Patents by Inventor Tatsunori KAMIDA

Tatsunori KAMIDA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Dry etching method, and dry etching agent and storage container therefor
    Patent number: 12100600
    Abstract: A dry etching method according to one embodiment of the present disclosure includes plasmatizing a dry etching agent and etching a silicon oxide or a silicon nitride with the plasmatized dry etching agent, wherein the dry etching agent comprises CF3I and a C2-C3 fluorine-containing linear nitrile compound, and wherein the concentration of the C2-C3 fluorine-containing linear nitrile compound relative to the CF3I is higher than or equal to 1 vol. ppm and lower than or equal to 1 vol %.
    Type: Grant
    Filed: December 20, 2019
    Date of Patent: September 24, 2024
    Assignee: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Hiroyuki Oomori, Tatsunori Kamida, Shinya Ikeda
  • Dry Etching Method, and Dry Etching Agent and Storage Container Therefor
    Publication number: 20220115240
    Abstract: A dry etching method according to one embodiment of the present disclosure includes plasmatizing a dry etching agent and etching a silicon oxide or a silicon nitride with the plasmatized dry etching agent, wherein the dry etching agent comprises CF3I and a C2-C3 fluorine-containing linear nitrile compound, and wherein the concentration of the C2-C3 fluorine-containing linear nitrile compound relative to the CF3I is higher than or equal to 1 vol. ppm and lower than or equal to 1 vol %.
    Type: Application
    Filed: December 20, 2019
    Publication date: April 14, 2022
    Inventors: Hiroyuki OOMORI, Tatsunori KAMIDA, Shinya IKEDA