Abstract: A method of adjusting optical imaging system is provided to finely adjust arrangement of optical elements with sensitivity. Illumination light with a predetermined wavelength band is irradiated to an adjustment mark including first marks disposed at a first pitch and second marks disposed at a second pitch different from the first pitch. An image is captured according to light, of diffracted light emitted from the adjustment mark, passing through an aperture stop and reaching an image surface of the optical imaging system. A positional deviation between the first and second marks is calculated with symmetric/asymmetric property of luminance information. Based on respective positional deviations calculated while the wavelength band of illumination light is changed, arrangement of optical elements between a pupil plane and an aperture stop surface of the optical imaging system is finely adjusted, to correct imaging positional deviation of a pupil image on the aperture stop surface.

Abstract: A mark position detection apparatus has an illumination optical system for illuminating a measurement mark with illumination light and an imaging optical system for converging light reflected from the measurement mark to form an image of the measurement mark on an image pickup apparatus. The mark position detection apparatus measures a positional displacement of the measurement mark by processing an image signal obtained by the image pickup apparatus. The mark position detection apparatus has an optical element provided in the illumination optical system for compensating a difference in asymmetry of the image signal that depends on the wavelength of the illumination light.

Abstract: A mark position detecting apparatus includes: an illuminating unit that illuminates a mark on a substrate; an image forming optical system that forms an image of the mark with light from the mark; an adjustment unit that adjusts distortion manifesting at the image forming optical system; an image capturing unit that captures the image of the mark formed by the image forming optical system in which the distortion has been adjusted and outputs image signals; and a calculation unit that calculates a substantial central position of the mark based upon the image signals output by the image capturing unit.

Abstract: A mark position detecting apparatus includes: an illuminating unit that illuminates a mark on a substrate; an image forming optical system that forms an image of the mark with light from the mark; an adjustment unit that adjusts distortion manifesting at the image forming optical system; an image capturing unit that captures the image of the mark formed by the image forming optical system in which the distortion has been adjusted and outputs image signals; and a calculation unit that calculates a substantial central position of the mark based upon the image signals output by the image capturing unit.

Abstract: An optical positional deviation detecting apparatus comprises an irradiation optical system for irradiating a measurement mark configured by forming a second mark (e.g., a resist mark) on a first mark (e.g., a base mark) with a beam of irradiation, an image forming optical system for forming an image of the measurement mark by converging reflected beam from the measurement mark, an imaging device for photographing the image of the measurement mark, which has been formed by the image forming optical system, an image processing device for measuring the positional deviation in alignment of the second mark with respect to the first mark by processing an image signal obtained by the imaging device, and an image field area adjustment mechanism for adjusting an image field area for the imaging device to photograph the image of the measurement mark.

Abstract: A mark position detection apparatus has an illumination optical system for illuminating a measurement mark with illumination light and an imaging optical system for converging light reflected from the measurement mark to form an image of the measurement mark on an image pickup apparatus. The mark position detection apparatus measures a positional displacement of the measurement mark by processing an image signal obtained by the image pickup apparatus. The mark position detection apparatus has an optical element provided in the illumination optical system for compensating a difference in asymmetry of the image signal that depends on the wavelength of the illumination light.

Abstract: An optical resonator includes a first substrate and a second substrate which face each other, the first substrate having a flat main surface on which a first reflective mirror is provided and the second substrate having a concave portion on which a second reflective mirror is provided and a flat portion which surrounds the concave portion. The main surface of the first substrate and the flat portion of the second substrate are bondable. In addition, a laser oscillator includes a solid-state laser medium and a substrate, the solid-state laser medium having a main surface on which a first reflective mirror is provided and the substrate having a concave portion on which a second mirror is provided and a flat portion which surrounds the concave portion. The first and the second reflective mirrors serve as a laser resonator.

Abstract: A light-modulation element is constituted as a light-modulation element for constituting a GLV device and has the same constitution as the conventional light-modulation element except for differing in the structure of the combined light-reflective film and membrane-side electrode of a membrane. The combined light-reflective film and membrane-side electrode is composed of a two-layer metallic film forming a TiN film of 10 nm to 70 nm in thickness provided as a lower layer and an Al film of 50 nm to 150 nm in thickness provided thereon. In the combined light-reflective film and membrane-side electrode, the Al film has a smooth reflective surface and a high light-reflectance, so that the light-utilization efficiency of the light-modulation element is high.

Abstract: A mark position detection apparatus includes: an illumination unit that illuminates a substrate having a mark formed thereupon; an image-capturing unit that captures an image of the substrate by using reflected light from the substrate and outputs image signals; a storage unit at which information related to fixed pattern noise contained in the image signals output by the image-capturing unit is stored in memory; and a control unit that calculates a position of the mark on the substrate based upon the information related to the fixed pattern noise stored in memory at the storage unit and the image signals output from the image-capturing unit.

Abstract: A mark position detecting apparatus includes: an illuminating unit that illuminates a mark on a substrate; an image forming optical system that forms an image of the mark with light from the mark; an adjustment unit that adjusts distortion manifesting at the image forming optical system; an image capturing unit that captures the image of the mark formed by the image forming optical system in which the distortion has been adjusted and outputs image signals; and a calculation unit that calculates a substantial central position of the mark based upon the image signals output by the image capturing unit.

Abstract: A position detection apparatus for and method of detection the position of a pattern formed on a substrate (e.g, a wafer). The apparatus (100) comprises an illumination system capable of illuminating the pattern, and an imaging optical system arranged to converge light from the substrate (126) to form an image of the pattern. The apparatus further includes a detector (170) that photoelectrically detects the pattern image and generates a first output signal containing a representation of the image, and position detection system (174), electrically connected to the detector, that detects a position of the pattern based on the first output signal, and determines a deviation of the position from an ideal position. The position detection system then generates a second output signal containing deviation information representing the deviation.

Abstract: A light modulation element is constituted as a light modulation element for constituting a GLV device, and has the same constitution as the conventional light modulation element except for differing in the structure of a combined light reflective film and membrane-side electrode of a membrane. The combined light reflective film and membrane-side electrode is composed of a two-layer metallic film forming a TiN film of 10 nm to 70 nm in thickness provided as a lower layer, and an Al film of 50 nm to 150 nm in thickness provided thereon. In the combined light reflective film and membrane-side electrode, the Al film has a smooth reflective surface and a high light reflectance, so that the light utilization efficiency of the light modulation element is high.

Abstract: An optical position displacement measuring device comprises an illumination optical system for illuminating a measurement mark, an image formation optical system for forming an image of the measurement mark by converging light reflected from the measurement mark, a CDD camera for capturing the image of the measurement mark formed by the image formation optical system, an image processing device for measuring positional displacement of the measurement mark from obtained image signals, an auto focus device for carrying out auto focus adjustment, and a controller.

Abstract: An optical positional deviation detecting apparatus comprises an irradiation optical system for irradiating a measurement mark configured by forming a second mark (e.g., a resist mark) on a first mark (e.g., a base mark) with a beam of irradiation, an image forming optical system for forming an image of the measurement mark by converging reflected beam from the measurement mark, an imaging device for photographing the image of the measurement mark, which has been formed by the image forming optical system, an image processing device for measuring the positional deviation in alignment of the second mark with respect to the first mark by processing an image signal obtained by the imaging device, and an image field area adjustment mechanism for adjusting an image field area for the imaging device to photograph the image of the measurement mark.

Abstract: A laser beam generating apparatus comprising a first laser beam source oscillating in a near infrared-ray region of, for example, an Nd:YAG laser to generate a laser beam, a second higher harmonic wave generator for generating, from the laser beam emitted from the first laser beam source, a second higher harmonic wave having a half wavelength of the laser beam emitted from the first laser beam source, a splitter for splitting the second higher harmonic wave, a second laser beam source which is supplied with a part of the second higher harmonic wave thus split is input to a Ti:Sapphire laser to be excited and oscillated, thereby generating a laser beam of substantially 700 nm in wavelength, a fourth higher harmonic wave generator for generating a fourth higher harmonic wave from the remaining part of the second higher harmonic wave thus split, a sum frequency mixing composed of a BBO crystal device to which the laser beam of substantially 700 nm in wavelength and the fourth higher harmonic wave are input, and

Abstract: By polishing an optical device such as .beta.-BBO crystals using a liquid suspension comprising a fine powder of silicon oxide and a liquid lubricant of saturated hydrocarbon, satisfactory mirror face polishing can be applied to the optical device, without deteriorating the surface property while reducing occurrence of fine optical defects.

Abstract: Since a backlighting apparatus 1 for liquid crystal display is constituted such that a light guiding plate 2 and a frame 3 are molded together as a single unit provided with a deformation relaxation design, an attaching unit and parts, such as attaching feet and screws, for attaching the light guiding plate 2 to the frame 3 are not required, thereby making it possible to reduce the thickness and size of the backlighting apparatus 1 for liquid crystal display which has been restricted by the sizes of these parts.

Abstract: An electro-optical modulator has an electro-optical crystal having an optical path, and a pair of electrodes disposed one on each side of the optical path for applying a signal voltage therebetween. At least one of the electrodes is formed on a side surface of a groove defined along the optical path of the electro-optical crystal.

Abstract: A method of growing a single crystal of KTiOPO.sub.4 which is a nonlinear optical material is disclosed. Growth of the single crystal of KTiOPO.sub.4 is carried out by melting a KTiOPO.sub.4 material with a flux to produce a melt, then contacting a seed crystal to the melt, and by slowly cooling at a saturation temperature or below. At this time, molar fractions of K.sub.2 O, P.sub.2 O.sub.5 and TiO.sub.2 contained in the melt fall within a region surrounded by six point in a K.sub.2 O-P.sub.2 O.sub.5 -TiO.sub.2 ternary phase diagram of A (K.sub.2 O:0.4150, P.sub.2 O.sub.5 :0.3906, TiO.sub.2 : 0.1944), B (K.sub.2 O:0.3750, P.sub.2 O.sub.5 : 0.3565, TiO.sub.2 : 0.2685), C (K.sub.2 O: 0.3750, P.sub.2 O.sub.5 : 0.3438, TiO.sub.2 : 0.2813), D (K.sub.2 O: 0.3850, P.sub.2 O.sub.5 : 0.3260, TiO.sub.2 : 0.2890), E (K.sub.2 O: 0.4000, P.sub.2 O.sub.5 : 0.3344, TiO.sub.2 : 0.2656), and F (K.sub.2 O: 0.4158, P.sub.2 O.sub.5 : 0.3744, TiO.sub.2 : 0.2098). In addition, K.sub.15 P.sub.13 O.sub.