Patents by Inventor Tatsuhiro Mitake

Tatsuhiro Mitake has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of manufacturing multilayer body, method of processing substrate, and multilayer body
    Patent number: 10094024
    Abstract: A method for forming a release layer which lies between a substrate and a supporting member and has a property that changes when the release layer absorbs light coming through the supporting member, by carrying out plasma CVD with a high-frequency power that is set so as to be higher than a power at which a mode jump occurs.
    Type: Grant
    Filed: May 31, 2012
    Date of Patent: October 9, 2018
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yasushi Fujii, Tatsuhiro Mitake, Atsushi Matsushita
  • Method of manufacturing laminate
    Patent number: 9023172
    Abstract: A method of manufacturing a laminate including a substrate, a support, and a release layer, the method including a preliminary treatment process of increasing temperatures of the support carried into a reaction chamber and the inside of the reaction chamber by a plasma treatment, and a release layer forming process of supplying a source gas serving as the release layer into the reaction chamber after the preliminary treatment process to form the release layer on the support.
    Type: Grant
    Filed: February 5, 2013
    Date of Patent: May 5, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd
    Inventors: Atsushi Matsushita, Tatsuhiro Mitake
  • FLUOROCARBON, METHOD FOR PREPARING FLUOROCARBON, AND USE THEREOF
    Publication number: 20150010724
    Abstract: A fluorocarbon including fluorine and carbon in which d50 in a cumulative particle size distribution is 1.0 nm or greater and 4.0 nm or less. A method for producing the fluorocarbon includes a plasma treatment process of generating radicals by producing inductively coupled plasma (ICP) using a fluorocarbon gas.
    Type: Application
    Filed: June 26, 2014
    Publication date: January 8, 2015
    Inventors: Toshiyuki Ogata, Yasuo Suzuki, Atsushi Matsushita, Tatsuhiro Mitake
  • METHOD OF MANUFACTURING LAMINATE
    Publication number: 20150000834
    Abstract: A method of manufacturing a laminate including a substrate, a support, and a release layer, the method including a preliminary treatment process of increasing temperatures of the support carried into a reaction chamber and the inside of the reaction chamber by a plasma treatment, and a release layer forming process of supplying a source gas serving as the release layer into the reaction chamber after the preliminary treatment process to form the release layer on the support.
    Type: Application
    Filed: February 5, 2013
    Publication date: January 1, 2015
    Inventors: Atsushi Matsushita, Tatsuhiro Mitake
  • METHOD OF MANUFACTURING MULTILAYER BODY, METHOD OF PROCESSING SUBSTRATE, AND MULTILAYER BODY
    Publication number: 20140141253
    Abstract: A method for forming a release layer which lies between a substrate and a supporting member and has a property that changes when the release layer absorbs light coming through the supporting member, by carrying out plasma CVD with a high-frequency power that is set so as to be higher than a power at which a mode jump occurs.
    Type: Application
    Filed: May 31, 2012
    Publication date: May 22, 2014
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yasushi Fujii, Tatsuhiro Mitake, Atsushi Matsushita
  • Method of cleaning support plate
    Patent number: 8097087
    Abstract: A method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning the support plate includes the step of removing an organic substance adhered to the support plate by putting the support plate in contact with oxygen plasma.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: January 17, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Tatsuhiro Mitake, Atsushi Miyanari, Yoshihiro Inao
  • METHOD OF CLEANING SUPPORT PLATE
    Publication number: 20110265815
    Abstract: The present invention achieves a method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning the support plate includes the step of performing an organic substance and metal each adhered to the support plate by causing dry ice particle to hit the support plate, the support plate being a support plate from which a substrate has been stripped.
    Type: Application
    Filed: April 13, 2011
    Publication date: November 3, 2011
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Tatsuhiro MITAKE, Atsushi MATSUSHITA
  • METHOD OF CLEANING SUPPORT PLATE
    Publication number: 20110017231
    Abstract: The present invention achieves a method of cleaning a support plate according to which, while no waste solution is produced after cleaning the support plate, the support plate can be treated at low cost. The method of cleaning the support plate includes the step of removing an organic substance adhered to the support plate by putting the support plate in contact with oxygen plasma.
    Type: Application
    Filed: July 16, 2010
    Publication date: January 27, 2011
    Inventors: Tatsuhiro MITAKE, Miyanari Atsushi, Inao Yoshihiro