Patents by Inventor Tasuku Shimizu

Tasuku Shimizu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11162297
    Abstract: A glass panel unit assembly includes: glass substrates; a peripheral wall having a frame shape and disposed between the glass substrates; a partition; an evacuation port; and a plurality of air passages. The partition partitions an internal space into an evacuation space, a ventilation space, and a coupling space. The evacuation port connects the ventilation space to an external environment. The plurality of air passages includes: a first air passage connecting the evacuation space to the coupling space; and a second air passage connecting the coupling space to the ventilation space. The second air passage includes a particular air passage having a larger dimension than any of the first air passage.
    Type: Grant
    Filed: March 8, 2019
    Date of Patent: November 2, 2021
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Tasuku Ishibashi, Eiichi Uriu, Kazuya Hasegawa, Hiroyuki Abe, Masataka Nonaka, Takeshi Shimizu, Haruhiko Ishikawa
  • Patent number: 11148971
    Abstract: A gas adsorption unit includes a getter, a package encapsulating the getter, and a low-melting member. The low-melting member is heated, and thereby melted, at a temperature lower than a melting point of the package to bond a connector including the low-melting member onto the package. Next, the low-melting member that has melted is cooled and cured. Then, thermal stress resulting from a difference in thermal expansion coefficient between the package and the connector is caused to the package connected to the connector, thereby breaking the package open.
    Type: Grant
    Filed: June 19, 2018
    Date of Patent: October 19, 2021
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Hiroyuki Abe, Eiichi Uriu, Kazuya Hasegawa, Tasuku Ishibashi, Masataka Nonaka, Takeshi Shimizu, Haruhiko Ishikawa
  • Publication number: 20210300822
    Abstract: A glass panel unit includes a first glass pane, a second glass pane, a frame member, a vacuum space, and a gas adsorbing layer. The gas adsorbing layer is formed to cover at least one of the first glass pane or the second glass pane. The gas adsorbing layer contains a getter material.
    Type: Application
    Filed: June 19, 2019
    Publication date: September 30, 2021
    Inventors: Eiichi URIU, Hiroyuki ABE, Tasuku ISHIBASHI, Kazuya HASEGAWA, Masataka NONAKA, Takeshi SHIMIZU, Haruhiko ISHIKAWA
  • Publication number: 20210283745
    Abstract: A workpiece processing device includes a workpiece supporting unit configured to support a workpiece so that the workpiece is rotatable around a first axis parallel to a central axis of the workpiece, a cutting unit having a blade configured to cut a surface of the workpiece, a detecting unit configured to calculate a position of a vertex of the surface in a direction along a second axis which is perpendicular to the first axis and parallel to the blade, and a control unit configured to control the workpiece supporting unit so that a cutting position on the surface is located at a vertex in the direction along the second axis, and relatively move the workpiece supporting unit and the cutting unit so that an incision direction of the blade is on a plane defined by the central axis and the cutting position, thereby forming a groove at the cutting position.
    Type: Application
    Filed: May 28, 2021
    Publication date: September 16, 2021
    Applicant: Tokyo Seimitsu Co., Ltd.
    Inventors: Takahiro IIDA, Teruhiko NISHIKAWA, Tasuku SHIMIZU
  • Publication number: 20210270084
    Abstract: A method for manufacturing a glass panel unit includes an assembling step, a bonding step, a gas exhausting step, a sealing step, and an activating step. The bonding step includes melting a peripheral wall in a baking furnace at a first predetermined temperature to hermetically bond a first glass pane and a second glass pane together with the peripheral wall thus melted. The gas exhausting step includes exhausting a gas from an internal space through an exhaust port in the baking furnace to turn the internal space into a vacuum space. The sealing step includes locally heating to a temperature higher than a second predetermined temperature, and thereby melting, either a port sealing material or an exhaust pipe to seal the exhaust port and thereby obtain a work in progress. The activating step includes activating a gas adsorbent after the sealing step to obtain a glass panel unit.
    Type: Application
    Filed: June 19, 2019
    Publication date: September 2, 2021
    Inventors: Hiroyuki ABE, Eiichi URIU, Kazuya HASEGAWA, Tasuku ISHIBASHI, Masataka NONAKA, Takeshi SHIMIZU, Haruhiko ISHIKAWA
  • Publication number: 20210262280
    Abstract: A method for manufacturing a glass panel unit includes a glue arrangement step, an assembly forming step, a first melting step, an evacuation step, and a second melting step. The first melting step includes melting a hot glue, bonding a first and second panel with the glue, and forming an internal space. The first melting step includes a first temperature raising step, a first temperature maintaining step including maintaining the temperature of the assembly at a temperature equal to or higher than a softening point of the hot glue, and a first temperature lowering step, which are performed in this order. The first temperature lowering step includes: an anterior temperature lowering step including lowering the temperature of the assembly; a middle temperature maintaining step including maintaining the temperature of the assembly; and a posterior temperature lowering step including lowering the temperature of the assembly, which are performed in this order.
    Type: Application
    Filed: May 23, 2019
    Publication date: August 26, 2021
    Inventors: Kazuya HASEGAWA, Hiroyuki ABE, Haruhiko ISHIKAWA, Tasuku ISHIBASHI, Eiichi URIU, Takeshi SHIMIZU, Masataka NONAKA
  • Publication number: 20210245324
    Abstract: A workpiece processing device includes a workpiece supporting unit configured to support a workpiece so that the workpiece is rotatable around a first axis parallel to a central axis of the workpiece, a cutting unit having a blade configured to cut a surface of the workpiece, a detecting unit configured to calculate a position of a vertex of the surface in a direction along a second axis which is perpendicular to the first axis and parallel to the blade, and a control unit configured to control the workpiece supporting unit so that a cutting position on the surface is located at a vertex in the direction along the second axis, and relatively move the workpiece supporting unit and the cutting unit so that an incision direction of the blade is on a plane defined by the central axis and the cutting position, thereby forming a groove at the cutting position.
    Type: Application
    Filed: March 3, 2020
    Publication date: August 12, 2021
    Applicant: Tokyo Seimitsu Co., Ltd.
    Inventors: Takahiro IIDA, Teruhiko NISHIKAWA, Tasuku SHIMIZU
  • Publication number: 20210178550
    Abstract: A workpiece processing device includes a workpiece supporting unit configured to support a workpiece so that the workpiece is rotatable around a first axis parallel to a central axis of the workpiece, a cutting unit having a blade configured to cut a surface of the workpiece, a detecting unit configured to calculate a position of a vertex of the surface in a direction along a second axis which is perpendicular to the first axis and parallel to the blade, and a control unit configured to control the workpiece supporting unit so that a cutting position on the surface is located at a vertex in the direction along the second axis, and relatively move the workpiece supporting unit and the cutting unit so that an incision direction of the blade is on a plane defined by the central axis and the cutting position, thereby forming a groove at the cutting position.
    Type: Application
    Filed: February 26, 2021
    Publication date: June 17, 2021
    Applicant: Tokyo Seimitsu Co., Ltd.
    Inventors: Takahiro IIDA, Teruhiko NISHIKAWA, Tasuku SHIMIZU
  • Publication number: 20210178621
    Abstract: A workpiece processing device includes a workpiece supporting unit configured to support a workpiece so that the workpiece is rotatable around a first axis parallel to a central axis of the workpiece, a cutting unit having a blade configured to cut a surface of the workpiece, a detecting unit configured to calculate a position of a vertex of the surface in a direction along a second axis which is perpendicular to the first axis and parallel to the blade, and a control unit configured to control the workpiece supporting unit so that a cutting position on the surface is located at a vertex in the direction along the second axis, and relatively move the workpiece supporting unit and the cutting unit so that an incision direction of the blade is on a plane defined by the central axis and the cutting position, thereby forming a groove at the cutting position.
    Type: Application
    Filed: February 26, 2021
    Publication date: June 17, 2021
    Applicant: Tokyo Seimitsu Co., Ltd.
    Inventors: Takahiro IIDA, Teruhiko NISHIKAWA, Tasuku SHIMIZU
  • Patent number: 5414356
    Abstract: A fluxmeter includes an application unit for applying a magnetic field, a superconducting quantum interference element and a flux transmitting circuit. The flux transmitting circuit includes a pickup coil formed of a superconducting print coil and a core for the pickup coil. The core is formed of a soft magnetic material. The core serves to suppress the leakage of magnetic flux to magnetically couple the pickup coil and the superconducting quantum interference element efficiently to improve the sensitivity and resolution of the fluxmeter. The pickup coil may be manufactured by photolithography, sputtering, laser beam deposition, MBE deposition, MOCVD or spray pyrolysis.
    Type: Grant
    Filed: July 30, 1991
    Date of Patent: May 9, 1995
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Yoshimura, Tasuku Shimizu, Yuichi Ishikawa, Masahiro Otaka, Yuko Koguchi, Kunio Enomoto, Kunio Hasegawa, Makoto Hayashi, Kazuo Takaku
  • Patent number: 5134368
    Abstract: On the basis of a finding that a magnetic hysteresis of a metal material, among magnetization characteristics changing with secular degradation of the metal material, shows a clear correspondence with the degree of degradation of the metal material, a change in such a magnetization characteristic is measured to estimate the degree of secular degradation of the metal material. In a typical embodiment, a superconducting quantum interference device is used to detect the magnetization characteristic of a measuring object. According to the present invention, the degree of embrittlement of a metal material used in an environment of high temperatures can be quickly detected in a non-destructive fashion so that the danger of brittle fracture of the metal material can be reliably prevented.
    Type: Grant
    Filed: November 8, 1990
    Date of Patent: July 28, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Otaka, Kunio Enomoto, Kunio Hasegawa, Makoto Hayashi, Tasuku Shimizu, Kazuo Takaku
  • Patent number: 5110537
    Abstract: A method and apparatus for inspecting the change in a water quality in terms of the change in a corrosion rate by detecting the capacity change between opposed electrodes due to the corrosion of electrode surfaces. As a result, the water quality can be continuously monitored over a long time while leaving the electrodes in the water to be inspected. Thus, the method and apparatus are suited for controlling the water quality especially in an atomic reactor vessel.
    Type: Grant
    Filed: February 26, 1990
    Date of Patent: May 5, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Hideo Miura, Asao Nishimura, Shinji Sakata, Tasuku Shimizu, Shigeo Hattori
  • Patent number: 5059903
    Abstract: On the basis of a finding that a magnetic hysteresis of a metal material, among magnetization characteristics changing with secular degradation of the metal material, shows a clear correspondence with the degree of degradation of the metal material, a change in such a magnetization characteristic is measured to estimate the degree of secular degradation of the metal material, In a typical embodiment, a superconducting quantum interference device is used to detect the magnetization characteristic of a measuring object. According to the present invention, the degree of embrittlement of a metal material used in an environment of high temperatures can be quickly detected in a non-destructive fashion so that the danger of brittle fracture of the metal material can be reliably prevented.
    Type: Grant
    Filed: September 21, 1988
    Date of Patent: October 22, 1991
    Assignee: Hitachi, Ltd.
    Inventors: Masahiro Otaka, Kunio Enomoto, Kunio Hasegawa, Makoto Hayashi, Tasuku Shimizu, Kazuo Takaku
  • Patent number: 4987367
    Abstract: Measurement of a physical property such as coercive force of a member to be inspected is performed at a plurality of locations in one region of the member. Similar measurement is performed in a plurality of different regions of the member and a maximum or minimum value (extreme value) is determined for each of the regions. On the basis of the extreme values thus determined, a recurrence period is determined in accordance with an extreme value statistic theory with the aid of a computer, whereon an estimated maximum value of the physical property of the member as a whole is determined from the recurrence period. On the basis of the estimated maximum value, the degree of deterioration of the member is predicted by the computer by consulting the data indicating the previously determined relation between the physical property and the degree of deterioration.
    Type: Grant
    Filed: September 12, 1989
    Date of Patent: January 22, 1991
    Assignee: Hitachi, Ltd
    Inventors: Yuichi Ishikawa, Toshihiko Yoshimura, Tasuku Shimizu, Masahiro Otaka, Kazuo Takaku
  • Patent number: 4772336
    Abstract: A method for improving residual stress in a circumferential weld zone of a piping and the like which includes preventing deformation of the weld zone, and causing a local expansion or contraction of a portion of the piping axially spaced from the weld zone thereby effecting a plastic working so as to increase or decrease the diameter of piping. The method can effectively be applied to apparatus and pipe system which are used in a corrosive environment and under action of a static or dynamic outer load.
    Type: Grant
    Filed: February 17, 1987
    Date of Patent: September 20, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Kunio Enomoto, Tasuku Shimizu, Shinji Sakata, Terunobu Koike, Nobuo Shimizu, Tsukasa Ikegami
  • Patent number: 4770046
    Abstract: A method system for assessing the safety of a rotor of a shrinkage fitted type wherein an opening displacement of a crack is determined an elastic-plastic fracture method and a reduction in shrinkage fitting force is calculated based on the crack opening displacement. The safety of the rotor is assessed based on the reduction in shrinkage fitting force caused to occur by the opening of the crack.
    Type: Grant
    Filed: October 23, 1986
    Date of Patent: September 13, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Satoshi Kanno, Shinji Sakata, Tasuku Shimizu, Ryoichi Kaneko, Kiyoshi Shimomura, Naoaki Shibashita
  • Patent number: 4764970
    Abstract: The invention scans potential measurement terminals on the surface of a structural member to measure a potential distribution on the surface, detects the direction of a crack from the potential distribution and determining a detailed potential distribution in the direction of the crack thus detected. This potential distribution is compared with master curves of the potential distributions of cracks of various shapes, that have been obtained by analysis in advance, in order to detect the shape of the crack. The present invention can detect accurately a crack shape.
    Type: Grant
    Filed: April 15, 1986
    Date of Patent: August 16, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Makoto Hayashi, Masahiro Otaka, Tasuku Shimizu, Shinji Sakata
  • Patent number: 4731131
    Abstract: A method of subjecting a welded structure to heat treatment in which a tensile yield is produced on an inner surface of the welded structure and a compressive yield is produced on an outer surface of the welded structure by the steps of placing a cooling medium in the interior of the welded structure and heating the outer surface of the welded structure to cause a difference in temperature to exist between the inner surface and other surface of the welded structure. The method further includes the step of locally heating a weld by means of a heating member to improve residual stress in a localized area of the weld and repeating the improvement of the residual stress regarding another localized area of the weld.
    Type: Grant
    Filed: January 10, 1986
    Date of Patent: March 15, 1988
    Assignee: Hitachi, Ltd.
    Inventors: Shinji Sakata, Tasuku Shimizu, Kunio Enomoto, Hirotsugu Fujimoto
  • Patent number: 4687625
    Abstract: Piping of a nuclear reactor containment vessel comprises pipes passing through the containment vessel and, extending to the outside of the containment vessel, outer shut-off valves each provided at a portion of the pipe which is located at the outside of the containment vessel for closing the pipe and isolating vessels for covering at least outer surfaces of welded portions of the pipes each being located between an outer wall surface of the containment vessel and a portion including the outer shut-off valve and for isolating the covered portions of the pipes from atmosphere.
    Type: Grant
    Filed: October 10, 1984
    Date of Patent: August 18, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Kunio Hasegawa, Tasuku Shimizu, Tetsuo Horiuchi, Hisao Ito
  • Patent number: 4678571
    Abstract: A water purifier has a deodorization tank for removing ions and odorants by adsorption from running water and a mesh filter for removing dust. The mesh filter is arranged at a water entrance of the deodorization tank. The deodorization tank contains an anti-bacterial membrane having a function of imparting an antibacterial activity to the water by supplying mineral ions to the running water and thereby alkalifying the water. The deodorization tank also has a water exit which is associated with a mineral supply filter for supplying a mineral component to the running water. The mineral supply filter is prepared by molding a powder obtained by adhering a material such as soda glass to the surface of heat-decomposed calcium carbonate.
    Type: Grant
    Filed: February 19, 1986
    Date of Patent: July 7, 1987
    Assignee: Hitachi, Ltd.
    Inventors: Nobuyoshi Hosaka, Tasuku Shimizu, Kenzo Mikada, Kozo Tamura, Masatoshi Tanabe