Abstract: When the surface of a semiconductor wafer, a photomask or the like sample is charged by irradiation with a charged particle beam, the charging is liable to hamper image observation, inspection and handling. Therefore, the sample and the surface or vicinity of the sample being charged by an electron beam or the like is held in an atmosphere or a reduced pressure atmosphere or in a predetermined gaseous atmosphere within a preliminary evacuation chamber, a sample chamber or the like, containing a soft X-ray generator which irradiates the sample or the vicinity thereof with soft X-rays which are controlled to generate positive ions and negative ions and remove charges on the surface of the sample.

Abstract: A charged particle beam apparatus comprising a preparatory evacuation chamber (15 in FIG. 1A) into which a sample (12) is conveyed and which is preliminarily evacuated, an ultraviolet irradiation unit (21) which is disposed in the preparatory evacuation chamber (15) and which irradiates the surface of the sample (12) conveyed into the preparatory evacuation chamber (15), with ultraviolet rays for a predetermined time period, and a sample chamber (16) into which the sample (12) is conveyed in the preliminarily evacuated state of the preparatory evacuation chamber (15) or from which the sample (12) is conveyed into the preparatory evacuation chamber (15), wherein the ultraviolet irradiation of the sample (12) by the ultraviolet irradiation unit (21) is performed before the conveyance of the sample (12) into the sample chamber (16), or/and after the conveyance thereof from the sample chamber (16), thereby to remove contamination on the surface of the sample (12).

Abstract: A charged particle beam apparatus comprising a preparatory evacuation chamber (15 in FIG. 1A) into which a sample (12) is conveyed and which is preliminarily evacuated, an ultraviolet irradiation unit (21) which is disposed in the preparatory evacuation chamber (15) and which irradiates the surface of the sample (12) conveyed into the preparatory evacuation chamber (15), with ultraviolet rays for a predetermined time period, and a sample chamber (16) into which the sample (12) is conveyed in the preliminarily evacuated state of the preparatory evacuation chamber (15) or from which the sample (12) is conveyed into the preparatory evacuation chamber (15), wherein the ultraviolet irradiation of the sample (12) by the ultraviolet irradiation unit (21) is performed before the conveyance of the sample (12) into the sample chamber (16), or/and after the conveyance thereof from the sample chamber (16), thereby to remove contamination on the surface of the sample (12).

Abstract: The present invention relates to the wrist device of a robot which has a speed reducers built in a wrist portion and which attains three degrees of rotating freedom orthogonal to one another, and is characterized in that three transmission shafts penetrating through the interior of an arm are arranged in parallel with one another as power transmission means within the arm.

Abstract: Disclosed is a wrist mechanism for an industrial robot which includes a first wrist member disposed rotatably at the tip of a robot arm and a second wrist member movable relative to this first wrist member. The movement of the second wrist member relative to the first wrist member is effected not in a bending mode in which the angle of intersection between the members is variable but in a rotating mode in which the second wrist member becomes rotatable. The transmission of the rotational power to the second wrist member is effected through a universal joint. With this arrangement, such backlashes as are conventionally found in the engagement between gears can be reduced, and the mechanical burden on the universal joint can also be reduced.

Abstract: An industrial robot comprising: a base; a stand rigidly erected on the base; a shoulder securely mounted on the stand; a first arm consisting of upper and lower levers with the base portion pivoted to the shoulder so that the arm can be turned about a first vertical axis; a second arm having its one end pivoted to the other end of the first arm between the upper and lower levers so that the second arm can be turned about a second vertical axis; a vertically movable shaft so supported by the second arm as to allow the linear movement of the shaft along a third vertical axis; a rack parallel to the vertically movable shaft; a guide means for guiding the rack relative to the second arm in only the vertical direction; a coupling means for connecting the vertically movable shaft and the rack at their both ends; a first drive means secured to the shoulder to rotate, through a first power transmission means, the first arm about the first vertical axis; a second drive means secured to the shoulder to rotate, through