the support unit between a stand-by position and a processing position; an elevating mechanism configured to move up and down the support unit; a cover member including a top plate portion provided above a driving region and configured to partition the driving region from a region where the substrate is held within the cup body; an opening formed in a portion corresponding to a moving path of the support unit in the top plate portion; and an exhaust mechanism configured to evacuate the driving region.
    Type: Grant
    Filed: August 10, 2018
    Date of Patent: May 12, 2020
    Assignee: Tokyo Electron Limited
    Inventors: Koki Yoshimura, Shogo Takahasi, Yasushi Takiguchi, Taro Yamamoto
  • Patent number: 10580647
    Abstract: A semiconductor stack includes a substrate made of silicon carbide, and an epi layer disposed on the substrate and made of silicon carbide. An epi principal surface, which is a principal surface opposite to the substrate, of the epi layer is a carbon surface having an off angle of 4° or smaller relative to a c-plane. In the epi principal surface, a plurality of first recessed portions having a rectangular circumferential shape in a planar view is formed. Density of a second recessed potion that is formed in the first recessed portions and is a recessed portion deeper than the first recessed portions is lower than or equal to 10 cm?2 in the epi principal surface.
    Type: Grant
    Filed: July 16, 2019
    Date of Patent: March 3, 2020
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Taro Nishiguchi, Yu Saitoh, Hirofumi Yamamoto
  • Patent number: 10558408
    Abstract: The image processing apparatus performs a communication process targeting an external apparatus via a network. When performing a communication process, the image processing apparatus determines whether or not the external apparatus which is a target of the communication process is registered in a destination list in which apparatuses corresponding to a predetermined condition are registered. In accordance with the timeout period determined based on the determination result, the image processing apparatus determines that a timeout has occurred in the communication process. The image processing apparatus updates the destination list according to the determination result of the occurrence of the timeout and the determination result as to whether or not the external apparatus is registered in the destination list. Thereby, it is possible to provide an image processing apparatus capable of quickly executing communication process because the transmission/reception buffer is less likely to run out.
    Type: Grant
    Filed: February 1, 2018
    Date of Patent: February 11, 2020
    Assignee: Konica Minolta, Inc.
    Inventor: Taro Yamamoto
  • Publication number: 20200034555
    Abstract: An image forming apparatus includes a virus check unit that performs a virus check, a reception unit that receives data from an external apparatus, and an execution control unit that causes the virus check unit to perform the virus check on the data when a specific condition is satisfied after the receipt of the data.
    Type: Application
    Filed: July 19, 2019
    Publication date: January 30, 2020
    Applicant: KONICA MINOLTA, INC.
    Inventors: Hiroyuki OHNO, Takeshi HIBINO, Hiroaki SUGIMOTO, Takashi SUGAYA, Taro YAMAMOTO
  • Patent number: 10533236
    Abstract: A method of manufacturing a high-strength hot rolled steel sheet by hot rolling a steel having a chemical composition including, by mass %: C: more than 0.010% and not more than 0.06%, Si: not more than 0.3%, Mn: not more than 0.8%, P: not more than 0.03%, S: not more than 0.02%, Al: not more than 0.1%, N: not more than 0.01% and Ti: 0.05 to 0.10%, the balance including Fe and inevitable impurities, including: after the steel is heated to an austenite single phase region, the steel is finish rolled at a finishing delivery temperature of 860° C. to 1050° C., the steel sheet is cooled at an average cooling rate of not less than 30° C./s in a temperature range of from a temperature after the completion of the finish rolling to 750° C., and the steel sheet is coiled into a coil at a coiling temperature of 580° C. to 700° C.
    Type: Grant
    Filed: April 11, 2017
    Date of Patent: January 14, 2020
    Assignee: JFE Steel Corporation
    Inventors: Yoshimasa Funakawa, Tetsuo Yamamoto, Hiroshi Uchomae, Hiroshi Nakano, Taro Kizu
  • Publication number: 20190341247
    Abstract: A semiconductor stack includes a substrate made of silicon carbide, and an epi layer disposed on the substrate and made of silicon carbide. An epi principal surface, which is a principal surface opposite to the substrate, of the epi layer is a carbon surface having an off angle of 4° or smaller relative to a c-plane. In the epi principal surface, a plurality of first recessed portions having a rectangular circumferential shape in a planar view is formed. Density of a second recessed potion that is formed in the first recessed portions and is a recessed portion deeper than the first recessed portions is lower than or equal to 10 cm?2 in the epi principal surface.
    Type: Application
    Filed: July 16, 2019
    Publication date: November 7, 2019
    Inventors: Taro NISHIGUCHI, Yu SAITOH, Hirofumi YAMAMOTO
  • Publication number: 20190291255
    Abstract: A work tool includes a motor, a driving mechanism, a housing, a handle, a detecting mechanism and an elastic support part. The detecting mechanism is configured to detect information corresponding to an operating state of the work tool. The elastic support part supports the detecting mechanism so as to be movable relative to the housing in at least two of a front-rear direction, an up-down direction and a left-right direction. The elastic support part includes at least one elastic member disposed between the detecting mechanism and the housing. The elastic support part has respectively different spring constants in the at least two directions.
    Type: Application
    Filed: March 11, 2019
    Publication date: September 26, 2019
    Applicant: MAKITA CORPORATION
    Inventors: Kiyonobu YOSHIKANE, Yoshitaka MACHIDA, Taro HISANO, Hirokatsu YAMAMOTO
  • Patent number: 10392066
    Abstract: A straddle vehicle which turns in a bank state in which a vehicle body is rotated around an axis extending in a vehicle length direction, includes a head lamp unit which is disposed at a front portion of the straddle vehicle and emits a light beam with which a forward region of the vehicle body is irradiated; a cornering lamp unit which is disposed at the front portion of the straddle vehicle, provided separately from the head lamp unit, and turned on in the bank state; and a duct member included in an engine air-intake system, wherein the cornering lamp unit is disposed below the head lamp unit and below an air-intake inlet of the duct member.
    Type: Grant
    Filed: November 3, 2017
    Date of Patent: August 27, 2019
    Assignee: KAWASAKI JUKOGYO KABUSHIKI KAISHA
    Inventors: Taro Iwamoto, Tomo Yamamoto
  • Patent number: 10395924
    Abstract: A semiconductor stack includes a substrate made of silicon carbide, and an epi layer disposed on the substrate and made of silicon carbide. An epi principal surface, which is a principal surface opposite to the substrate, of the epi layer is a carbon surface having an off angle of 4° or smaller relative to a c-plane. In the epi principal surface, a plurality of first recessed portions having a rectangular circumferential shape in a planar view is famed. Density of a second recessed portion that is formed in the first recessed portions and is a recessed portion deeper than the first recessed portions is lower than or equal to 10 cm?2 in the epi principal surface.
    Type: Grant
    Filed: August 10, 2016
    Date of Patent: August 27, 2019
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Taro Nishiguchi, Yu Saitoh, Hirofumi Yamamoto
  • Publication number: 20190235405
    Abstract: A toner is provided that contains a crystalline polyester resin comprising a polycondensed resin of a dicarboxylic acid represented by the following formula (1) with a diol represented by the following formula (2). A content of a cyclic ester represented by the following formula (3) in the toner, measured by a thermal extraction gas chromatographic mass spectrometry at a thermal extraction temperature of 160° C., is from 1 to 200 ppm in terms of toluene: where n represents an integer of from 2 to 12; where m represents an integer of from 2 to 12; and where n represents an integer of from 2 to 12, m represents an integer of from 2 to 12, and m+n?6 is satisfied.
    Type: Application
    Filed: January 28, 2019
    Publication date: August 1, 2019
    Inventors: Minoru MASUDA, Atsushi YAMAMOTO, Taichi NEMOTO, Junichi WATANABE, Taro ARAKI, Takeshi SHIBUYA
  • Patent number: 10328546
    Abstract: There is disclosed a polishing cleaning mechanism configured to be in contact with a rear surface of a substrate which is held in a substrate holding unit for holding the rear surface of the substrate and perform a polishing process and a cleaning process on the rear surface of the substrate, including a cleaning member configured to clean the rear surface of the substrate, a polishing member configured to polish the rear surface of the substrate, and a support member configured to support the polishing member and the cleaning member to face the rear surface of the substrate held in the substrate holding unit, wherein a surface of the polishing member facing the substrate and a surface of the cleaning member facing the substrate differ in relative height from each other.
    Type: Grant
    Filed: April 27, 2017
    Date of Patent: June 25, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Akihiro Kubo, Masahiro Fukuda, Taro Yamamoto, Kenji Yada, Masashi Enomoto, Noboru Nakashima
  • Patent number: 10319567
    Abstract: A microwave plasma source for forming a surface wave plasma by radiating a microwave into a chamber of a plasma processing apparatus, which includes: a microwave output part for outputting the microwave; a microwave transmission part for transmitting the microwave; and a microwave radiation member for radiating the microwave into the chamber. The microwave transmission part includes a plurality of microwave introduction mechanisms circumferentially arranged in a peripheral portion of the microwave radiation member and configured to introduce the microwave into the microwave radiation member. The microwave radiation member includes a metal main body, a plurality of dielectric slow-wave members arranged in an overall annular shape in the vicinity of an arrangement surface of the main body, an annular dielectric microwave transmission member arranged in a microwave radiation surface of the main body, and a slot antenna part installed between the slow-wave members and the microwave transmission member.
    Type: Grant
    Filed: March 21, 2016
    Date of Patent: June 11, 2019
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Taro Ikeda, Akira Tanihara, Shigeru Kasai, Nobuhiko Yamamoto
  • Patent number: 10289004
    Abstract: A developing apparatus includes: a substrate holder that hold a substrate horizontally; a developer nozzle that supplies a developer onto the substrate to form a liquid puddle; a turning flow generation mechanism including a rotary member that rotates about an axis perpendicular to the substrate while the rotary member is being in contact with the liquid puddle thereby to generate a turning flow in the liquid puddle of the developer formed on the substrate; and a moving mechanism for moving the turning flow generation mechanism along a surface of the substrate. The line-width uniformity of a pattern can be improved by forming turning flows in a desired region of the substrate and stirring the developer.
    Type: Grant
    Filed: October 31, 2016
    Date of Patent: May 14, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Kousuke Yoshihara, Hideharu Kyouda, Koshi Muta, Taro Yamamoto, Yasushi Takiguchi
  • Publication number: 20190049845
    Abstract: Disclosed is a liquid processing apparatus for performing a liquid processing by supplying a processing liquid from a nozzle to a substrate. The apparatus includes: a cup body provided to surround a substrate holding unit; a nozzle arm provided with a nozzle and supported by a support unit; a moving mechanism configured to move the nozzle arm via the support unit between a stand-by position and a processing position; an elevating mechanism configured to move up and down the support unit; a cover member including a top plate portion provided above a driving region and configured to partition the driving region from a region where the substrate is held within the cup body; an opening formed in a portion corresponding to a moving path of the support unit in the top plate portion; and an exhaust mechanism configured to evacuate the driving region.
    Type: Application
    Filed: August 10, 2018
    Publication date: February 14, 2019
    Inventors: Koki Yoshimura, Shogo Takahasi, Yasushi Takiguchi, Taro Yamamoto