Patents by Inventor Tatsuo Manaki

Tatsuo Manaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Colloidal silica slurry
    Patent number: 6750257
    Abstract: The present invention provides the colloidal silica slurry which does not have a bad influence, such as corrosion, to a silicon wafer and wiring material on a silicon wafer and inhibits growth of microbes, and whereof preserving stability is high because stability of particle diameters of a colloidal particle is superior and using for a long period continuously is possible. For providing the above, the colloidal silica slurry wherein hydrogen peroxide from 5 to 100 ppm is added.
    Type: Grant
    Filed: January 15, 2001
    Date of Patent: June 15, 2004
    Assignee: Fuso Chemical, Ltd.
    Inventors: Shigetoyo Matsumura, Yukio Okada, Tatsuo Manaki, Keiji Toyama, Masatoshi Sakai
  • Colloidal silica slurry
    Publication number: 20020037935
    Abstract: The present invention provides the colloidal silica slurry which does not have a bad influence, such as corrosion, to a silicon wafer and wiring material on a silicon wafer and inhibits growth of microbes, and whereof preserving stability is high because stability of particle diameters of a colloidal particle is superior and using for a long period continuously is possible. For providing the above, the colloidal silica slurry wherein hydrogen peroxide from 5 to 100 ppm is added.
    Type: Application
    Filed: January 15, 2001
    Publication date: March 28, 2002
    Inventors: Shigetoyo Matsumura, Yukio Okada, Tatsuo Manaki, Keiji Toyama, Masatoshi Sakai