Patents by Inventor Tatsuhiko Honguu

Tatsuhiko Honguu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reagent for removing protective groups in peptide synthesis
    Patent number: 4950418
    Abstract: Reagent for removing protective groups employed in peptide synthesis comprises a combination of hard acid and soft base. The hard acid is trialkylsilyltrifluoromethanesulphonate R.sub.3 SiO.sub.3 SCF.sub.3 and the soft base is ether. The reagent provides high efficiency of deprotection and has a low tendency to cause side reaction.
    Type: Grant
    Filed: July 25, 1989
    Date of Patent: August 21, 1990
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Haruaki Yajima, Nobutaka Fujii, Gilberto M. A. Guterres, Tatsuhiko Honguu
  • Working substances used in laser isotope separation and method of laser isotope separation
    Patent number: 4824537
    Abstract: Silicon isotopes are effectively separated by irradiating a polysilane compound or a fluoromosilane compound according to this invention with infrared laser rays. The polysilane compound is defined by the formula.Si.sub.a X.sub.b H.sub.cwhere 2.ltoreq.a.ltoreq.3, 0.ltoreq.b.ltoreq.2a+2, 2a+2=b+c and X represents a kind or kinds of halogen, and the fluoromonosilane compound is defined by the formula.SiFX.sub.1 X.sub.2 X.sub.3where X.sub.1 and X.sub.2 are selected from the group consisting of H, Cl, Br, I, F, an alkyl radical and a halogen derivative of the alkyl radical, and X.sub.3 is selected from the group consisting of H, Cl, Br, I, an alkyl radical and a halogen derivative of the alkyl radical.
    Type: Grant
    Filed: January 30, 1986
    Date of Patent: April 25, 1989
    Assignees: Rikagaku Kenkyusho, Shin-Etsu Chemical Co., Ltd.
    Inventors: Shigeyoshi Arai, Masatsugu Kamioka, Yo-ichi Ishikawa, Shohei Isomura, Kyoko Sugita, Takao Oshima, Tatsuhiko Honguu