Patents by Inventor Tasja Van Rhee

Tasja Van Rhee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • System and method of monitoring and diagnosing system condition and performance
    Publication number: 20070002295
    Abstract: The invention is directed to a system and method of monitoring and/or diagnosing tool performance in real-time for system degradation. The invention issues alerts and provides a structured process for identifying the source of the problem and enabling action to be taken before defects are detected on the final product. The invention provides a hierarchical data structure including elements that are monitored based on key performance indicators and diagnostic data sets.
    Type: Application
    Filed: June 30, 2005
    Publication date: January 4, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Maria Reuhman-Huisken, Leon Levasier, Tasja Van Rhee, Rosaria Salpietro, Erik Schoemaker, Eric Jacqmin, Martin Prins, Marcel Nicolaas Van Kervinck, Timotheus Bootsma
  • Lithographic apparatus, system, method, computer program, and apparatus for height map analysis
    Patent number: 7012672
    Abstract: A lithographic projection apparatus and method of manufacturing devices using such an apparatus is presented. The apparatus includes a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor. In one embodiment of the invention, the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of the surface of the substrate, and to detect any focus spots on said surface of said substrate using the raw height map. By subtracting the average die topology, focus spots can be located more accurately than before.
    Type: Grant
    Filed: March 10, 2004
    Date of Patent: March 14, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Tasja Van Rhee, Thomas Josephus Maria Castenmiller, Willem Herman Gertruda Anna Koenen, Alex Van Zon, Michael Broers
  • Lithographic apparatus, system, method, computer program, and apparatus for height map analysis
    Publication number: 20040239905
    Abstract: A lithographic projection apparatus and method of manufacturing devices using such an apparatus is presented. The apparatus includes a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor. In one embodiment of the invention, the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of the surface of the substrate, and to detect any focus spots on said surface of said substrate using the raw height map. By subtracting the average die topology, focus spots can be located more accurately than before.
    Type: Application
    Filed: March 10, 2004
    Publication date: December 2, 2004
    Applicant: ASML Netherlands B.V.
    Inventors: Tasja Van Rhee, Thomas Josephus Maria Castenmiller, Willem Herman Gertruda Anna Koenen, Alex Van Zon, Michael Broers