Abstract: A plant cultivation apparatus includes a lighting device configured to apply artificial light to plants, the lighting device being supported movably in a vertical direction and a height of the lighting device from the plants being adjustable, a projection part projecting from a lateral side of the lighting device, and a light reflector disposed outside the lateral side of the lighting device to reflect light from the lighting device back to the plants, the light reflector including a vertically extending slit that defines a movable range of the lighting device in the vertical direction in which the height of the lighting device from the plants is adjustable.

Abstract: A plant cultivation system includes a first floor including a first area having an area provided with a first plant cultivation shelf, an area provided with a second plant cultivation shelf, and an area between the first plant cultivation shelf and the second plant cultivation shelf, the first floor having no air vent holes; a second floor including a second area differing from the first area, the second floor having air vent holes; and an air-conditioning unit configured to circulate air from a ceiling having air supply holes to the air vent holes in the second floor.

Abstract: A hydroponic cultivation system for plants includes a first plant cultivation apparatus to hydroponically cultivate plants using a first liquid fertilizer, a first supply path to supply the first liquid fertilizer, a second plant cultivation apparatus to hydroponically cultivate plants using a second liquid fertilizer having a component differing from a component of the first liquid fertilizer, a second supply path to supply the second liquid fertilizer, and a tray carrier device to carry cultivation trays with the plants thereon between the first plant cultivation apparatus and the second plant cultivation apparatus. The cultivation trays are arranged in stages and mutually connected in series to the first supply path via a removable hose in the first plant cultivation apparatus, and the cultivation trays are arranged in stages and mutually connected in series to the second supply path via a removable hose in the second plant cultivation apparatus.

Abstract: A hydroponic cultivation system for plants includes a first plant cultivation apparatus to hydroponically cultivate plants using a first liquid fertilizer, a first supply path to supply the first liquid fertilizer, a second plant cultivation apparatus to hydroponically cultivate plants using a second liquid fertilizer having a component differing from a component of the first liquid fertilizer, a second supply path to supply the second liquid fertilizer, and a tray carrier device to carry cultivation trays with the plants thereon between the first plant cultivation apparatus and the second plant cultivation apparatus. The cultivation trays are arranged in stages and mutually connected in series to the first supply path via a removable hose in the first plant cultivation apparatus, and the cultivation trays are arranged in stages and mutually connected in series to the second supply path via a removable hose in the second plant cultivation apparatus.

Abstract: A plant cultivation system includes a first floor including a first area having an area provided with a first plant cultivation shelf, an area provided with a second plant cultivation shelf, and an area between the first plant cultivation shelf and the second plant cultivation shelf, the first floor having no air vent holes; a second floor including a second area differing from the first area, the second floor having air vent holes; and an air-conditioning unit configured to circulate air from a ceiling having air supply holes to the air vent holes in the second floor.

Abstract: A plant cultivation system includes a first floor including a first area having an area provided with a first plant cultivation shelf, an area provided with a second plant cultivation shelf, and an area between the first plant cultivation shelf and the second plant cultivation shelf, the first floor having no air vent holes; a second floor including a second area differing from the first area, the second floor having air vent holes; and an air-conditioning unit configured to circulate air from a ceiling having air supply holes to the air vent holes in the second floor.

Abstract: A plant cultivation system includes a first floor including a first area having an area provided with a first plant cultivation shelf, an area provided with a second plant cultivation shelf, and an area between the first plant cultivation shelf and the second plant cultivation shelf, the first floor having no air vent holes; a second floor including a second area differing from the first area, the second floor having air vent holes; and an air-conditioning unit configured to circulate air from a ceiling having air supply holes to the air vent holes in the second floor.

Abstract: A hydroponic cultivation system for plants includes a first plant cultivation apparatus to hydroponically cultivate plants using a first liquid fertilizer, a first supply path to supply the first liquid fertilizer, a second plant cultivation apparatus to hydroponically cultivate plants using a second liquid fertilizer having a component differing from a component of the first liquid fertilizer, a second supply path to supply the second liquid fertilizer, and a tray carrier device to carry cultivation trays with the plants thereon between the first plant cultivation apparatus and the second plant cultivation apparatus. The cultivation trays are arranged in stages and mutually connected in series to the first supply path via a removable hose in the first plant cultivation apparatus, and the cultivation trays are arranged in stages and mutually connected in series to the second supply path via a removable hose in the second plant cultivation apparatus.

Abstract: A film-forming method for forming a metal film on a substrate by a sputtering process includes the steps of depressurizing a processing space, in which deposition of the metal film is caused by the sputtering process, applying a DC bias voltage between the substrate and a target disposed in the processing space so as to face the substrate, and igniting plasma by introducing secondary electrons to the processing space from a secondary electron source.

Abstract: A film-forming method for forming a metal film on a substrate by a sputtering process includes the steps of depressurizing a processing space, in which deposition of the metal film is caused by the sputtering process, applying a DC bias voltage between the substrate and a target disposed in the processing space so as to face the substrate, and igniting plasma by introducing secondary electrons to the processing space from a secondary electron source.