Patents by Inventor Tatsuo Chiba

Tatsuo Chiba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20060078824
    Abstract: There are disclosed a photosensitive element comprising a support film which comprises a biaxially oriented polyester film and a photosensitive resin composition layer formed on one surface of the polyester film; wherein a resin layer containing fine particles is formed on the opposite surface of the support film to which the photosensitive resin composition layer is formed, and said photosensitive resin composition comprises (A) a binder polymer having a carboxyl group, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule, and (C) a photopolymerization initiator, a photosensitive element roll, a process for the preparation of a resist pattern using the same, the resist pattern, a resist pattern-laminated substrate, a process for the preparation of a wiring pattern and the wiring pattern.
    Type: Application
    Filed: November 18, 2005
    Publication date: April 13, 2006
    Applicant: Hitachi Chemical Co., Ltd.
    Inventors: Tatsuo Chiba, Tatsuya Ichikawa
  • Patent number: 6555290
    Abstract: A photosensitive resin composition comprising (A) a binder polymer having carboxyl groups, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule, and (C) a photoinitiator can provide a film excellent in mechanical strength, chemical resistance, flexibility, and suitable for producing a photosensitive element.
    Type: Grant
    Filed: November 14, 2000
    Date of Patent: April 29, 2003
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Tatsuya Ichikawa, Tatsuo Chiba
  • Patent number: 6228560
    Abstract: A photosensitive resin composition comprising (A) a binder polymer having carboxyl groups, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule, and (C) a photoinitiator can provide a film excellent in mechanical strength, chemical resistance, flexibility, and suitable for producing a photosensitive element.
    Type: Grant
    Filed: December 15, 1999
    Date of Patent: May 8, 2001
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Tatsuya Ichikawa, Tatsuo Chiba
  • Patent number: 6060216
    Abstract: A photosensitive resin composition comprising (A) a binder polymer having carboxyl groups, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule, and (C) a photoinitiator can provide a film excellent in mechanical strength, chemical resistance, flexibility, and suitable for producing a photosensitive element.
    Type: Grant
    Filed: January 13, 1998
    Date of Patent: May 9, 2000
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Tatsuya Ichikawa, Tatsuo Chiba
  • Patent number: 6035760
    Abstract: A power steering system with which no deterioration in steering feeling occurs when a control flow of working fluid changes. A valve mechanism V is made up of a power cylinder control valve CV for controlling a control flow Q and distributively supplying it to a power cylinder C and a bypass control valve BV connected in parallel with the cylinder control valve CV. The bypass control valve BV is normally closed, but while the control flow Q is increasing over a range of from a minimum flow Q.sub.1 to a maximum flow Q.sub.2 available for generating assist force the bypass control valve opens and returns a part of the control flow Q to a tank so that the pressure difference between the pressure chambers of the power cylinder C rises gently and the driver does not experience a disconcerting feeling such as one of the steering wheel suddenly being taken over.
    Type: Grant
    Filed: November 18, 1998
    Date of Patent: March 14, 2000
    Assignee: Kayaba Industry Co., Ltd.
    Inventors: Katsuhiro Suzuki, Shinichi Hagidaira, Masashi Takai, Tatsuo Chiba, Ryouichi Nagasaka
  • Patent number: 5744282
    Abstract: A photosensitive resin composition comprising (A) a binder polymer having carboxyl groups, (B) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule, and (C) a photoinitiator can provide a film excellent in mechanical strength, chemical resistance, flexibility, and suitable for producing a photosensitive element.
    Type: Grant
    Filed: April 10, 1996
    Date of Patent: April 28, 1998
    Assignee: Hitachi Chemical Co., Ltd.
    Inventors: Tatsuya Ichikawa, Tatsuo Chiba