Patents by Inventor Tatsumi Nuno

Tatsumi Nuno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8076402
    Abstract: A bisphenol monoester compound represented by the formula (1): (in the formula (1), Rs each represent independently a hydrogen atom or a methyl group, and R? represents an alkyl group of a carbon number of 1 to 6, or a hydrogen atom).
    Type: Grant
    Filed: November 26, 2008
    Date of Patent: December 13, 2011
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Ryoji Soma, Toyomochi Tamato, Masatsugu Akiba, Tatsumi Nuno
  • Patent number: 7956115
    Abstract: The present invention is to provide a light-controlling film giving an excellent haze, and a compound and a composition which enable to produce the film. The invention provides phenyl acrylate represented by the formula (I); a composition comprising the phenyl acrylate and at least two kinds of compounds having a polymerizable carbon-carbon bond in a molecule; and a film obtained by photo-curing the above-mentioned composition. (wherein R represents a methyl group or a hydrogen atom.
    Type: Grant
    Filed: November 6, 2008
    Date of Patent: June 7, 2011
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Junji Morimoto, Tatsumi Nuno, Toyomochi Tamato
  • Publication number: 20090143517
    Abstract: A bisphenol monoester compound represented by the formula (1): (in the formula (1), Rs each represent independently a hydrogen atom or a methyl group, and R? represents an alkyl group of a carbon number of 1 to 6, or a hydrogen atom).
    Type: Application
    Filed: November 26, 2008
    Publication date: June 4, 2009
    Inventors: Ryoji Soma, Toyomochi Tamato, Masatsugu Akiba, Tatsumi Nuno
  • Publication number: 20090118407
    Abstract: The present invention is to provide a light-controlling film giving an excellent haze, and a compound and a composition which enable to produce the film. The invention provides phenyl acrylate represented by the formula (I); a composition comprising the phenyl acrylate and at least two kinds of compounds having a polymerizable carbon-carbon bond in a molecule; and a film obtained by photo-curing the above-mentioned composition. (wherein R represents a methyl group or a hydrogen atom.
    Type: Application
    Filed: November 6, 2008
    Publication date: May 7, 2009
    Inventors: Junji Morimoto, Tatsumi Nuno, Toyomochi Tamato
  • Patent number: 7432297
    Abstract: A compound of the following formula (I) or (II) (in the formula (I), n represents an integer of 0 to 2) (in the formula (II), m represents an integer of 0 to 2).
    Type: Grant
    Filed: January 12, 2006
    Date of Patent: October 7, 2008
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Tatsumi Nuno, Tomokazu Nakamura
  • Publication number: 20080073615
    Abstract: A method for producing a resorcin/formaldehyde resin comprising subjecting a salts-containing aqueous solution, resorcin, formaldehydes and aliphatic ketone having 3 to 6 carbon atoms to a polymerization reaction in the presence of an acidic catalyst, separating the reaction liquid after reaction between an aqueous phase and an organic phase, and obtaining a resorcin/formaldehyde resin from the organic phase, wherein the aqueous phase recovered by separating is distilled to adjust the aliphatic ketone content to 0.3 wt % or less and the alcohol content to 0.1 wt % or less, and the aqueous phase having a salts concentration adjusted to 35 to 45 wt % is used as said salts-containing aqueous solution.
    Type: Application
    Filed: July 13, 2007
    Publication date: March 27, 2008
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Tatsumi Nuno
  • Publication number: 20060173153
    Abstract: A compound of the following formula (I) or (II) (in the formula (I), n represents an integer of 0 to 2) (in the formula (II), m represents an integer of 0 to 2).
    Type: Application
    Filed: January 12, 2006
    Publication date: August 3, 2006
    Inventors: Tatsumi Nuno, Tomokazu Nakamura
  • Patent number: 3956385
    Abstract: Sulfonylamide derivatives of the formula,RSO.sub.2 NHC.sub.2 H.sub.4 Clwherein R is an alkyl or a phenyl group, which are particularly useful for the production of photographic chemicals, are prepared by the reaction between a sulfonylhalide of the formula,RSO.sub.2 Xwherein R is as defined above, and X is chlorine or bromine, and 2-chloroethylamine or its salt, which is prepared by the chlorination of monoethanolamine with thionylchloride.
    Type: Grant
    Filed: April 16, 1974
    Date of Patent: May 11, 1976
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Hideaki Suda, Tatsuo Kanda, Hiroshige Tomita, Hirotoshi Nakanishi, Hiromu Hida, Tatsumi Nuno, Seiichi Akutsu, Masayuki Maeyashiki