Patents by Inventor Tatsuo Matsudo

Tatsuo Matsudo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6747748
    Abstract: In a process of forming a film on a surface of a wafer by thermal processing, laser light generated by a light source is depolarized by a depolarizer and the deporlarized light is irradiated upon the surface of wafer. As for the light reflected from the surface of wafer, polarization components in predetermined two directions perpendicular to each other are extracted by a beam splitter, and optical sensors receive the extracted light components to detect each intensity. An analytical processing unit determines a thickness of a formed film based on a change in a difference in intensity.
    Type: Grant
    Filed: October 10, 2001
    Date of Patent: June 8, 2004
    Assignee: Tokyo Electron Limited
    Inventors: Tatsuo Matsudo, Tomohiro Ohta, Tetsuji Yasuda, Masakazu Ichikawa, Takashi Nakayama
  • Publication number: 20020115304
    Abstract: In a process of forming a film on a surface of a wafer by thermal processing, laser light generated by a light source is depolarized by a depolarizer and the deporlarized light is irradiated upon the surface of wafer As for the light reflected from the surface of wafer, polarization components in predetermined two directions perpendicular to each other are extracted by a beam splitter, and optical sensors receive the extracted light components to detect each intensity. An analytical processing unit determines a thickness of a formed film based on a change in a difference in intensity.
    Type: Application
    Filed: October 10, 2001
    Publication date: August 22, 2002
    Inventors: Tatsuo Matsudo, Tomohiro Ohta, Tetsuji Yasuda, Masakazu Ichikawa, Tkashi Nakayama