Abstract: A molecular beam source for use in accumulation of organic thin-films which enables the forming of a uniform thin-film on film-forming surfaces of a large-sized substrate, but without producing deposition or separation of a film-forming material in an opening for discharging molecules of the film-forming material, wherein a valve 33 is disposed in a space starting from a side of a molecule heating portion 12 and reaching to a molecule discharge opening 14 for discharging the generated molecules of the film-forming material towards a film-forming surface and, further, heaters 18 and 19 are provided at a side of the molecule discharge opening 14 for heating the molecules of the film-forming material to be discharged. At the side of the molecule discharge opening 14 are provided an exterior guide 13 having a tapered guide wall and also an interior guide 16 having a tapered guide wall is provided within an inside of the exterior guide.

Abstract: A molecule supply source for use in thin-film forming, enabling to form a thin-film, having a high uniformity, with molecules discharged from a single evaporation source, even on a relatively wide film-forming surface 9, has guide passages 4a, 4b and 4c, being provided in plural numbers thereof, wherein flow rates and directional properties of the vapor molecules are controlled by those guide passages 4a, 4b and 4c; thereby, improving distribution on film-thickness, which are formed on the film-forming surface 9 of a substrate 8. With this, a necessary amount of film-forming material can reach to necessary portions on the film-forming surface 9 of the substrate 8, and therefore, it is possible to reduce dispersion in the film-thickness of the thin-film formed on the film-forming surface 9, but without rotating and/or moving the film-forming surface 9, and thereby enabling to obtain the thin-film, having the uniform film-thickness.

Abstract: A molecular beam source for use in accumulation of organic thin-films, for enabling forming of a uniform thin-film on film-forming surfaces of a large-sized substrate, but without producing deposition or separation of a film-forming material in an opening for discharging molecules of the film-forming material, wherein a valve 33 is disposed in a space staring from a side of a molecule heating portion 12 and reaching to a molecule discharge opening 14 for discharging the generated molecules of the film-forming material towards a film-forming surface, and further heaters 18 and 19 are provided at a side of the molecule discharge opening 14, for heating the molecules of the film-forming material to be discharged from. At the side of the molecule discharge opening 14 are provided an exterior guide 13 having a taper-like guide wall, and also an interior guide 16 having a taper-like guide wall, which is provided within an inside of the exterior guide.

Abstract: A molecular beam epitaxy effusion cell, in which effusion material 5 is heated to melt down to be evaporated, so as to generate vapor molecule for growth of a thin film thereof upon a solid body surface, comprises: a crucible 1 for containing the effusion material 5 therein; and a heating means for heating the effusion material 5 contained within the crucible 1, wherein in the crucible 1 is contained heat conduction medium 4, being stable thermally and chemically and having heat conductivity higher than that of the effusion material 5, such as of pyrolytic boron nitride (PBN), together with the effusion material 5.