Patents by Inventor Tasunori Ohno

Tasunori Ohno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Ion source application device
    Patent number: 4851668
    Abstract: An ion source application device comprising a gas tight plasma formation chamber sustaining a plasma produced by high frequency discharge, a high frequency coil producing the high frequency discharge, and means for extracting an ion beam from the plasma thus produced, characterized in that it comprises further an electron beam generator or a laser light generator as means for obtaining electrons serving as seeds for starting the high frequency discharge.
    Type: Grant
    Filed: April 6, 1987
    Date of Patent: July 25, 1989
    Assignee: Hitachi, Ltd.
    Inventors: Tasunori Ohno, Tomoe Kurosawa, Tadashi Sato, Yukio Kurosawa, Yoshimi Hakamata